| OHLÍDAL, Miloslav, Ivan OHLÍDAL, David NEČAS, Jiří VODÁK, Daniel FRANTA, Pavel NÁDASKÝ a František VIŽĎA. Possibilities and limitations of imaging spectroscopic reflectometry in optical characterization of thin films. In Duparre, A; Geyl, R. Conference on Optical Systems Design - Optical Fabrication, Testing, and Metrology V. 9628. vyd. BELLINGHAM, USA: SPIE-INT SOC OPTICAL ENGINEERING, 2015, s. "96280R-1"-"96280R-13", 13 s. ISBN 978-1-62841-817-0. Dostupné z: https://dx.doi.org/10.1117/12.2191052. |
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@inproceedings{1384154,
author = {Ohlídal, Miloslav and Ohlídal, Ivan and Nečas, David and Vodák, Jiří and Franta, Daniel and Nádaský, Pavel and Vižďa, František},
address = {BELLINGHAM, USA},
booktitle = {Conference on Optical Systems Design - Optical Fabrication, Testing, and Metrology V},
doi = {http://dx.doi.org/10.1117/12.2191052},
edition = {9628},
editor = {Duparre, A; Geyl, R},
keywords = {Imaging spectroscopic reflectometry; non-uniform thin films; optical parameters},
howpublished = {tištěná verze "print"},
language = {eng},
location = {BELLINGHAM, USA},
isbn = {978-1-62841-817-0},
pages = {"96280R-1"-"96280R-13"},
publisher = {SPIE-INT SOC OPTICAL ENGINEERING},
title = {Possibilities and limitations of imaging spectroscopic reflectometry in optical characterization of thin films},
year = {2015}
}
TY - JOUR
ID - 1384154
AU - Ohlídal, Miloslav - Ohlídal, Ivan - Nečas, David - Vodák, Jiří - Franta, Daniel - Nádaský, Pavel - Vižďa, František
PY - 2015
TI - Possibilities and limitations of imaging spectroscopic reflectometry in optical characterization of thin films
PB - SPIE-INT SOC OPTICAL ENGINEERING
CY - BELLINGHAM, USA
SN - 9781628418170
KW - Imaging spectroscopic reflectometry
KW - non-uniform thin films
KW - optical parameters
N2 - It is possible to encounter thin films exhibiting various defects in practice. One of these defects is area non-uniformity in optical parameters (e.g. in thickness). Therefore it is necessary to have methods for an optical characterization of non-uniform thin films. Imaging spectroscopic reflectometry provides methods enabling us to perform an efficient optical characterization of such films. It gives a possibility to determine spectral dependencies of a local reflectance at normal incidence of light belonging to small areas (37 mu m x 37 mu m in our case) on these non-uniform films. The local reflectance is measured by individual pixels of a CCD camera serving as a detector of an imaging spectroscopic reflectometer. It is mostly possible to express the local reflectance using formulas corresponding to a uniform thin film. It allows a relatively simple treatment of the experimental data obtained by imaging spectroscopic reflectometry. There are three methods for treating these experimental data in the special case of thickness non-uniformity, i.e. in the case of the same optical constants within a certain area of the film - single pixel imaging spectroscopic reflectometry method, combination of single-pixel imaging spectroscopic reflectometry method and conventional methods (conventional single spot spectroscopic ellipsometry and spectrophotometry), and multi-pixel imaging spectroscopic reflectometry method. These methods are discussed and examples of the optical characterization of thin films non-uniform in thickness corresponding to these methods are presented in this contribution.
ER -
OHLÍDAL, Miloslav, Ivan OHLÍDAL, David NEČAS, Jiří VODÁK, Daniel FRANTA, Pavel NÁDASKÝ a František VIŽĎA. Possibilities and limitations of imaging spectroscopic reflectometry in optical characterization of thin films. In Duparre, A; Geyl, R. \textit{Conference on Optical Systems Design - Optical Fabrication, Testing, and Metrology V}. 9628. vyd. BELLINGHAM, USA: SPIE-INT SOC OPTICAL ENGINEERING, 2015, s.~''96280R-1''-''96280R-13'', 13 s. ISBN~978-1-62841-817-0. Dostupné z: https://dx.doi.org/10.1117/12.2191052.
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