Plasma enhanced chemical vapor deposition of organosilicon thin
films on electrospun polymer nanofibers

D 2013

Plasma enhanced chemical vapor deposition of organosilicon thin films on electrospun polymer nanofibers

ZAJÍČKOVÁ, Lenka; Eva KEDROŇOVÁ; Dirk HEGEMANN; Eliška MIKMEKOVÁ; Miloš KLÍMA et al.

Základní údaje

Originální název

Plasma enhanced chemical vapor deposition of organosilicon thin films on electrospun polymer nanofibers

Autoři

ZAJÍČKOVÁ, Lenka; Eva KEDROŇOVÁ; Dirk HEGEMANN; Eliška MIKMEKOVÁ; Miloš KLÍMA a Miroslav MICHLÍČEK

Vydání

Bratislava, Book of Contributed Papers: 19th Symposium on Application of Plasma Processes, od s. 121-124, 4 s. 2013

Nakladatel

Department of Experimental Physics, Faculty of Mathematics, Physics and Informatics, Comenius University in Bratislava (Slovakia)

Další údaje

Jazyk

angličtina

Typ výsledku

Stať ve sborníku

Obor

10305 Fluids and plasma physics

Stát vydavatele

Slovensko

Utajení

není předmětem státního či obchodního tajemství

Forma vydání

paměťový nosič (CD, DVD, flash disk)

Odkazy

URL

Označené pro přenos do RIV

Ano

Kód RIV

RIV/00216224:14310/13:00088806

Organizační jednotka

Přírodovědecká fakulta

ISBN

978-80-8147-004-2

Klíčová slova anglicky

PECVD; organosilocon layers; nanofibers

Změněno: 1. 4. 2017 17:18, Mgr. Eva Dvořáková, Ph.D.

Anotace

V originále

Organosilicon plasma polymers were prepared from hexamethyldisiloxane / argon mixtures in low pressure rf discharges with capacitive coupling and by cold rf plasma multi-jet working at atmospheric pressure. The frequency of applied voltage was in both cases 13.56 MHz. The films were prepared on PVA and PA6 electrospun fabrics and on silicon and glass substrates for reference purposes. The coatings were characterized by scanning electron microscopy (SEM), Fourier transform infrared spectroscopy, atomic force microscopy and contact angle measurement. SEM revealed that the microstructure of coatings differed significantly when changing the plasma conditions.

Návaznosti

ED1.1.00/02.0068, projekt VaV

Název: CEITEC - central european institute of technology

GA13-20031S, projekt VaV

Název: Vlastnosti hydrofobních povrchů v interakci s kapalinou

Investor: Grantová agentura ČR, Vlastnosti hydrofobních povrchů v interakci s kapalinou

Citovat

ZAJÍČKOVÁ, Lenka; Eva KEDROŇOVÁ; Dirk HEGEMANN; Eliška MIKMEKOVÁ; Miloš KLÍMA a Miroslav MICHLÍČEK. Plasma enhanced chemical vapor deposition of organosilicon thin films on electrospun polymer nanofibers. In J. Országh, P. Papp, Š. Matejčík, M. Danko. Book of Contributed Papers: 19th Symposium on Application of Plasma Processes. Bratislava: Department of Experimental Physics, Faculty of Mathematics, Physics and Informatics, Comenius University in Bratislava (Slovakia), 2013, s. 121-124. ISBN 978-80-8147-004-2.

@inproceedings{1377045,
   author = {Zajíčková, Lenka and Kedroňová, Eva and Hegemann, Dirk and Mikmeková, Eliška and Klíma, Miloš and Michlíček, Miroslav},
   address = {Bratislava},
   booktitle = {Book of Contributed Papers: 19th Symposium on Application of Plasma Processes},
   editor = {J. Országh, P. Papp, Š. Matejčík, M. Danko},
   keywords = {PECVD; organosilocon layers; nanofibers},
   howpublished = {paměťový nosič},
   language = {eng},
   location = {Bratislava},
   isbn = {978-80-8147-004-2},
   pages = {121-124},
   publisher = {Department of Experimental Physics, Faculty of Mathematics, Physics and Informatics, Comenius University in Bratislava (Slovakia)},
   title = {Plasma enhanced chemical vapor deposition of organosilicon thin films on electrospun polymer nanofibers},
   url = {http://neon.dpp.fmph.uniba.sk/sapp},
   year = {2013}
}

TY  - CONF
ID  - 1377045
AU  - Zajíčková, Lenka - Kedroňová, Eva - Hegemann, Dirk - Mikmeková, Eliška - Klíma, Miloš - Michlíček, Miroslav
PY  - 2013
TI  - Plasma enhanced chemical vapor deposition of organosilicon thin films on electrospun polymer nanofibers
PB  - Department of Experimental Physics, Faculty of Mathematics, Physics and Informatics, Comenius University in Bratislava (Slovakia)
CY  - Bratislava
SN  - 9788081470042
KW  - PECVD
KW  - organosilocon layers
KW  - nanofibers
UR  - http://neon.dpp.fmph.uniba.sk/sapp
N2  - Organosilicon plasma polymers were prepared from hexamethyldisiloxane / argon mixtures in low pressure rf discharges with capacitive coupling and by cold rf plasma multi-jet working at atmospheric pressure. The frequency of applied voltage was in both cases 13.56 MHz. The films were prepared on PVA and PA6 electrospun fabrics and on silicon and glass substrates for reference purposes. The coatings were characterized by scanning electron microscopy (SEM), Fourier transform infrared spectroscopy, atomic force microscopy and contact angle measurement. SEM revealed that the microstructure of coatings differed significantly when changing the plasma conditions.
ER  -

ZAJÍČKOVÁ, Lenka; Eva KEDROŇOVÁ; Dirk HEGEMANN; Eliška MIKMEKOVÁ; Miloš KLÍMA a Miroslav MICHLÍČEK. Plasma enhanced chemical vapor deposition of organosilicon thin films on electrospun polymer nanofibers. In J. Országh, P. Papp, Š. Matejčík, M. Danko. \textit{Book of Contributed Papers: 19th Symposium on Application of Plasma Processes}. Bratislava: Department of Experimental Physics, Faculty of Mathematics, Physics and Informatics, Comenius University in Bratislava (Slovakia), 2013, s.~121-124. ISBN~978-80-8147-004-2.

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