Simultaneous determination of optical constants, local
thickness, and local roughness of thin films by imaging
spectroscopic reflectometry

D 2015

Simultaneous determination of optical constants, local thickness, and local roughness of thin films by imaging spectroscopic reflectometry

NEČAS, David, Ivan OHLÍDAL, Jiří VODÁK, Miloslav OHLÍDAL, Daniel FRANTA et. al.

Základní údaje

Originální název

Simultaneous determination of optical constants, local thickness, and local roughness of thin films by imaging spectroscopic reflectometry

Název česky

Současné určení optických konstant, lokální tloušťky a lokální drsnosti tenkých vrstev pomocí zobrazovací spektroskopické refektometrie

Autoři

NEČAS, David (203 Česká republika, garant, domácí), Ivan OHLÍDAL (203 Česká republika, domácí), Jiří VODÁK (203 Česká republika, domácí), Miloslav OHLÍDAL (203 Česká republika) a Daniel FRANTA (203 Česká republika, domácí)

Vydání

9628. vyd. BELLINGHAM, USA, Conference on Optical Systems Design - Optical Fabrication, Testing, and Metrology V, od s. "96280C-1"-"96280C-9", 9 s. 2015

Nakladatel

SPIE-INT SOC OPTICAL ENGINEERING

Další údaje

Jazyk

angličtina

Typ výsledku

Stať ve sborníku

Obor

10302 Condensed matter physics

Stát vydavatele

Spojené státy

Utajení

není předmětem státního či obchodního tajemství

Forma vydání

tištěná verze "print"

Kód RIV

RIV/00216224:14310/15:00094362

Organizační jednotka

Přírodovědecká fakulta

ISBN

978-1-62841-817-0

ISSN

DOI

http://dx.doi.org/10.1117/12.2190091

UT WoS

000366832100005

Klíčová slova anglicky

thin films; roughness; scalar diffraction theory; Rayleigh-Rice theory; spectrophotometry; ellipsometry; imaging techniques; zinc selenide

Štítky

NZ, rivok

Příznaky

Mezinárodní význam, Recenzováno

Změněno: 18. 4. 2018 14:38, Mgr. Michal Petr

Anotace

V originále

A new optical characterization method based on imaging spectroscopic reflectometry (ISR) is presented and illustrated on the characterization of rough non-uniform epitaxial ZnSe films prepared on GaAs substrates. The method allows the determination of all parameters describing the thin films exhibiting boundary roughness and non-uniformity in thickness, i.e. determination of the spectral dependencies of the optical constants, map of local thickness and map of local rms values of heights of the irregularities for the rough boundaries. The local normal reflectance spectra in ISR correspond to small areas (37x37 pm2) on the thin films measured within the spectral range 270-900 nm by pixels of a CCD camera serving as the detector of imaging spectrophotometer constructed in our laboratory. To our experience the small areas corresponding to the pixels are sufficiently small so that the majority of the films can be considered uniform in all parameters within these areas. Boundary roughness is included into the reflectance formulas by means of the scalar diffraction theory (SDT) and the optical constant spectra of the ZnSe films were expressed by the dispersion model based on the parametrization of the joint density of electronic states (PJDOS). In general, there is a correlation between the searched parameters if the individual local reflectance spectra are fitted separately and, therefore, the local reflectance spectra measured for all the pixels are treated simultaneously using so called multi-pixel method in order to remove or reduce this correlation and determine the values of all the parameters with a sufficient accuracy. The results of the optical characterization of the same selected sample of the epitaxial ZnSe thin film obtained using the method presented here and combined method of variable-angle spectroscopic ellipsometry, spectroscopic reflectometry and single-pixel immersion spectroscopic reflectometry are introduced in the contribution as well.

Návaznosti

ED1.1.00/02.0068, projekt VaV

Název: CEITEC - central european institute of technology

ED2.1.00/03.0086, projekt VaV

Název: Regionální VaV centrum pro nízkonákladové plazmové a nanotechnologické povrchové úpravy

TA02010784, projekt VaV

Název: Optimalizace vrstevnatých systémů používaných v optickém průmyslu

Investor: Technologická agentura ČR, Optimalizace vrstevnatých systémů používaných v optickém průmyslu

Citovat

NEČAS, David, Ivan OHLÍDAL, Jiří VODÁK, Miloslav OHLÍDAL a Daniel FRANTA. Simultaneous determination of optical constants, local thickness, and local roughness of thin films by imaging spectroscopic reflectometry. In Duparre, A; Geyl, R. Conference on Optical Systems Design - Optical Fabrication, Testing, and Metrology V. 9628. vyd. BELLINGHAM, USA: SPIE-INT SOC OPTICAL ENGINEERING, 2015, s. "96280C-1"-"96280C-9", 9 s. ISBN 978-1-62841-817-0. Dostupné z: https://dx.doi.org/10.1117/12.2190091.

