Plasma cleaning and activation of silicon surface in Dielectric
Coplanar Surface Barrier Discharge

J 2013

Plasma cleaning and activation of silicon surface in Dielectric Coplanar Surface Barrier Discharge

PAMREDDY, Annapurna; Dana SKÁCELOVÁ; Martin HANIČINEC; Pavel SŤAHEL; Monika STUPAVSKÁ et al.

Základní údaje

Originální název

Plasma cleaning and activation of silicon surface in Dielectric Coplanar Surface Barrier Discharge

Název česky

Plazmové čištění a aktivace povrchu křemíku v Dielektrická koplanární Odvody bariérového

Autoři

PAMREDDY, Annapurna; Dana SKÁCELOVÁ; Martin HANIČINEC; Pavel SŤAHEL; Monika STUPAVSKÁ; Mirko ČERNÁK a Josef HAVEL

Vydání

Surface & coatings technology, Elsevier Science, 2013, 0257-8972

Další údaje

Jazyk

angličtina

Typ výsledku

Článek v odborném periodiku

Obor

10406 Analytical chemistry

Stát vydavatele

Švýcarsko

Utajení

není předmětem státního či obchodního tajemství

Odkazy

http://www.sciencedirect.com/science/article/pii/S0257897213009420

Impakt faktor

Impact factor: 2.199

Označené pro přenos do RIV

Ano

Kód RIV

RIV/00216224:14310/13:00074780

Organizační jednotka

Přírodovědecká fakulta

DOI

https://doi.org/10.1016/j.surfcoat.2013.10.008

UT WoS

000329884300046

Klíčová slova česky

DCSBD plazma, plazmy, povrchová úprava, křemíkové desky, LDI

Klíčová slova anglicky

DCSBD plasma; plasma treatment; surface treatment; silicon wafer; LDI

Štítky

AKR, rivok

Příznaky

Mezinárodní význam

Změněno: 27. 4. 2015 10:37, Ing. Andrea Mikešková

Anotace

V originále

Surface of crystalline silicon (c-Si) wafers was treated in dielectric barrier discharge and the cleaning effect, wettability and adhesion of gold nanoparticles were investigated. Treatment of c-Si was realised in air plasma at atmospheric pressure in Diffuse Coplanar Surface Barrier Discharge (DCSBD). Plasma cleaning and gold nanoparticles adhesion were investigated by means of Laser Desorption Ionisation Time Of Flight Mass Spectrometry (LDI TOF MS) and X-ray photoelectron spectroscopy (XPS). Wettability and surface morphology were studied by contact angle measurement and atomic force microscopy, respectively. By laser desorption in positive ion mode, Cn+ and Na+, K+, etc. ions were detected on the industrially cleaned surface of silicon wafers. After plasma treatment the substantial decrease of such ions was observed. Plasma treatment of the surface increased also its hydrophilicity and adsorption of gold nanoparticles on the Si surface significantly increased after 5 sec cleaning in plasma. Intensity of gold clusters Aun+ absorbed on the plasma treated Si surface was in order of magnitude higher than intensity of clusters absorbed on the untreated surface.

Návaznosti

EE2.3.30.0009, projekt VaV

Název: Zaměstnáním čerstvých absolventů doktorského studia k vědecké excelenci

Citovat

PAMREDDY, Annapurna; Dana SKÁCELOVÁ; Martin HANIČINEC; Pavel SŤAHEL; Monika STUPAVSKÁ; Mirko ČERNÁK a Josef HAVEL. Plasma cleaning and activation of silicon surface in Dielectric Coplanar Surface Barrier Discharge. Surface & coatings technology. Elsevier Science, 2013, roč. 236, č. 236, s. 326-331. ISSN 0257-8972. Dostupné z: https://doi.org/10.1016/j.surfcoat.2013.10.008.

@article{1126797,
   author = {Pamreddy, Annapurna and Skácelová, Dana and Haničinec, Martin and Sťahel, Pavel and Stupavská, Monika and Černák, Mirko and Havel, Josef},
   article_number = {236},
   doi = {https://doi.org/10.1016/j.surfcoat.2013.10.008},
   keywords = {DCSBD plasma; plasma treatment; surface treatment; silicon wafer; LDI},
   language = {eng},
   issn = {0257-8972},
   journal = {Surface & coatings technology},
   title = {Plasma cleaning and activation of silicon surface in Dielectric Coplanar Surface Barrier Discharge},
   url = {http://www.sciencedirect.com/science/article/pii/S0257897213009420},
   volume = {236},
   year = {2013}
}

TY  - JOUR
ID  - 1126797
AU  - Pamreddy, Annapurna - Skácelová, Dana - Haničinec, Martin - Sťahel, Pavel - Stupavská, Monika - Černák, Mirko - Havel, Josef
PY  - 2013
TI  - Plasma cleaning and activation of silicon surface in Dielectric Coplanar Surface Barrier Discharge
JF  - Surface & coatings technology
VL  - 236
IS  - 236
SP  - 326-331
EP  - 326-331
PB  - Elsevier Science
SN  - 02578972
KW  - DCSBD plasma
KW  - plasma treatment
KW  - surface treatment
KW  - silicon wafer
KW  - LDI
UR  - http://www.sciencedirect.com/science/article/pii/S0257897213009420
N2  - Surface of crystalline silicon (c-Si) wafers was treated in dielectric barrier discharge and the cleaning effect, wettability and adhesion of gold nanoparticles were investigated. Treatment of c-Si was realised in air plasma at atmospheric pressure in Diffuse Coplanar Surface Barrier Discharge (DCSBD). Plasma cleaning and gold nanoparticles adhesion were investigated by means of Laser Desorption Ionisation Time Of Flight Mass Spectrometry (LDI TOF MS) and X-ray photoelectron spectroscopy (XPS). Wettability and surface morphology were studied by contact angle measurement and atomic force microscopy, respectively. By laser desorption in positive ion mode, Cn+ and Na+, K+, etc. ions were detected on the industrially cleaned surface of silicon wafers. After plasma treatment the substantial decrease of such ions was observed. Plasma treatment of the surface increased also its hydrophilicity and adsorption of gold nanoparticles on the Si surface significantly increased after 5 sec cleaning in plasma. Intensity of gold clusters Aun+ absorbed on the plasma treated Si surface was in order of magnitude higher than intensity of clusters absorbed on the untreated surface.
ER  -

PAMREDDY, Annapurna; Dana SKÁCELOVÁ; Martin HANIČINEC; Pavel SŤAHEL; Monika STUPAVSKÁ; Mirko ČERNÁK a Josef HAVEL. Plasma cleaning and activation of silicon surface in Dielectric Coplanar Surface Barrier Discharge. \textit{Surface \&{} coatings technology}. Elsevier Science, 2013, roč.~236, č.~236, s.~326-331. ISSN~0257-8972. Dostupné z: https://doi.org/10.1016/j.surfcoat.2013.10.008.

Přehled o publikaci