2012
Calibration Specimens for Microscopy
KOLAŘÍK, Vladimír; Milan MATĚJKA; František MATĚJKA; Stanislav KRÁTKÝ; Michal URBÁNEK et al.Základní údaje
Originální název
Calibration Specimens for Microscopy
Autoři
KOLAŘÍK, Vladimír; Milan MATĚJKA; František MATĚJKA; Stanislav KRÁTKÝ; Michal URBÁNEK; Miroslav HORÁČEK; Stanislav KRÁL a Jan BOK
Vydání
NANOCON 2012 Conference proceedings, od s. 713-716, 2012
Nakladatel
TANGER
Další údaje
Typ výsledku
Stať ve sborníku
Utajení
není předmětem státního či obchodního tajemství
Odkazy
Označené pro přenos do RIV
Ne
UT WoS
Klíčová slova anglicky
e–beam technology; calibration specimen; scanning electron microscopy
Příznaky
Mezinárodní význam, Recenzováno
Změněno: 13. 2. 2013 10:44, Mgr. Jan Bok, Ph.D.
Anotace
V originále
Recent developments in nanotechnologies raised new issues in microscopy with nanometer and sub nanometer resolution. Together with the imaging techniques, new approaches in the metrology field are required both in the direct metrology issues and in the area of calibration of the imaging tools (microscopes). Scanning electron microscopy needs the calibration specimens for adjusting the size of the view field (correct magnification) and the shape of that field (correction of deflection field distortions). Calibration specimens have been prepared using different technologies; among them the e–beam patterning and the e–beam lithography have been proved to be appropriate and flexible tool for that task. In the past, we have reported several times our achievements in this field (e.g. [1]). Nevertheless, recent advances of the patterning tool (BS600), mainly the development of the technology zoomed exposure mode [2] and the installation of the magnetic field active cancellation system [3], pushed remarkably the technology necessary for further advances in this area. Within this contribution some theoretical, technology and practical aspects are discussed; achieved results are presented.