Process-induced inhomogeneities in higher asymmetry angle X-ray
monochromators

D 2013

Process-induced inhomogeneities in higher asymmetry angle X-ray monochromators

KORYTÁR, D.; P. VAGOVIČ; C. FERRARI; P. ŠIFFALOVIČ; M. JERGEL et al.

Základní údaje

Originální název

Process-induced inhomogeneities in higher asymmetry angle X-ray monochromators

Autoři

KORYTÁR, D.; P. VAGOVIČ; C. FERRARI; P. ŠIFFALOVIČ; M. JERGEL; E. DOBROČKA; Z. ZÁPRAŽNÝ; V. ÁČ a Petr MIKULÍK

Vydání

8848. vyd. USA, Advances in X-Ray/EUV Optics and Components VIII, od s. "88480U-1-88480U-8", 8 s. 2013

Nakladatel

SPIE-INT SOC OPTICAL ENGINEERING

Další údaje

Jazyk

angličtina

Typ výsledku

Stať ve sborníku

Obor

10302 Condensed matter physics

Stát vydavatele

Spojené státy

Utajení

není předmětem státního či obchodního tajemství

Forma vydání

tištěná verze "print"

Odkazy

URL

Označené pro přenos do RIV

Ano

Kód RIV

RIV/00216224:14740/13:00070947

Organizační jednotka

Středoevropský technologický institut

ISBN

978-0-8194-9698-0

ISSN

DOI

https://doi.org/10.1117/12.2025142

UT WoS

000326748800024

Klíčová slova anglicky

Bragg magnifier; X-ray diffraction; crystals

Štítky

rivok nk

Příznaky

Mezinárodní význam, Recenzováno

Změněno: 25. 4. 2014 17:17, Olga Křížová

Anotace

V originále

Beam inhomogeneities of asymmetric Ge(220)-based V-shaped and single bounce monochromators have been studied both in metrological and imaging applications for photon energies around 8 keV. Presence of growth striations in graded GeSi, grains in single Cu crystal, and strains in thermally tuned V-channel monochromators observed in X-ray topographs excludes these materials from imaging applications. As for stochastic surface processing, chemomechanical polishing (CMP) produces better surface homogeneity than chemical polish. However, CMP is more difficult to be applied in V-channels, where chemical polishing is prefered. For comparison, measurements on surfaces processed by a deterministic mechanical method of single point diamond turning (SPDT) have shown SPDT to be a perspective technology. Again, to prepare deep grooves with this technique is also a challenge, mainly for tool makers. Some process induced features are observed as wavefield distortions in interference fringes.

Návaznosti

ED1.1.00/02.0068, projekt VaV

Název: CEITEC - central european institute of technology

MSM 143100002, záměr

Název: Fyzikální vlastnosti nových materiálů a vrstevnatých struktur

Investor: Ministerstvo školství, mládeže a tělovýchovy ČR, Fyzikální vlastnosti nových materiálů a vrstevnatých struktur

Citovat

KORYTÁR, D.; P. VAGOVIČ; C. FERRARI; P. ŠIFFALOVIČ; M. JERGEL; E. DOBROČKA; Z. ZÁPRAŽNÝ; V. ÁČ a Petr MIKULÍK. Process-induced inhomogeneities in higher asymmetry angle X-ray monochromators. In A. Khounsary, S. Goto, and C. Morawe. Advances in X-Ray/EUV Optics and Components VIII. 8848. vyd. USA: SPIE-INT SOC OPTICAL ENGINEERING, 2013, s. "88480U-1-88480U-8", 8 s. ISBN 978-0-8194-9698-0. Dostupné z: https://doi.org/10.1117/12.2025142.

@inproceedings{1158979,
   author = {Korytár, D. and Vagovič, P. and Ferrari, C. and Šiffalovič, P. and Jergel, M. and Dobročka, E. and Zápražný, Z. and Áč, V. and Mikulík, Petr},
   address = {USA},
   booktitle = {Advances in X-Ray/EUV Optics and Components VIII},
   doi = {https://doi.org/10.1117/12.2025142},
   edition = {8848},
   editor = {A. Khounsary, S. Goto, and C. Morawe},
   keywords = {Bragg magnifier; X-ray diffraction; crystals},
   howpublished = {tištěná verze "print"},
   language = {eng},
   location = {USA},
   isbn = {978-0-8194-9698-0},
   pages = {"88480U-1-88480U-8"},
   publisher = {SPIE-INT SOC OPTICAL ENGINEERING},
   title = {Process-induced inhomogeneities in higher asymmetry angle X-ray monochromators},
   url = {http://www.sci.muni.cz/~mikulik/Publications.html#KorytarVagovicFerrari-SPIE-2013},
   year = {2013}
}

TY  - CONF
ID  - 1158979
AU  - Korytár, D. - Vagovič, P. - Ferrari, C. - Šiffalovič, P. - Jergel, M. - Dobročka, E. - Zápražný, Z. - Áč, V. - Mikulík, Petr
PY  - 2013
TI  - Process-induced inhomogeneities in higher asymmetry angle X-ray monochromators
PB  - SPIE-INT SOC OPTICAL ENGINEERING
CY  - USA
SN  - 9780819496980
KW  - Bragg magnifier
KW  - X-ray diffraction
KW  - crystals
UR  - http://www.sci.muni.cz/~mikulik/Publications.html#KorytarVagovicFerrari-SPIE-2013
N2  - Beam inhomogeneities of asymmetric Ge(220)-based V-shaped and single bounce monochromators have been studied both in metrological and imaging applications for photon energies around 8 keV. Presence of growth striations in graded GeSi, grains in single Cu crystal, and strains in thermally tuned V-channel monochromators observed in X-ray topographs excludes these materials from imaging applications. As for stochastic surface processing, chemomechanical polishing (CMP) produces better surface homogeneity than chemical polish. However, CMP is more difficult to be applied in V-channels, where chemical polishing is prefered. For comparison, measurements on surfaces processed by a deterministic mechanical method of single point diamond turning (SPDT) have shown SPDT to be a perspective technology. Again, to prepare deep grooves with this technique is also a challenge, mainly for tool makers. Some process induced features are observed as wavefield distortions in interference fringes.
ER  -

KORYTÁR, D.; P. VAGOVIČ; C. FERRARI; P. ŠIFFALOVIČ; M. JERGEL; E. DOBROČKA; Z. ZÁPRAŽNÝ; V. ÁČ a Petr MIKULÍK. Process-induced inhomogeneities in higher asymmetry angle X-ray monochromators. In A. Khounsary, S. Goto, and C. Morawe. \textit{Advances in X-Ray/EUV Optics and Components VIII}. 8848. vyd. USA: SPIE-INT SOC OPTICAL ENGINEERING, 2013, s.~''88480U-1-88480U-8'', 8 s. ISBN~978-0-8194-9698-0. Dostupné z: https://doi.org/10.1117/12.2025142.

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