| FALUB, Claudiu V., Srinivas V. PIETAMBARAM, Oguz YILDIRIM, Mojmír MEDUŇA, Ondřej CAHA, Rachid HIDA, Xue ZHAO, Jan AMBROSINI, Hartmut ROHRMANN a Hans J. HUG. Enhanced permeability dielectric thin films with tailored properties deposited by magnetron sputtering on silicon. AIP Advances. New York: AMER INST PHYSICS, 2019, roč. 9, č. 3, s. 035243-35248. ISSN 2158-3226. Dostupné z: https://dx.doi.org/10.1063/1.5079477. |
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@article{1484991,
author = {Falub, Claudiu V. and Pietambaram, Srinivas V. and Yildirim, Oguz and Meduňa, Mojmír and Caha, Ondřej and Hida, Rachid and Zhao, Xue and Ambrosini, Jan and Rohrmann, Hartmut and Hug, Hans J.},
article_location = {New York},
article_number = {3},
doi = {http://dx.doi.org/10.1063/1.5079477},
keywords = {Magnetic hysteresis; Metal oxides; X-ray diffraction; Magnetron sputtering; X-ray reflectivity; X-ray fluorescence},
language = {eng},
issn = {2158-3226},
journal = {AIP Advances},
title = {Enhanced permeability dielectric thin films with tailored properties deposited by magnetron sputtering on silicon},
url = {https://aip.scitation.org/doi/10.1063/1.5079477},
volume = {9},
year = {2019}
}
TY - JOUR
ID - 1484991
AU - Falub, Claudiu V. - Pietambaram, Srinivas V. - Yildirim, Oguz - Meduňa, Mojmír - Caha, Ondřej - Hida, Rachid - Zhao, Xue - Ambrosini, Jan - Rohrmann, Hartmut - Hug, Hans J.
PY - 2019
TI - Enhanced permeability dielectric thin films with tailored properties deposited by magnetron sputtering on silicon
JF - AIP Advances
VL - 9
IS - 3
SP - 035243
EP - 035243
PB - AMER INST PHYSICS
SN - 21583226
KW - Magnetic hysteresis
KW - Metal oxides
KW - X-ray diffraction
KW - Magnetron sputtering
KW - X-ray reflectivity
KW - X-ray fluorescence
UR - https://aip.scitation.org/doi/10.1063/1.5079477
L2 - https://aip.scitation.org/doi/10.1063/1.5079477
N2 - We have studied the structural and magnetic properties of enhanced-permeability-dielectric (EPD) FeCo/Al2O3-multilayer thin films deposited on 8”-Si wafers in an industrial magnetron sputtering system.
ER -
FALUB, Claudiu V., Srinivas V. PIETAMBARAM, Oguz YILDIRIM, Mojmír MEDUŇA, Ondřej CAHA, Rachid HIDA, Xue ZHAO, Jan AMBROSINI, Hartmut ROHRMANN a Hans J. HUG. Enhanced permeability dielectric thin films with tailored properties deposited by magnetron sputtering on silicon. \textit{AIP Advances}. New York: AMER INST PHYSICS, 2019, roč.~9, č.~3, s.~035243-35248. ISSN~2158-3226. Dostupné z: https://dx.doi.org/10.1063/1.5079477.
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