ISA, F., M. SALVALAGLIO, YAR. DASILVA, Mojmír MEDUŇA, M. BARGET, A. JUNG, T. KREILIGER, Gisella CANO I RUIZ, R. ERNI, F. PEZZOLI, E. BONERA, P. NIEDERMANN, P. GRONING, F. MONTALENTI a Hans VON KAENEL. Highly Mismatched, Dislocation-Free SiGe/Si Heterostructures. ADVANCED MATERIALS. WEINHEIM: WILEY-V C H VERLAG GMBH, 2016, roč. 28, č. 5, s. 884-888. ISSN 0935-9648. Dostupné z: https://dx.doi.org/10.1002/adma.201504029. |
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@article{1338590, author = {Isa, F. and Salvalaglio, M. and Dasilva, YAR. and Meduňa, Mojmír and Barget, M. and Jung, A. and Kreiliger, T. and Cano i Ruiz, Gisella and Erni, R. and Pezzoli, F. and Bonera, E. and Niedermann, P. and Groning, P. and Montalenti, F. and von Kaenel, Hans}, article_location = {WEINHEIM}, article_number = {5}, doi = {http://dx.doi.org/10.1002/adma.201504029}, keywords = {heteroepitaxy; heterostructures; strain relaxation; SiGe; substrate patterning}, language = {eng}, issn = {0935-9648}, journal = {ADVANCED MATERIALS}, title = {Highly Mismatched, Dislocation-Free SiGe/Si Heterostructures}, url = {http://onlinelibrary.wiley.com/doi/10.1002/adma.201504029/abstract}, volume = {28}, year = {2016} }
TY - JOUR ID - 1338590 AU - Isa, F. - Salvalaglio, M. - Dasilva, YAR. - Meduňa, Mojmír - Barget, M. - Jung, A. - Kreiliger, T. - Cano i Ruiz, Gisella - Erni, R. - Pezzoli, F. - Bonera, E. - Niedermann, P. - Groning, P. - Montalenti, F. - von Kaenel, Hans PY - 2016 TI - Highly Mismatched, Dislocation-Free SiGe/Si Heterostructures JF - ADVANCED MATERIALS VL - 28 IS - 5 SP - 884-888 EP - 884-888 PB - WILEY-V C H VERLAG GMBH SN - 09359648 KW - heteroepitaxy KW - heterostructures KW - strain relaxation KW - SiGe KW - substrate patterning UR - http://onlinelibrary.wiley.com/doi/10.1002/adma.201504029/abstract L2 - http://onlinelibrary.wiley.com/doi/10.1002/adma.201504029/abstract N2 - Defect-free mismatched heterostructures on Si substrates are produced by an innovative strategy. The strain relaxation is engineered to occur elastically rather than plastically by combining suitable substrate patterning and vertical crystal growth with compositional grading. ER -
ISA, F., M. SALVALAGLIO, YAR. DASILVA, Mojmír MEDUŇA, M. BARGET, A. JUNG, T. KREILIGER, Gisella CANO I RUIZ, R. ERNI, F. PEZZOLI, E. BONERA, P. NIEDERMANN, P. GRONING, F. MONTALENTI a Hans VON KAENEL. Highly Mismatched, Dislocation-Free SiGe/Si Heterostructures. \textit{ADVANCED MATERIALS}. WEINHEIM: WILEY-V C H VERLAG GMBH, 2016, roč.~28, č.~5, s.~884-888. ISSN~0935-9648. Dostupné z: https://dx.doi.org/10.1002/adma.201504029.
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