NEUHOLD, A, Jiří NOVÁK, H G FLESCH, Armin MOSER, T DJURIC, L GRODD, S GRIGORIAN, U PIETSCH a R RESEL. X-ray radiation damage of organic semiconductor thin films during grazing incidence diffraction experiments. AMSTERDAM: ELSEVIER SCIENCE BV, 2012, roč. 284, s. 64-68. Dostupné z: https://dx.doi.org/10.1016/j.nimb.2011.07.105. |
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@article{1123346, author = {Neuhold, A and Novák, Jiří and Flesch, H G and Moser, Armin and Djuric, T and Grodd, L and Grigorian, S and Pietsch, U and Resel, R}, article_location = {AMSTERDAM}, doi = {http://dx.doi.org/10.1016/j.nimb.2011.07.105}, keywords = {Radiation damage; Organic semiconductor; Grazing incidence X-ray diffraction; Fluence}, language = {eng}, title = {X-ray radiation damage of organic semiconductor thin films during grazing incidence diffraction experiments}, volume = {284}, year = {2012} }
TY - JOUR ID - 1123346 AU - Neuhold, A - Novák, Jiří - Flesch, H G - Moser, Armin - Djuric, T - Grodd, L - Grigorian, S - Pietsch, U - Resel, R PY - 2012 TI - X-ray radiation damage of organic semiconductor thin films during grazing incidence diffraction experiments VL - 284 SP - 64-68 EP - 64-68 PB - ELSEVIER SCIENCE BV KW - Radiation damage KW - Organic semiconductor KW - Grazing incidence X-ray diffraction KW - Fluence ER -
NEUHOLD, A, Jiří NOVÁK, H G FLESCH, Armin MOSER, T DJURIC, L GRODD, S GRIGORIAN, U PIETSCH a R RESEL. X-ray radiation damage of organic semiconductor thin films during grazing incidence diffraction experiments. AMSTERDAM: ELSEVIER SCIENCE BV, 2012, roč.~284, s.~64-68. Dostupné z: https://dx.doi.org/10.1016/j.nimb.2011.07.105.
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