Structural and Optical Properties of Luminescent Copper (I)
Chloride Thin Films Deposited by Sequentially Pulsed Chemical
Vapour Deposition

J 2018

Structural and Optical Properties of Luminescent Copper (I) Chloride Thin Films Deposited by Sequentially Pulsed Chemical Vapour Deposition

KRUMPOLEC, Richard; Tomáš HOMOLA; David Campbell CAMERON; Josef HUMLÍČEK; Ondřej CAHA et al.

Základní údaje

Originální název

Structural and Optical Properties of Luminescent Copper (I) Chloride Thin Films Deposited by Sequentially Pulsed Chemical Vapour Deposition

Autoři

KRUMPOLEC, Richard ; Tomáš HOMOLA; David Campbell CAMERON; Josef HUMLÍČEK; Ondřej CAHA; Karla KULDOVÁ; Raul ZAZPE; Jan PŘIKRYL a Jan M. MACAK

Vydání

Coatings, 2018, 2079-6412

Další údaje

Jazyk

angličtina

Typ výsledku

Článek v odborném periodiku

Obor

10302 Condensed matter physics

Stát vydavatele

Švýcarsko

Utajení

není předmětem státního či obchodního tajemství

Odkazy

URL

Impakt faktor

Impact factor: 2.330

Označené pro přenos do RIV

Ano

Kód RIV

RIV/00216224:14310/18:00101329

Organizační jednotka

Přírodovědecká fakulta

Klíčová slova anglicky

vapour deposition; copper chloride; characterization; optical properties; XPS; crystal structure

Příznaky

Mezinárodní význam, Recenzováno

Změněno: 23. 4. 2024 12:40, Mgr. Michal Petr

Anotace

V originále

Sequentially pulsed chemical vapour deposition was used to successfully deposit thin nanocrystalline films of copper(I) chloride using an atomic layer deposition system in order to investigate their application to UV optoelectronics. The films were deposited at 125 degrees C using [Bis(trimethylsilyl)acetylene](hexafluoroacetylacetonato)copper(I) as a Cu precursor and pyridine hydrochloride as a new Cl precursor. The films were analysed by XRD, X-ray photoelectron spectroscopy (XPS), SEM, photoluminescence, and spectroscopic reflectance. Capping layers of aluminium oxide were deposited in situ by ALD (atomic layer deposition) to avoid environmental degradation. The film adopted a polycrystalline zinc blende-structure. The main contaminants were found to be organic materials from the precursor. Photoluminescence showed the characteristic free and bound exciton emissions from CuCl and the characteristic exciton absorption peaks could also be detected by reflectance measurements.

Návaznosti

ED2.1.00/03.0086, projekt VaV

Název: Regionální VaV centrum pro nízkonákladové plazmové a nanotechnologické povrchové úpravy

GA17-02328S, projekt VaV

Název: UVIHOPE Ultrafialová halogenidová optoelektronika (Akronym: UVIHOPE)

Investor: Grantová agentura ČR, UVIHOPE Ultrafialová halogenidová optoelektronika

LO1411, projekt VaV

Název: Rozvoj centra pro nízkonákladové plazmové a nanotechnologické povrchové úpravy (Akronym: CEPLANT plus)

Investor: Ministerstvo školství, mládeže a tělovýchovy ČR, Rozvoj centra pro nízkonákladové plazmové a nanotechnologické povrchové úpravy

LQ1601, projekt VaV

Název: CEITEC 2020 (Akronym: CEITEC2020)

Investor: Ministerstvo školství, mládeže a tělovýchovy ČR, CEITEC 2020

Citovat

KRUMPOLEC, Richard; Tomáš HOMOLA; David Campbell CAMERON; Josef HUMLÍČEK; Ondřej CAHA; Karla KULDOVÁ; Raul ZAZPE; Jan PŘIKRYL a Jan M. MACAK. Structural and Optical Properties of Luminescent Copper (I) Chloride Thin Films Deposited by Sequentially Pulsed Chemical Vapour Deposition. Coatings. 2018, roč. 8, č. 10, s. "369-1"-"369-16", 16 s. ISSN 2079-6412. Dostupné z: https://doi.org/10.3390/coatings8100369.

@article{1462236,
   author = {Krumpolec, Richard and Homola, Tomáš and Cameron, David Campbell and Humlíček, Josef and Caha, Ondřej and Kuldová, Karla and Zazpe, Raul and Přikryl, Jan and Macak, Jan M.},
   article_number = {10},
   doi = {https://doi.org/10.3390/coatings8100369},
   keywords = {vapour deposition; copper chloride; characterization; optical properties; XPS; crystal structure},
   language = {eng},
   issn = {2079-6412},
   journal = {Coatings},
   title = {Structural and Optical Properties of Luminescent Copper (I) Chloride Thin Films Deposited by Sequentially Pulsed Chemical Vapour Deposition},
   url = {https://www.mdpi.com/2079-6412/8/10/369},
   volume = {8},
   year = {2018}
}

TY  - JOUR
ID  - 1462236
AU  - Krumpolec, Richard - Homola, Tomáš - Cameron, David Campbell - Humlíček, Josef - Caha, Ondřej - Kuldová, Karla - Zazpe, Raul - Přikryl, Jan - Macak, Jan M.
PY  - 2018
TI  - Structural and Optical Properties of Luminescent Copper (I) Chloride Thin Films Deposited by Sequentially Pulsed Chemical Vapour Deposition
JF  - Coatings
VL  - 8
IS  - 10
SP  - "369-1"-"369-16"
EP  - "369-1"-"369-16"
SN  - 20796412
KW  - vapour deposition
KW  - copper chloride
KW  - characterization
KW  - optical properties
KW  - XPS
KW  - crystal structure
UR  - https://www.mdpi.com/2079-6412/8/10/369
N2  - Sequentially pulsed chemical vapour deposition was used to successfully deposit thin nanocrystalline films of copper(I) chloride using an atomic layer deposition system in order to investigate their application to UV optoelectronics. The films were deposited at 125 degrees C using [Bis(trimethylsilyl)acetylene](hexafluoroacetylacetonato)copper(I) as a Cu precursor and pyridine hydrochloride as a new Cl precursor. The films were analysed by XRD, X-ray photoelectron spectroscopy (XPS), SEM, photoluminescence, and spectroscopic reflectance. Capping layers of aluminium oxide were deposited in situ by ALD (atomic layer deposition) to avoid environmental degradation. The film adopted a polycrystalline zinc blende-structure. The main contaminants were found to be organic materials from the precursor. Photoluminescence showed the characteristic free and bound exciton emissions from CuCl and the characteristic exciton absorption peaks could also be detected by reflectance measurements.
ER  -

KRUMPOLEC, Richard; Tomáš HOMOLA; David Campbell CAMERON; Josef HUMLÍČEK; Ondřej CAHA; Karla KULDOVÁ; Raul ZAZPE; Jan PŘIKRYL a Jan M. MACAK. Structural and Optical Properties of Luminescent Copper (I) Chloride Thin Films Deposited by Sequentially Pulsed Chemical Vapour Deposition. \textit{Coatings}. 2018, roč.~8, č.~10, s.~''369-1''-''369-16'', 16 s. ISSN~2079-6412. Dostupné z: https://doi.org/10.3390/coatings8100369.

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