FALUB, Claudiu V., Srinivas V. PIETAMBARAM, Oguz YILDIRIM, Mojmír MEDUŇA, Ondřej CAHA, Rachid HIDA, Xue ZHAO, Jan AMBROSINI, Hartmut ROHRMANN a Hans J. HUG. Enhanced permeability dielectric thin films with tailored properties deposited by magnetron sputtering on silicon. AIP Advances. New York: AMER INST PHYSICS, 2019, roč. 9, č. 3, s. 035243-35248. ISSN 2158-3226. Dostupné z: https://dx.doi.org/10.1063/1.5079477. |
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@article{1484991, author = {Falub, Claudiu V. and Pietambaram, Srinivas V. and Yildirim, Oguz and Meduňa, Mojmír and Caha, Ondřej and Hida, Rachid and Zhao, Xue and Ambrosini, Jan and Rohrmann, Hartmut and Hug, Hans J.}, article_location = {New York}, article_number = {3}, doi = {http://dx.doi.org/10.1063/1.5079477}, keywords = {Magnetic hysteresis; Metal oxides; X-ray diffraction; Magnetron sputtering; X-ray reflectivity; X-ray fluorescence}, language = {eng}, issn = {2158-3226}, journal = {AIP Advances}, title = {Enhanced permeability dielectric thin films with tailored properties deposited by magnetron sputtering on silicon}, url = {https://aip.scitation.org/doi/10.1063/1.5079477}, volume = {9}, year = {2019} }
TY - JOUR ID - 1484991 AU - Falub, Claudiu V. - Pietambaram, Srinivas V. - Yildirim, Oguz - Meduňa, Mojmír - Caha, Ondřej - Hida, Rachid - Zhao, Xue - Ambrosini, Jan - Rohrmann, Hartmut - Hug, Hans J. PY - 2019 TI - Enhanced permeability dielectric thin films with tailored properties deposited by magnetron sputtering on silicon JF - AIP Advances VL - 9 IS - 3 SP - 035243 EP - 035243 PB - AMER INST PHYSICS SN - 21583226 KW - Magnetic hysteresis KW - Metal oxides KW - X-ray diffraction KW - Magnetron sputtering KW - X-ray reflectivity KW - X-ray fluorescence UR - https://aip.scitation.org/doi/10.1063/1.5079477 L2 - https://aip.scitation.org/doi/10.1063/1.5079477 N2 - We have studied the structural and magnetic properties of enhanced-permeability-dielectric (EPD) FeCo/Al2O3-multilayer thin films deposited on 8”-Si wafers in an industrial magnetron sputtering system. ER -
FALUB, Claudiu V., Srinivas V. PIETAMBARAM, Oguz YILDIRIM, Mojmír MEDUŇA, Ondřej CAHA, Rachid HIDA, Xue ZHAO, Jan AMBROSINI, Hartmut ROHRMANN a Hans J. HUG. Enhanced permeability dielectric thin films with tailored properties deposited by magnetron sputtering on silicon. \textit{AIP Advances}. New York: AMER INST PHYSICS, 2019, roč.~9, č.~3, s.~035243-35248. ISSN~2158-3226. Dostupné z: https://dx.doi.org/10.1063/1.5079477.
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