Simultaneous determination of dispersion model parameters and
local thickness of thin films by imaging spectrophotometry

J 2015

Simultaneous determination of dispersion model parameters and local thickness of thin films by imaging spectrophotometry

NEČAS, David; Jiří VODÁK; Ivan OHLÍDAL; Miloslav OHLÍDAL; Abhijit MAJUMDAR et al.

Základní údaje

Originální název

Simultaneous determination of dispersion model parameters and local thickness of thin films by imaging spectrophotometry

Autoři

NEČAS, David; Jiří VODÁK; Ivan OHLÍDAL; Miloslav OHLÍDAL; Abhijit MAJUMDAR a Lenka ZAJÍČKOVÁ

Vydání

Applied Surface Science, Elsevier, 2015, 0169-4332

Další údaje

Jazyk

angličtina

Typ výsledku

Článek v odborném periodiku

Obor

10306 Optics

Stát vydavatele

Velká Británie a Severní Irsko

Utajení

není předmětem státního či obchodního tajemství

Impakt faktor

Impact factor: 3.150

Označené pro přenos do RIV

Ano

Kód RIV

RIV/00216224:14740/15:00080452

Organizační jednotka

Středoevropský technologický institut

Klíčová slova anglicky

Imaging spectrophotometry; Levenberg-Marquardt; Non-linear least-squares; Optical properties; Thickness mapping; Thin films

Štítky

podil, rivok

Příznaky

Mezinárodní význam, Recenzováno

Změněno: 18. 5. 2017 14:58, Mgr. Eva Špillingová

Anotace

V originále

A least-squares data fitting procedure is developed for the analysis of measurements of thin films non-uniform in thickness by imaging spectroscopic reflectometry. It solves the problem of simultaneous least-squares fitting of film thicknesses in all image pixels together with shared dispersion model parameters. Since the huge number of mutually correlated fitting parameters prevents a straightforward application of the standard Levenberg-Marquardt algorithm, the presented procedure exploits the special structure of the specific least-squares problem. The free parameters are split into thicknesses and dispersion model parameters. Both groups of parameters are fitted alternately, utilising an unmodified Levenberg-Marquardt algorithm, correcting however the thicknesses during the dispersion model fitting step to preserve effective optical thicknesses. The behaviour of the algorithm is studied using experimental data of two highly non-uniform thin films of different materials, SiOxCyHz and CNx:H, and by numerical simulations using artificial data. It is found that the optical thickness correction enables the procedure to converge rapidly, permitting the analysis of large imaging spectroscopic reflectometry data sets with reasonable computational resources. © 2015 Elsevier B.V. All rights reserved.

Návaznosti

ED1.1.00/02.0068, projekt VaV

Název: CEITEC - central european institute of technology

ED2.1.00/03.0086, projekt VaV

Název: Regionální VaV centrum pro nízkonákladové plazmové a nanotechnologické povrchové úpravy

TA02010784, projekt VaV

Název: Optimalizace vrstevnatých systémů používaných v optickém průmyslu

Investor: Technologická agentura ČR, Optimalizace vrstevnatých systémů používaných v optickém průmyslu

Přiložené soubory

ZVV_2015_1340778_Simultaneous_determination.pdf

Požádat o autorskou verzi souboru

Citovat

NEČAS, David; Jiří VODÁK; Ivan OHLÍDAL; Miloslav OHLÍDAL; Abhijit MAJUMDAR a Lenka ZAJÍČKOVÁ. Simultaneous determination of dispersion model parameters and local thickness of thin films by imaging spectrophotometry. Applied Surface Science. Elsevier, 2015, roč. 350, SEP, s. 149-155. ISSN 0169-4332. Dostupné z: https://doi.org/10.1016/j.apsusc.2015.01.093.

@article{1340778,
   author = {Nečas, David and Vodák, Jiří and Ohlídal, Ivan and Ohlídal, Miloslav and Majumdar, Abhijit and Zajíčková, Lenka},
   article_number = {SEP},
   doi = {https://doi.org/10.1016/j.apsusc.2015.01.093},
   keywords = {Imaging spectrophotometry; Levenberg-Marquardt; Non-linear least-squares; Optical properties; Thickness mapping; Thin films},
   language = {eng},
   issn = {0169-4332},
   journal = {Applied Surface Science},
   title = {Simultaneous determination of dispersion model parameters and local thickness of thin films by imaging spectrophotometry},
   volume = {350},
   year = {2015}
}

TY  - JOUR
ID  - 1340778
AU  - Nečas, David - Vodák, Jiří - Ohlídal, Ivan - Ohlídal, Miloslav - Majumdar, Abhijit - Zajíčková, Lenka
PY  - 2015
TI  - Simultaneous determination of dispersion model parameters and local thickness of thin films by imaging spectrophotometry
JF  - Applied Surface Science
VL  - 350
IS  - SEP
SP  - 149-155
EP  - 149-155
PB  - Elsevier
SN  - 01694332
KW  - Imaging spectrophotometry
KW  - Levenberg-Marquardt
KW  - Non-linear least-squares
KW  - Optical properties
KW  - Thickness mapping
KW  - Thin films
N2  - A least-squares data fitting procedure is developed for the analysis of measurements of thin films non-uniform in thickness by imaging spectroscopic reflectometry. It solves the problem of simultaneous least-squares fitting of film thicknesses in all image pixels together with shared dispersion model parameters. Since the huge number of mutually correlated fitting parameters prevents a straightforward application of the standard Levenberg-Marquardt algorithm, the presented procedure exploits the special structure of the specific least-squares problem. The free parameters are split into thicknesses and dispersion model parameters. Both groups of parameters are fitted alternately, utilising an unmodified Levenberg-Marquardt algorithm, correcting however the thicknesses during the dispersion model fitting step to preserve effective optical thicknesses. The behaviour of the algorithm is studied using experimental data of two highly non-uniform thin films of different materials, SiOxCyHz and CNx:H, and by numerical simulations using artificial data. It is found that the optical thickness correction enables the procedure to converge rapidly, permitting the analysis of large imaging spectroscopic reflectometry data sets with reasonable computational resources. © 2015 Elsevier B.V. All rights reserved.
ER  -

NEČAS, David; Jiří VODÁK; Ivan OHLÍDAL; Miloslav OHLÍDAL; Abhijit MAJUMDAR a Lenka ZAJÍČKOVÁ. Simultaneous determination of dispersion model parameters and local thickness of thin films by imaging spectrophotometry. \textit{Applied Surface Science}. Elsevier, 2015, roč.~350, SEP, s.~149-155. ISSN~0169-4332. Dostupné z: https://doi.org/10.1016/j.apsusc.2015.01.093.

Přehled o publikaci