Ellipsometry, reflectance, and photoluminescence of
nanocrystalline CuCl thin films on silicon

J 2019

Ellipsometry, reflectance, and photoluminescence of nanocrystalline CuCl thin films on silicon

HUMLÍČEK, Josef; Karla KULDOVA; Richard KRUMPOLEC a David Campbell CAMERON

Základní údaje

Originální název

Ellipsometry, reflectance, and photoluminescence of nanocrystalline CuCl thin films on silicon

Autoři

HUMLÍČEK, Josef; Karla KULDOVA; Richard KRUMPOLEC a David Campbell CAMERON

Vydání

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, MELVILLE, A V S AMER INST PHYSICS, 2019, 2166-2746

Další údaje

Jazyk

angličtina

Typ výsledku

Článek v odborném periodiku

Obor

10302 Condensed matter physics

Stát vydavatele

Spojené státy

Utajení

není předmětem státního či obchodního tajemství

Odkazy

URL

Impakt faktor

Impact factor: 1.511

Označené pro přenos do RIV

Ano

Kód RIV

RIV/00216224:14310/19:00107822

Organizační jednotka

Přírodovědecká fakulta

Klíčová slova anglicky

copper halides; ellipsometry; optical spectroscopy

Štítky

rivok

Příznaky

Mezinárodní význam, Recenzováno

Změněno: 15. 2. 2023 10:13, Mgr. Marie Novosadová Šípková, DiS.

Anotace

V originále

The authors have used sequential pulsed vapor deposition to prepare thin films of copper(I) chloride (CuCl) on silicon. The films are nanocrystalline and show a very strong ultraviolet luminescence. The excitonic response and corresponding luminescent properties make these films promising for new short-wavelength photonic/photoelectronic devices. The authors have undertaken systematic studies of these films, using the potential of multiple-angle-of-incidence spectroellipsometry with a rotating compensator, normal-incidence reflectance with small illuminated spots, and photoluminescence with high spatial resolution. The silicon substrate presents specific problems in the interpretation of the ellipsometric and reflectance spectra, as the excitonic multiplets of CuCl are close to the E-1 interband spectral structure of Si. The authors discuss appropriate procedures to isolate the response of the thin films In addition, since the coverage of the substrates typically shows inhomogeneity, care has to be taken in accounting for its presence. A consistent picture of the passive and active excitonic response of the films results from the multitude of experimental techniques used. Published by the AVS.

Návaznosti

ED2.1.00/03.0086, projekt VaV

Název: Regionální VaV centrum pro nízkonákladové plazmové a nanotechnologické povrchové úpravy

GA17-02328S, projekt VaV

Název: UVIHOPE Ultrafialová halogenidová optoelektronika (Akronym: UVIHOPE)

Investor: Grantová agentura ČR, UVIHOPE Ultrafialová halogenidová optoelektronika

LM2015041, projekt VaV

Název: CEITEC Nano

Investor: Ministerstvo školství, mládeže a tělovýchovy ČR, CEITEC Nano

Citovat

HUMLÍČEK, Josef; Karla KULDOVA; Richard KRUMPOLEC a David Campbell CAMERON. Ellipsometry, reflectance, and photoluminescence of nanocrystalline CuCl thin films on silicon. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B. MELVILLE: A V S AMER INST PHYSICS, 2019, roč. 37, č. 5, s. 1-5. ISSN 2166-2746. Dostupné z: https://doi.org/10.1116/1.5121240.

@article{1585417,
   author = {Humlíček, Josef and Kuldova, Karla and Krumpolec, Richard and Cameron, David Campbell},
   article_location = {MELVILLE},
   article_number = {5},
   doi = {https://doi.org/10.1116/1.5121240},
   keywords = {copper halides; ellipsometry; optical spectroscopy},
   language = {eng},
   issn = {2166-2746},
   journal = {JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B},
   title = {Ellipsometry, reflectance, and photoluminescence of nanocrystalline CuCl thin films on silicon},
   url = {https://avs.scitation.org/doi/10.1116/1.5121240},
   volume = {37},
   year = {2019}
}

TY  - JOUR
ID  - 1585417
AU  - Humlíček, Josef - Kuldova, Karla - Krumpolec, Richard - Cameron, David Campbell
PY  - 2019
TI  - Ellipsometry, reflectance, and photoluminescence of nanocrystalline CuCl thin films on silicon
JF  - JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B
VL  - 37
IS  - 5
SP  - 1-5
EP  - 1-5
PB  - A V S AMER INST PHYSICS
SN  - 21662746
KW  - copper halides
KW  - ellipsometry
KW  - optical spectroscopy
UR  - https://avs.scitation.org/doi/10.1116/1.5121240
L2  - https://avs.scitation.org/doi/10.1116/1.5121240
N2  - The authors have used sequential pulsed vapor deposition to prepare thin films of copper(I) chloride (CuCl) on silicon. The films are nanocrystalline and show a very strong ultraviolet luminescence. The excitonic response and corresponding luminescent properties make these films promising for new short-wavelength photonic/photoelectronic devices. The authors have undertaken systematic studies of these films, using the potential of multiple-angle-of-incidence spectroellipsometry with a rotating compensator, normal-incidence reflectance with small illuminated spots, and photoluminescence with high spatial resolution. The silicon substrate presents specific problems in the interpretation of the ellipsometric and reflectance spectra, as the excitonic multiplets of CuCl are close to the E-1 interband spectral structure of Si. The authors discuss appropriate procedures to isolate the response of the thin films In addition, since the coverage of the substrates typically shows inhomogeneity, care has to be taken in accounting for its presence. A consistent picture of the passive and active excitonic response of the films results from the multitude of experimental techniques used. Published by the AVS.
ER  -

HUMLÍČEK, Josef; Karla KULDOVA; Richard KRUMPOLEC a David Campbell CAMERON. Ellipsometry, reflectance, and photoluminescence of nanocrystalline CuCl thin films on silicon. \textit{JOURNAL OF VACUUM SCIENCE \&{}amp; TECHNOLOGY B}. MELVILLE: A V S AMER INST PHYSICS, 2019, roč.~37, č.~5, s.~1-5. ISSN~2166-2746. Dostupné z: https://doi.org/10.1116/1.5121240.

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