| GALMIZ, Oleksandr, Monika STUPAVSKÁ, Harm WULFF, Holger KERSTEN, Antonín BRABLEC a Mirko ČERNÁK. Deposition of Zn-containing films using atmospheric pressure plasma jet. Open chemistry. De Gruyter Open, 2014, roč. 13, č. 1, s. 198-203. ISSN 2391-5420. Dostupné z: https://dx.doi.org/10.1515/chem-2015-0020. |
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@article{1227684,
author = {Galmiz, Oleksandr and Stupavská, Monika and Wulff, Harm and Kersten, Holger and Brablec, Antonín and Černák, Mirko},
article_number = {1},
doi = {http://dx.doi.org/10.1515/chem-2015-0020},
keywords = {Atmospheric pressure plasma jet; film deposition; zinc.},
language = {eng},
issn = {2391-5420},
journal = {Open chemistry},
title = {Deposition of Zn-containing films using atmospheric pressure plasma jet},
url = {https://doi.org/10.1515/chem-2015-0020},
volume = {13},
year = {2014}
}
TY - JOUR
ID - 1227684
AU - Galmiz, Oleksandr - Stupavská, Monika - Wulff, Harm - Kersten, Holger - Brablec, Antonín - Černák, Mirko
PY - 2014
TI - Deposition of Zn-containing films using atmospheric pressure plasma jet
JF - Open chemistry
VL - 13
IS - 1
SP - 198-203
EP - 198-203
PB - De Gruyter Open
SN - 23915420
KW - Atmospheric pressure plasma jet
KW - film deposition
KW - zinc.
UR - https://doi.org/10.1515/chem-2015-0020
L2 - https://doi.org/10.1515/chem-2015-0020
N2 - The aim of this work was to deposit Zn-containing films on Si substrates using the commercial atmospheric pressure plasma jet “kINPen’09”. In preliminary experiments Zn-containing films were deposited on the substrates immersed in water solutions of Zn(NO3)2.6H2O salt. The surface composition of deposited films was analyzed by XPS (X-ray photoelectron spectroscopy) technique while the bulk composition was studied by means of XRD (X-ray diffraction) mesurements. The film thickness was measured by a profilometer. We have found out, that the concentration of the zinc nitrate solution as well as changes in the deposition time result in a large fluctuation of the deposited film thickness. However, the successful deposition of the Zn-containing films on the Si substrate was definitely confirmed
ER -
GALMIZ, Oleksandr, Monika STUPAVSKÁ, Harm WULFF, Holger KERSTEN, Antonín BRABLEC a Mirko ČERNÁK. Deposition of Zn-containing films using atmospheric pressure plasma jet. \textit{Open chemistry}. De Gruyter Open, 2014, roč.~13, č.~1, s.~198-203. ISSN~2391-5420. Dostupné z: https://dx.doi.org/10.1515/chem-2015-0020.
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