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@article{1339202, author = {Homola, Tomáš and Prysiazhnyi, Vadym and Stupavská, Monika}, article_number = {5/6}, doi = {http://dx.doi.org/10.1504/IJNM.2015.075226}, keywords = {nano-modification;silicon wafer;surface treatment;diffuse plasma;DBD}, language = {eng}, issn = {1746-9392}, journal = {International Journal of Nanomanufacturing}, title = {Nano-modification of Si-wafer surfaces using low-cost ambient air diffuse plasma}, url = {http://www.inderscience.com/info/inarticle.php?artid=75226}, volume = {11}, year = {2015} }
TY - JOUR ID - 1339202 AU - Homola, Tomáš - Prysiazhnyi, Vadym - Stupavská, Monika PY - 2015 TI - Nano-modification of Si-wafer surfaces using low-cost ambient air diffuse plasma JF - International Journal of Nanomanufacturing VL - 11 IS - 5/6 SP - 237-244 EP - 237-244 SN - 17469392 KW - nano-modification;silicon wafer;surface treatment;diffuse plasma;DBD UR - http://www.inderscience.com/info/inarticle.php?artid=75226 N2 - In this paper, we demonstrated the cleaning and nano-oxidation of Si-wafer surfaces by atmospheric pressure plasma, generated in ambient air using diffuse coplanar surface barrier discharge. Plasma treatment for one second resulted in a significant reduction of water contact angle. The increase in wettability was observed and explained by chemical changes on the analysed Si-wafer surfaces. These changes were analysed by X-ray photoelectron spectroscopy which showed a considerable decrease in the presence of carbon and a significant increase of oxygen on the analysed surfaces. ER -
HOMOLA, Tomáš, Vadym PRYSIAZHNYI a Monika STUPAVSKÁ. Nano-modification of Si-wafer surfaces using low-cost ambient air diffuse plasma. \textit{International Journal of Nanomanufacturing}. 2015, roč.~11, 5/6, s.~237-244. ISSN~1746-9392. Dostupné z: https://dx.doi.org/10.1504/IJNM.2015.075226.
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