| ZAJÍČKOVÁ, Lenka, Eva KEDROŇOVÁ, Dirk HEGEMANN, Eliška MIKMEKOVÁ, Miloš KLÍMA a Miroslav MICHLÍČEK. Plasma enhanced chemical vapor deposition of organosilicon thin films on electrospun polymer nanofibers. In J. Országh, P. Papp, Š. Matejčík, M. Danko. Book of Contributed Papers: 19th Symposium on Application of Plasma Processes. Bratislava: Department of Experimental Physics, Faculty of Mathematics, Physics and Informatics, Comenius University in Bratislava (Slovakia), 2013, s. 121-124. ISBN 978-80-8147-004-2. |
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@inproceedings{1377045,
author = {Zajíčková, Lenka and Kedroňová, Eva and Hegemann, Dirk and Mikmeková, Eliška and Klíma, Miloš and Michlíček, Miroslav},
address = {Bratislava},
booktitle = {Book of Contributed Papers: 19th Symposium on Application of Plasma Processes},
editor = {J. Országh, P. Papp, Š. Matejčík, M. Danko},
keywords = {PECVD; organosilocon layers; nanofibers},
howpublished = {paměťový nosič},
language = {eng},
location = {Bratislava},
isbn = {978-80-8147-004-2},
pages = {121-124},
publisher = {Department of Experimental Physics, Faculty of Mathematics, Physics and Informatics, Comenius University in Bratislava (Slovakia)},
title = {Plasma enhanced chemical vapor deposition of organosilicon thin films on electrospun polymer nanofibers},
url = {http://neon.dpp.fmph.uniba.sk/sapp},
year = {2013}
}
TY - JOUR
ID - 1377045
AU - Zajíčková, Lenka - Kedroňová, Eva - Hegemann, Dirk - Mikmeková, Eliška - Klíma, Miloš - Michlíček, Miroslav
PY - 2013
TI - Plasma enhanced chemical vapor deposition of organosilicon thin films on electrospun polymer nanofibers
PB - Department of Experimental Physics, Faculty of Mathematics, Physics and Informatics, Comenius University in Bratislava (Slovakia)
CY - Bratislava
SN - 9788081470042
KW - PECVD
KW - organosilocon layers
KW - nanofibers
UR - http://neon.dpp.fmph.uniba.sk/sapp
N2 - Organosilicon plasma polymers were prepared from hexamethyldisiloxane / argon mixtures in low pressure rf discharges with capacitive coupling and by cold rf plasma multi-jet working at atmospheric pressure. The frequency of applied voltage was in both cases 13.56 MHz. The films were prepared on PVA and PA6 electrospun fabrics and on silicon and glass substrates for reference purposes. The coatings were characterized by scanning electron microscopy (SEM), Fourier transform infrared spectroscopy, atomic force microscopy and contact angle measurement. SEM revealed that the microstructure of coatings differed significantly when changing the plasma conditions.
ER -
ZAJÍČKOVÁ, Lenka, Eva KEDROŇOVÁ, Dirk HEGEMANN, Eliška MIKMEKOVÁ, Miloš KLÍMA a Miroslav MICHLÍČEK. Plasma enhanced chemical vapor deposition of organosilicon thin films on electrospun polymer nanofibers. In J. Országh, P. Papp, Š. Matejčík, M. Danko. \textit{Book of Contributed Papers: 19th Symposium on Application of Plasma Processes}. Bratislava: Department of Experimental Physics, Faculty of Mathematics, Physics and Informatics, Comenius University in Bratislava (Slovakia), 2013, s.~121-124. ISBN~978-80-8147-004-2.
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