Calculations and surface quality measurements of high-asymmetry
angle x-ray crystal monochromators for advanced x-ray imaging
and metrological applications

J 2015

Calculations and surface quality measurements of high-asymmetry angle x-ray crystal monochromators for advanced x-ray imaging and metrological applications

ZÁPRAŽNÝ, Z., D. KORYTÁR, M. JERGEL, P. ŠIFFALOVIČ, E. DOBROČKA et. al.

Základní údaje

Originální název

Calculations and surface quality measurements of high-asymmetry angle x-ray crystal monochromators for advanced x-ray imaging and metrological applications

Autoři

ZÁPRAŽNÝ, Z. (703 Slovensko), D. KORYTÁR (703 Slovensko), M. JERGEL (703 Slovensko), P. ŠIFFALOVIČ (703 Slovensko), E. DOBROČKA (703 Slovensko), P. VAGOVIČ (703 Slovensko), C. FERRARI (703 Slovensko), Petr MIKULÍK (203 Česká republika, garant, domácí), M. DEMYDENKO (643 Rusko) a M. MIKLOŠKA (703 Slovensko)

Vydání

Optical Engineering, 2015, 0091-3286

Další údaje

Jazyk

angličtina

Typ výsledku

Článek v odborném periodiku

Obor

10302 Condensed matter physics

Stát vydavatele

Spojené státy

Utajení

není předmětem státního či obchodního tajemství

Odkazy

URL

Impakt faktor

Impact factor: 0.984

Kód RIV

RIV/00216224:14310/15:00082630

Organizační jednotka

Přírodovědecká fakulta

DOI

http://dx.doi.org/10.1117/1.OE.54.3.035101

UT WoS

000351587500029

Klíčová slova anglicky

Crystals ; Monochromators ; Simulations ; Surface quality testing ; X-ray imaging ; X-rays ; Germanium ; Single point diamond turning ; Polishing

Štítky

AKR, rivok, TestovaciVerejnyStitek

Změněno: 29. 3. 2016 14:50, Ing. Andrea Mikešková

Anotace

V originále

We present the numerical optimization and the technological development progress of x-ray optics based on asymmetric germanium crystals. We show the results of several basic calculations of diffraction properties of germanium x-ray crystal monochromators and of an analyzer-based imaging method for various asymmetry factors using an x-ray energy range from 8 to 20 keV. The important parameter of highly asymmetric monochromators as image magnifiers or compressors is the crystal surface quality. We have applied several crystal surface finishing methods, including advanced nanomachining using single-point diamond turning (SPDT), conventional mechanical lapping, chemical polishing, and chemomechanical polishing, and we have evaluated these methods by means of atomic force microscopy, diffractometry, reciprocal space mapping, and others. Our goal is to exclude the chemical etching methods as the final processing technique because it causes surface undulations. The aim is to implement very precise deterministic methods with a control of surface roughness down to 0.1 nm. The smallest roughness (~0.3 nm), best planarity, and absence of the subsurface damage were observed for the sample which was machined using an SPDT with a feed rate of 1 mm/min and was consequently polished using a fine polishing 15-min process with a solution containing SiO2 nanoparticles (20 nm).

Návaznosti

ED1.1.00/02.0068, projekt VaV

Název: CEITEC - central european institute of technology

Citovat

ZÁPRAŽNÝ, Z., D. KORYTÁR, M. JERGEL, P. ŠIFFALOVIČ, E. DOBROČKA, P. VAGOVIČ, C. FERRARI, Petr MIKULÍK, M. DEMYDENKO a M. MIKLOŠKA. Calculations and surface quality measurements of high-asymmetry angle x-ray crystal monochromators for advanced x-ray imaging and metrological applications. Optical Engineering. 2015, roč. 54, č. 3, s. "035101-1"-"035101-12", 12 s. ISSN 0091-3286. Dostupné z: https://dx.doi.org/10.1117/1.OE.54.3.035101.

@article{1232657,
   author = {Zápražný, Z. and Korytár, D. and Jergel, M. and Šiffalovič, P. and Dobročka, E. and Vagovič, P. and Ferrari, C. and Mikulík, Petr and Demydenko, M. and Mikloška, M.},
   article_number = {3},
   doi = {http://dx.doi.org/10.1117/1.OE.54.3.035101},
   keywords = {Crystals ; Monochromators ; Simulations ; Surface quality testing ; X-ray imaging ; X-rays ; Germanium ; Single point diamond turning ; Polishing},
   language = {eng},
   issn = {0091-3286},
   journal = {Optical Engineering},
   title = {Calculations and surface quality measurements of high-asymmetry angle x-ray crystal monochromators for advanced x-ray imaging and metrological applications},
   url = {http://spie.org/Publications/Journal/10.1117/1.OE.54.3.035101},
   volume = {54},
   year = {2015}
}

TY  - JOUR
ID  - 1232657
AU  - Zápražný, Z. - Korytár, D. - Jergel, M. - Šiffalovič, P. - Dobročka, E. - Vagovič, P. - Ferrari, C. - Mikulík, Petr - Demydenko, M. - Mikloška, M.
PY  - 2015
TI  - Calculations and surface quality measurements of high-asymmetry angle x-ray crystal monochromators for advanced x-ray imaging and metrological applications
JF  - Optical Engineering
VL  - 54
IS  - 3
SP  - "035101-1"-"035101-12"
EP  - "035101-1"-"035101-12"
SN  - 00913286
KW  - Crystals
KW  - Monochromators
KW  - Simulations
KW  - Surface quality testing
KW  - X-ray imaging
KW  - X-rays
KW  - Germanium
KW  - Single point diamond turning
KW  - Polishing
UR  - http://spie.org/Publications/Journal/10.1117/1.OE.54.3.035101
N2  - We present the numerical optimization and the technological development progress of x-ray optics based on asymmetric germanium crystals. We show the results of several basic calculations of diffraction properties of germanium x-ray crystal monochromators and of an analyzer-based imaging method for various asymmetry factors using an x-ray energy range from 8 to 20 keV. The important parameter of highly asymmetric monochromators as image magnifiers or compressors is the crystal surface quality. We have applied several crystal surface finishing methods, including advanced nanomachining using single-point diamond turning (SPDT), conventional mechanical lapping, chemical polishing, and chemomechanical polishing, and we have evaluated these methods by means of atomic force microscopy, diffractometry, reciprocal space mapping, and others. Our goal is to exclude the chemical etching methods as the final processing technique because it causes surface undulations. The aim is to implement very precise deterministic methods with a control of surface roughness down to 0.1 nm. The smallest roughness (~0.3 nm), best planarity, and absence of the subsurface damage were observed for the sample which was machined using an SPDT with a feed rate of 1 mm/min and was consequently polished using a fine polishing 15-min process with a solution containing SiO2 nanoparticles (20 nm).
ER  -

ZÁPRAŽNÝ, Z., D. KORYTÁR, M. JERGEL, P. ŠIFFALOVIČ, E. DOBROČKA, P. VAGOVIČ, C. FERRARI, Petr MIKULÍK, M. DEMYDENKO a M. MIKLOŠKA. Calculations and surface quality measurements of high-asymmetry angle x-ray crystal monochromators for advanced x-ray imaging and metrological applications. \textit{Optical Engineering}. 2015, roč.~54, č.~3, s.~''035101-1''-''035101-12'', 12 s. ISSN~0091-3286. Dostupné z: https://dx.doi.org/10.1117/1.OE.54.3.035101.

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