2017
Electrochemical Preparation of Nanostructures for Amperometric and SERS Sensors
HRBÁČ, Jan, Jan ROZSYPAL, Daniel RIMAN, Vladimír HALOUZKA, Dušan HEMZAL et. al.Základní údaje
Originální název
Electrochemical Preparation of Nanostructures for Amperometric and SERS Sensors
Autoři
HRBÁČ, Jan (203 Česká republika, garant, domácí), Jan ROZSYPAL (203 Česká republika), Daniel RIMAN (203 Česká republika), Vladimír HALOUZKA (203 Česká republika), Dušan HEMZAL (203 Česká republika, domácí) a Vít PAVELKA (203 Česká republika, domácí)
Vydání
1. vyd. Ústí nad Labem, XXXVII. Moderní elektrochemické metody, od s. 62-65, 4 s. 2017
Nakladatel
Srsenová Lenka - BEST servis Ústí nad Labem
Další údaje
Jazyk
angličtina
Typ výsledku
Stať ve sborníku
Obor
10403 Physical chemistry
Stát vydavatele
Česká republika
Utajení
není předmětem státního či obchodního tajemství
Forma vydání
tištěná verze "print"
Kód RIV
RIV/00216224:14310/17:00096909
Organizační jednotka
Přírodovědecká fakulta
ISBN
978-80-905221-5-2
UT WoS
000432424300014
Klíčová slova anglicky
electrochemical plating; electrochemical deposition; nanostructured layers; surface enhanced Raman spectroscopy; amperometry; sensors
Příznaky
Mezinárodní význam, Recenzováno
Změněno: 23. 4. 2020 15:43, Mgr. Marie Šípková, DiS.
Anotace
V originále
Nanofabrication using electrochemical deposition ("plating") is an attractive option due to its running and equipment cost effectiveness. It allows an easy control of the deposition process with high degree of reproducibility through the possibility of adjusting a range of parameters such as voltage/current program, time, temperature, plating bath composition etc. Diverse template methods are currently popular to fabricate periodic arays of metal nanoscopic objects or patterns. However, nanostructured deposits can be achieved also by template-free electrodeposition. Volmer-Weber growth, leading directly to nanostructured metal deposits can be achieved at high overpotentials for the systems with low exchange current densities. Such deposition conditions are met at low concentrations of metal cations to be electroreduced onto a support material for which the heterogenous electron transfer rate is low. Electrochemical dissolution of metal anodes in unsupported medium such as water generates metal oxide/hydroxide material, which can be deposited on a substrate connected as a cathode in the electrochmical cell. Depending on the properties of anode-derived material (zeta potential and conductivity), metal electroreduction or electrophoretic deposition of anode-derived material can be achieved. The above-described strategy is used to deposit silver onto silicon and copper, nickel and copper-copper nickel alloy onto carbon fiber microelectrodes. The nanostructured deposits can be applied as amperometric and SERS sensors.
Návaznosti
LD15058, projekt VaV |
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