Titanium Atom and Ion Number Density Evolution in Reactive
HiPIMS with Oxygen‚ Nitrogen and Acetylene Gas

a 2019

Titanium Atom and Ion Number Density Evolution in Reactive HiPIMS with Oxygen‚ Nitrogen and Acetylene Gas

FEKETE, Matej; Daniel LUNDIN; Katarína BERNÁTOVÁ; Peter KLEIN; Jaroslav HNILICA et. al.

Základní údaje

Originální název

Titanium Atom and Ion Number Density Evolution in Reactive HiPIMS with Oxygen‚ Nitrogen and Acetylene Gas

Autoři

FEKETE, Matej (703 Slovensko, domácí); Daniel LUNDIN (250 Francie); Katarína BERNÁTOVÁ (703 Slovensko, domácí); Peter KLEIN (703 Slovensko, domácí); Jaroslav HNILICA (203 Česká republika, domácí) a Petr VAŠINA (203 Česká republika, garant, domácí)

Vydání

46th International Conference on Metallurgical Coatings and Thin Films, 2019

Další údaje

Jazyk

angličtina

Typ výsledku

Konferenční abstrakt

Obor

10305 Fluids and plasma physics

Stát vydavatele

Spojené státy

Utajení

není předmětem státního či obchodního tajemství

Kód RIV

RIV/00216224:14310/19:00110113

Organizační jednotka

Přírodovědecká fakulta

Klíčová slova anglicky

magnetron sputtering; reactive HiPIMS; ionization fraction; titanium; oxygen; nitrogen; acetylene

Štítky

rivok

Příznaky

Mezinárodní význam

Změněno: 11. 5. 2020 14:11, Mgr. Marie Novosadová Šípková, DiS.

Anotace

V originále

Reactive high power impulse magnetron sputtering (R-HiPIMS) offers a great opportunity for high quality coating production thus understanding the processes accompanying deposition is of great importance. The hysteresis curve in R-HiPIMS generally exhibits a narrower shape compared to dcMS‚ or it can even be entirely suppressed‚ which is beneficial for high-rate deposition of stoichiometric compound films. The main reason of the hysteresis suppression is not yet completely understood. A recently developed effective branching fraction method is utilized to determine absolute ground state number densities of sputtered titanium species from the optical-emission signal. We report on evolutions of titanium atom and ion ground state densities in R-HiPIMS discharges in oxygen‚ nitrogen and acetylene gases for constant mean power and pulse duration‚ when varying the repetition frequency. A fast feedback system is employed to allow working in the transition region of the hysteresis curve in a well-controlled manner. The ionization fraction of sputtered species increases with the partial pressure of the reactive gas. The increased ionization of titanium is attributed to the combination of the following effects: a longer residual time of sputtered species in the target vicinity; a higher maximal discharge current attained at the end of the pulse; lower amount of sputtered species due to the target poisoning which may positively affect electron distribution function. It is furthermore found that the hysteresis curve shape changes when varying the repetition frequency at the same mean power. The difference is more pronounced for R-HiPIMS with higher sputtered species ionization fraction. The experimental results are compared to the results obtained by a reactive ionization region model (R-IRM). The absolute ground state number densities of Ti atoms and Ti ions measured at the target vicinity are also substituted into the Berg model modified to include ion back attraction‚ and a rather good match between the measurements and simulation results for different experimental conditions is found.

Návaznosti

GA19-00579S, projekt VaV

Název: Pokročilá diagnostika reaktivního HiPIMS plazmatu pro depozici oxidových, nitridových a sulfidových vrstev

Investor: Grantová agentura ČR, Pokročilá diagnostika reaktivního HiPIMS plazmatu pro depozici oxidových, nitridových a sulfidových vrstev

LO1411, projekt VaV

Název: Rozvoj centra pro nízkonákladové plazmové a nanotechnologické povrchové úpravy (Akronym: CEPLANT plus)

Investor: Ministerstvo školství, mládeže a tělovýchovy ČR, Rozvoj centra pro nízkonákladové plazmové a nanotechnologické povrchové úpravy

Citovat

FEKETE, Matej; Daniel LUNDIN; Katarína BERNÁTOVÁ; Peter KLEIN; Jaroslav HNILICA a Petr VAŠINA. Titanium Atom and Ion Number Density Evolution in Reactive HiPIMS with Oxygen‚ Nitrogen and Acetylene Gas. In 46th International Conference on Metallurgical Coatings and Thin Films. 2019.

@proceedings{1544891,
   author = {Fekete, Matej and Lundin, Daniel and Bernátová, Katarína and Klein, Peter and Hnilica, Jaroslav and Vašina, Petr},
   booktitle = {46th International Conference on Metallurgical Coatings and Thin Films},
   keywords = {magnetron sputtering; reactive HiPIMS; ionization fraction; titanium; oxygen; nitrogen; acetylene},
   language = {eng},
   title = {Titanium Atom and Ion Number Density Evolution in Reactive HiPIMS with Oxygen‚ Nitrogen and Acetylene Gas},
   year = {2019}
}

TY  - CONF
ID  - 1544891
AU  - Fekete, Matej - Lundin, Daniel - Bernátová, Katarína - Klein, Peter - Hnilica, Jaroslav - Vašina, Petr
PY  - 2019
TI  - Titanium Atom and Ion Number Density Evolution in Reactive HiPIMS with Oxygen‚ Nitrogen and Acetylene Gas
KW  - magnetron sputtering
KW  - reactive HiPIMS
KW  - ionization fraction
KW  - titanium
KW  - oxygen
KW  - nitrogen
KW  - acetylene
N2  - Reactive high power impulse magnetron sputtering (R-HiPIMS) offers a great opportunity for high quality coating production thus understanding the processes accompanying deposition is of great importance. The hysteresis curve in R-HiPIMS generally exhibits a narrower shape compared to dcMS‚ or it can even be entirely suppressed‚ which is beneficial for high-rate deposition of stoichiometric compound films. The main reason of the hysteresis suppression is not yet completely understood. A recently developed effective branching fraction method is utilized to determine absolute ground state number densities of sputtered titanium species from the optical-emission signal. We report on evolutions of titanium atom and ion ground state densities in R-HiPIMS discharges in oxygen‚ nitrogen and acetylene gases for constant mean power and pulse duration‚ when varying the repetition frequency. A fast feedback system is employed to allow working in the transition region of the hysteresis curve in a well-controlled manner. The ionization fraction of sputtered species increases with the partial pressure of the reactive gas. The increased ionization of titanium is attributed to the combination of the following effects: a longer residual time of sputtered species in the target vicinity; a higher maximal discharge current attained at the end of the pulse; lower amount of sputtered species due to the target poisoning which may positively affect electron distribution function. It is furthermore found that the hysteresis curve shape changes when varying the repetition frequency at the same mean power. The difference is more pronounced for R-HiPIMS with higher sputtered species ionization fraction. The experimental results are compared to the results obtained by a reactive ionization region model (R-IRM). The absolute ground state number densities of Ti atoms and Ti ions measured at the target vicinity are also substituted into the Berg model modified to include ion back attraction‚ and a rather good match between the measurements and simulation results for different experimental conditions is found.
ER  -

FEKETE, Matej; Daniel LUNDIN; Katarína BERNÁTOVÁ; Peter KLEIN; Jaroslav HNILICA a Petr VAŠINA. Titanium Atom and Ion Number Density Evolution in Reactive HiPIMS with Oxygen‚ Nitrogen and Acetylene Gas. In \textit{46th International Conference on Metallurgical Coatings and Thin Films}. 2019.

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