a 2015

Reactive argon/acetylene HiPIMS discharge – time-resolved diagnostic of present species

HNILICA, Jaroslav; Pavel SOUČEK; Katarína BERNÁTOVÁ and Petr VAŠINA

Basic information

Original name

Reactive argon/acetylene HiPIMS discharge – time-resolved diagnostic of present species

Authors

HNILICA, Jaroslav; Pavel SOUČEK; Katarína BERNÁTOVÁ and Petr VAŠINA

Edition

6th Central European Symposium on Plasma Chemistry, 2015

Other information

Language

English

Type of outcome

Conference abstract

Field of Study

10305 Fluids and plasma physics

Country of publisher

Italy

Confidentiality degree

is not subject to a state or trade secret

RIV identification code

RIV/00216224:14310/15:00081051

Organization unit

Faculty of Science

ISBN

978-88-6938-045-7

Keywords in English

HiPIMS; acetylene; OES; titanium

Tags

International impact
Changed: 7/12/2015 11:05, doc. Mgr. Jaroslav Hnilica, Ph.D.

Abstract

In the original language

Temporal evolution of the selected emission line intensities – H line, atom and ion line of Ti and Ar – were measured during the 400us HiPIMS pulse for different acetylene flows. Moreover, densities of sputtered titanium atoms and ions in their ground levels were determined using spectroscopic technique based on effective branching fractions. The technique is based on fitting theoretically calculated branching fractions to experimentally measured fractions of the relative intensities of carefully selected lines of the measured species. Dependencies of intensities of selected species and Ti atom and ion densities on discharge current evolution were studied and were compared for selected acetylene flows. The studied acetylene flow (1-5 sccm) covered the composition of the deposited coatings from titanium rich coating with only a small amount of carbon to carbon rich coating with only a small amount of titanium, whereas the coating with approximately 50% of titanium and 50% of carbon shows generally the highest hardness.

Links

ED2.1.00/03.0086, research and development project
Name: Regionální VaV centrum pro nízkonákladové plazmové a nanotechnologické povrchové úpravy
GAP205/12/0407, research and development project
Name: Porozumění hybridnímu PVD-PECVD procesu s cílem řídit růst nanostrukturovaných kompozitních vrstev
Investor: Czech Science Foundation
GA15-00863S, research and development project
Name: Studium impulzních plazmatických systémů k depozici tenkých vrstev pro fotonické aplikace
Investor: Czech Science Foundation
LO1411, research and development project
Name: Rozvoj centra pro nízkonákladové plazmové a nanotechnologické povrchové úpravy (Acronym: CEPLANT plus)
Investor: Ministry of Education, Youth and Sports of the CR