@inproceedings{1384153,
   author = {Nečas, David and Ohlídal, Ivan and Vodák, Jiří and Ohlídal, Miloslav and Franta, Daniel},
   address = {BELLINGHAM, USA},
   booktitle = {Conference on Optical Systems Design - Optical Fabrication, Testing, and Metrology V},
   doi = {http://dx.doi.org/10.1117/12.2190091},
   edition = {9628},
   editor = {Duparre, A; Geyl, R},
   keywords = {thin films; roughness; scalar diffraction theory; Rayleigh-Rice theory; spectrophotometry; ellipsometry; imaging techniques; zinc selenide},
   howpublished = {tištěná verze "print"},
   language = {eng},
   location = {BELLINGHAM, USA},
   isbn = {978-1-62841-817-0},
   pages = {"96280C-1"-"96280C-9"},
   publisher = {SPIE-INT SOC OPTICAL ENGINEERING},
   title = {Simultaneous determination of optical constants, local thickness, and local roughness of thin films by imaging spectroscopic reflectometry},
   year = {2015}
}

TY  - JOUR
ID  - 1384153
AU  - Nečas, David - Ohlídal, Ivan - Vodák, Jiří - Ohlídal, Miloslav - Franta, Daniel
PY  - 2015
TI  - Simultaneous determination of optical constants, local thickness, and local roughness of thin films by imaging spectroscopic reflectometry
PB  - SPIE-INT SOC OPTICAL ENGINEERING
CY  - BELLINGHAM, USA
SN  - 9781628418170
KW  - thin films
KW  - roughness
KW  - scalar diffraction theory
KW  - Rayleigh-Rice theory
KW  - spectrophotometry
KW  - ellipsometry
KW  - imaging techniques
KW  - zinc selenide
N2  - A new optical characterization method based on imaging spectroscopic reflectometry (ISR) is presented and illustrated on the characterization of rough non-uniform epitaxial ZnSe films prepared on GaAs substrates. The method allows the determination of all parameters describing the thin films exhibiting boundary roughness and non-uniformity in thickness, i.e. determination of the spectral dependencies of the optical constants, map of local thickness and map of local rms values of heights of the irregularities for the rough boundaries. The local normal reflectance spectra in ISR correspond to small areas (37x37 pm2) on the thin films measured within the spectral range 270-900 nm by pixels of a CCD camera serving as the detector of imaging spectrophotometer constructed in our laboratory. To our experience the small areas corresponding to the pixels are sufficiently small so that the majority of the films can be considered uniform in all parameters within these areas. Boundary roughness is included into the reflectance formulas by means of the scalar diffraction theory (SDT) and the optical constant spectra of the ZnSe films were expressed by the dispersion model based on the parametrization of the joint density of electronic states (PJDOS). In general, there is a correlation between the searched parameters if the individual local reflectance spectra are fitted separately and, therefore, the local reflectance spectra measured for all the pixels are treated simultaneously using so called multi-pixel method in order to remove or reduce this correlation and determine the values of all the parameters with a sufficient accuracy. The results of the optical characterization of the same selected sample of the epitaxial ZnSe thin film obtained using the method presented here and combined method of variable-angle spectroscopic ellipsometry, spectroscopic reflectometry and single-pixel immersion spectroscopic reflectometry are introduced in the contribution as well.
ER  -

NEČAS, David, Ivan OHLÍDAL, Jiří VODÁK, Miloslav OHLÍDAL a Daniel FRANTA. Simultaneous determination of optical constants, local thickness, and local roughness of thin films by imaging spectroscopic reflectometry. In Duparre, A; Geyl, R. \textit{Conference on Optical Systems Design - Optical Fabrication, Testing, and Metrology V}. 9628. vyd. BELLINGHAM, USA: SPIE-INT SOC OPTICAL ENGINEERING, 2015, s.~''96280C-1''-''96280C-9'', 9 s. ISBN~978-1-62841-817-0. Dostupné z: https://dx.doi.org/10.1117/12.2190091.

Podrobný výpis o publikaci