Deposition of Zn-containing films using atmospheric pressure
plasma jet

J 2015

Deposition of Zn-containing films using atmospheric pressure plasma jet

GALMIZ, Oleksandr; Monika STUPAVSKÁ; Harm WULFF; Holger KERSTEN; Antonín BRABLEC et. al.

Základní údaje

Originální název

Deposition of Zn-containing films using atmospheric pressure plasma jet

Autoři

GALMIZ, Oleksandr (804 Ukrajina, domácí); Monika STUPAVSKÁ (703 Slovensko, domácí); Harm WULFF (276 Německo); Holger KERSTEN (276 Německo); Antonín BRABLEC (203 Česká republika, garant, domácí) a Mirko ČERNÁK (703 Slovensko, domácí)

Vydání

Open Chemistry, De Gruyter Open, 2015, 2391-5420

Další údaje

Jazyk

angličtina

Typ výsledku

Článek v odborném periodiku

Obor

10305 Fluids and plasma physics

Stát vydavatele

Německo

Utajení

není předmětem státního či obchodního tajemství

Odkazy

URL

Organizační jednotka

Přírodovědecká fakulta

DOI

https://doi.org/10.1515/chem-2015-0020

UT WoS

000355403100023

EID Scopus

2-s2.0-84988255629

Klíčová slova anglicky

Atmospheric pressure plasma jet; film deposition; zinc.

Štítky

AKR, rivok

Příznaky

Mezinárodní význam, Recenzováno

Změněno: 22. 9. 2025 11:21, Mgr. Marie Novosadová Šípková, DiS.

Anotace

V originále

The aim of this work was to deposit Zn-containing films on Si substrates using the commercial atmospheric pressure plasma jet “kINPen’09”. In preliminary experiments Zn-containing films were deposited on the substrates immersed in water solutions of Zn(NO3)2.6H2O salt. The surface composition of deposited films was analyzed by XPS (X-ray photoelectron spectroscopy) technique while the bulk composition was studied by means of XRD (X-ray diffraction) mesurements. The film thickness was measured by a profilometer. We have found out, that the concentration of the zinc nitrate solution as well as changes in the deposition time result in a large fluctuation of the deposited film thickness. However, the successful deposition of the Zn-containing films on the Si substrate was definitely confirmed

Návaznosti

ED2.1.00/03.0086, projekt VaV

Název: Regionální VaV centrum pro nízkonákladové plazmové a nanotechnologické povrchové úpravy

EE2.3.30.0009, projekt VaV

Název: Zaměstnáním čerstvých absolventů doktorského studia k vědecké excelenci

Citovat

GALMIZ, Oleksandr; Monika STUPAVSKÁ; Harm WULFF; Holger KERSTEN; Antonín BRABLEC a Mirko ČERNÁK. Deposition of Zn-containing films using atmospheric pressure plasma jet. Open Chemistry. De Gruyter Open, 2015, roč. 13, č. 1, s. 198-203. ISSN 2391-5420. Dostupné z: https://doi.org/10.1515/chem-2015-0020.

@article{1227684,
   author = {Galmiz, Oleksandr and Stupavská, Monika and Wulff, Harm and Kersten, Holger and Brablec, Antonín and Černák, Mirko},
   article_number = {1},
   doi = {https://doi.org/10.1515/chem-2015-0020},
   keywords = {Atmospheric pressure plasma jet; film deposition; zinc.},
   language = {eng},
   issn = {2391-5420},
   journal = {Open Chemistry},
   title = {Deposition of Zn-containing films using atmospheric pressure plasma jet},
   url = {https://doi.org/10.1515/chem-2015-0020},
   volume = {13},
   year = {2015}
}

TY  - JOUR
ID  - 1227684
AU  - Galmiz, Oleksandr - Stupavská, Monika - Wulff, Harm - Kersten, Holger - Brablec, Antonín - Černák, Mirko
PY  - 2015
TI  - Deposition of Zn-containing films using atmospheric pressure plasma jet
JF  - Open Chemistry
VL  - 13
IS  - 1
SP  - 198-203
EP  - 198-203
PB  - De Gruyter Open
SN  - 23915420
KW  - Atmospheric pressure plasma jet
KW  - film deposition
KW  - zinc.
UR  - https://doi.org/10.1515/chem-2015-0020
L2  - https://doi.org/10.1515/chem-2015-0020
N2  - The aim of this work was to deposit Zn-containing films on Si substrates using the commercial atmospheric pressure plasma jet “kINPen’09”. In preliminary experiments Zn-containing films were deposited on the substrates immersed in water solutions of Zn(NO3)2.6H2O salt. The surface composition of deposited films was analyzed by XPS (X-ray photoelectron spectroscopy) technique while the bulk composition was studied by means of XRD (X-ray diffraction) mesurements. The film thickness was measured by a profilometer. We have found out, that the concentration of the zinc nitrate solution as well as changes in the deposition time result in a large fluctuation of the deposited film thickness. However, the successful deposition of the Zn-containing films on the Si substrate was definitely confirmed
ER  -

GALMIZ, Oleksandr; Monika STUPAVSKÁ; Harm WULFF; Holger KERSTEN; Antonín BRABLEC a Mirko ČERNÁK. Deposition of Zn-containing films using atmospheric pressure plasma jet. \textit{Open Chemistry}. De Gruyter Open, 2015, roč.~13, č.~1, s.~198-203. ISSN~2391-5420. Dostupné z: https://doi.org/10.1515/chem-2015-0020.

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