GALMIZ, Oleksandr, Monika STUPAVSKÁ, Harm WULFF, Holger KERSTEN, Antonín BRABLEC a Mirko ČERNÁK. Deposition of Zn-containing films using atmospheric pressure plasma jet. Open chemistry. De Gruyter Open, 2014, roč. 13, č. 1, s. 198-203. ISSN 2391-5420. Dostupné z: https://dx.doi.org/10.1515/chem-2015-0020. |
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@article{1227684, author = {Galmiz, Oleksandr and Stupavská, Monika and Wulff, Harm and Kersten, Holger and Brablec, Antonín and Černák, Mirko}, article_number = {1}, doi = {http://dx.doi.org/10.1515/chem-2015-0020}, keywords = {Atmospheric pressure plasma jet; film deposition; zinc.}, language = {eng}, issn = {2391-5420}, journal = {Open chemistry}, title = {Deposition of Zn-containing films using atmospheric pressure plasma jet}, url = {https://doi.org/10.1515/chem-2015-0020}, volume = {13}, year = {2014} }
TY - JOUR ID - 1227684 AU - Galmiz, Oleksandr - Stupavská, Monika - Wulff, Harm - Kersten, Holger - Brablec, Antonín - Černák, Mirko PY - 2014 TI - Deposition of Zn-containing films using atmospheric pressure plasma jet JF - Open chemistry VL - 13 IS - 1 SP - 198-203 EP - 198-203 PB - De Gruyter Open SN - 23915420 KW - Atmospheric pressure plasma jet KW - film deposition KW - zinc. UR - https://doi.org/10.1515/chem-2015-0020 L2 - https://doi.org/10.1515/chem-2015-0020 N2 - The aim of this work was to deposit Zn-containing films on Si substrates using the commercial atmospheric pressure plasma jet “kINPen’09”. In preliminary experiments Zn-containing films were deposited on the substrates immersed in water solutions of Zn(NO3)2.6H2O salt. The surface composition of deposited films was analyzed by XPS (X-ray photoelectron spectroscopy) technique while the bulk composition was studied by means of XRD (X-ray diffraction) mesurements. The film thickness was measured by a profilometer. We have found out, that the concentration of the zinc nitrate solution as well as changes in the deposition time result in a large fluctuation of the deposited film thickness. However, the successful deposition of the Zn-containing films on the Si substrate was definitely confirmed ER -
GALMIZ, Oleksandr, Monika STUPAVSKÁ, Harm WULFF, Holger KERSTEN, Antonín BRABLEC a Mirko ČERNÁK. Deposition of Zn-containing films using atmospheric pressure plasma jet. \textit{Open chemistry}. De Gruyter Open, 2014, roč.~13, č.~1, s.~198-203. ISSN~2391-5420. Dostupné z: https://dx.doi.org/10.1515/chem-2015-0020.
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