ZAJÍČKOVÁ, Lenka, Eva KEDROŇOVÁ, Dirk HEGEMANN, Eliška MIKMEKOVÁ, Miloš KLÍMA a Miroslav MICHLÍČEK. Plasma enhanced chemical vapor deposition of organosilicon thin films on electrospun polymer nanofibers. In J. Országh, P. Papp, Š. Matejčík, M. Danko. Book of Contributed Papers: 19th Symposium on Application of Plasma Processes. Bratislava: Department of Experimental Physics, Faculty of Mathematics, Physics and Informatics, Comenius University in Bratislava (Slovakia), 2013, s. 121-124. ISBN 978-80-8147-004-2. |
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@inproceedings{1377045, author = {Zajíčková, Lenka and Kedroňová, Eva and Hegemann, Dirk and Mikmeková, Eliška and Klíma, Miloš and Michlíček, Miroslav}, address = {Bratislava}, booktitle = {Book of Contributed Papers: 19th Symposium on Application of Plasma Processes}, editor = {J. Országh, P. Papp, Š. Matejčík, M. Danko}, keywords = {PECVD; organosilocon layers; nanofibers}, howpublished = {paměťový nosič}, language = {eng}, location = {Bratislava}, isbn = {978-80-8147-004-2}, pages = {121-124}, publisher = {Department of Experimental Physics, Faculty of Mathematics, Physics and Informatics, Comenius University in Bratislava (Slovakia)}, title = {Plasma enhanced chemical vapor deposition of organosilicon thin films on electrospun polymer nanofibers}, url = {http://neon.dpp.fmph.uniba.sk/sapp}, year = {2013} }
TY - JOUR ID - 1377045 AU - Zajíčková, Lenka - Kedroňová, Eva - Hegemann, Dirk - Mikmeková, Eliška - Klíma, Miloš - Michlíček, Miroslav PY - 2013 TI - Plasma enhanced chemical vapor deposition of organosilicon thin films on electrospun polymer nanofibers PB - Department of Experimental Physics, Faculty of Mathematics, Physics and Informatics, Comenius University in Bratislava (Slovakia) CY - Bratislava SN - 9788081470042 KW - PECVD KW - organosilocon layers KW - nanofibers UR - http://neon.dpp.fmph.uniba.sk/sapp N2 - Organosilicon plasma polymers were prepared from hexamethyldisiloxane / argon mixtures in low pressure rf discharges with capacitive coupling and by cold rf plasma multi-jet working at atmospheric pressure. The frequency of applied voltage was in both cases 13.56 MHz. The films were prepared on PVA and PA6 electrospun fabrics and on silicon and glass substrates for reference purposes. The coatings were characterized by scanning electron microscopy (SEM), Fourier transform infrared spectroscopy, atomic force microscopy and contact angle measurement. SEM revealed that the microstructure of coatings differed significantly when changing the plasma conditions. ER -
ZAJÍČKOVÁ, Lenka, Eva KEDROŇOVÁ, Dirk HEGEMANN, Eliška MIKMEKOVÁ, Miloš KLÍMA a Miroslav MICHLÍČEK. Plasma enhanced chemical vapor deposition of organosilicon thin films on electrospun polymer nanofibers. In J. Országh, P. Papp, Š. Matejčík, M. Danko. \textit{Book of Contributed Papers: 19th Symposium on Application of Plasma Processes}. Bratislava: Department of Experimental Physics, Faculty of Mathematics, Physics and Informatics, Comenius University in Bratislava (Slovakia), 2013, s.~121-124. ISBN~978-80-8147-004-2.
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