Influence of sputtered species ionisation on the hysteresis
behaviour of reactive HiPIMS with oxygen admixture

J 2020

Influence of sputtered species ionisation on the hysteresis behaviour of reactive HiPIMS with oxygen admixture

FEKETE, Matej; Katarína BERNÁTOVÁ; Peter KLEIN; Jaroslav HNILICA; Petr VAŠINA et al.

Základní údaje

Originální název

Influence of sputtered species ionisation on the hysteresis behaviour of reactive HiPIMS with oxygen admixture

Autoři

FEKETE, Matej; Katarína BERNÁTOVÁ; Peter KLEIN; Jaroslav HNILICA a Petr VAŠINA

Vydání

Plasma Sources Science and Technology, Bristol, IOP Publishing Ltd. 2020, 0963-0252

Další údaje

Jazyk

angličtina

Typ výsledku

Článek v odborném periodiku

Obor

10305 Fluids and plasma physics

Stát vydavatele

Velká Británie a Severní Irsko

Utajení

není předmětem státního či obchodního tajemství

Odkazy

URL

Impakt faktor

Impact factor: 3.584

Označené pro přenos do RIV

Ano

Kód RIV

RIV/00216224:14310/20:00113998

Organizační jednotka

Přírodovědecká fakulta

Klíčová slova anglicky

magnetron sputtering; reactive HiPIMS; ionisation fraction; titanium; oxygen

Štítky

14312030, rivok

Příznaky

Mezinárodní význam, Recenzováno

Změněno: 20. 11. 2020 15:10, Mgr. Marie Novosadová Šípková, DiS.

Anotace

V originále

In this paper, the hysteresis behaviour of reactive magnetron sputtering process with oxygen admixture is studied by both experiment and model. The ground state number densities of titanium atoms and ions, and the deposition rates in high power impulse magnetron sputtering discharge were determined for a constant average applied power and pulse duration, while the repetition frequency and reactive gas supply were varied. The hysteresis curve reduced in width and shifted towards the lower oxygen supply with a decrease in the repetition frequency. These experimentally observed trends were well reproduced by a modified Berg model. The presented model utilised measured ionisation fraction of sputtered species and considered the back-attraction of the ionised sputtered species to the target. Significance of back–attraction process was observed as large fraction of ionised sputtered particles was found to be lost back to the target. This drastically decreased the number of particles deposited onto the substrate, which reduced not only the deposition rate, but also the gettering of the reactive gas. Consequently, the simulated hysteresis curve was shifted and reduced in width as it was observed experimentally.

Návaznosti

GA19-00579S, projekt VaV

Název: Pokročilá diagnostika reaktivního HiPIMS plazmatu pro depozici oxidových, nitridových a sulfidových vrstev

Investor: Grantová agentura ČR, Pokročilá diagnostika reaktivního HiPIMS plazmatu pro depozici oxidových, nitridových a sulfidových vrstev

LO1411, projekt VaV

Název: Rozvoj centra pro nízkonákladové plazmové a nanotechnologické povrchové úpravy (Akronym: CEPLANT plus)

Investor: Ministerstvo školství, mládeže a tělovýchovy ČR, Rozvoj centra pro nízkonákladové plazmové a nanotechnologické povrchové úpravy

Citovat

FEKETE, Matej; Katarína BERNÁTOVÁ; Peter KLEIN; Jaroslav HNILICA a Petr VAŠINA. Influence of sputtered species ionisation on the hysteresis behaviour of reactive HiPIMS with oxygen admixture. Plasma Sources Science and Technology. Bristol: IOP Publishing Ltd., 2020, roč. 29, č. 2, s. 1-9. ISSN 0963-0252. Dostupné z: https://doi.org/10.1088/1361-6595/ab5f2b.

@article{1591484,
   author = {Fekete, Matej and Bernátová, Katarína and Klein, Peter and Hnilica, Jaroslav and Vašina, Petr},
   article_location = {Bristol},
   article_number = {2},
   doi = {https://doi.org/10.1088/1361-6595/ab5f2b},
   keywords = {magnetron sputtering; reactive HiPIMS; ionisation fraction; titanium; oxygen},
   language = {eng},
   issn = {0963-0252},
   journal = {Plasma Sources Science and Technology},
   title = {Influence of sputtered species ionisation on the hysteresis behaviour of reactive HiPIMS with oxygen admixture},
   url = {https://iopscience.iop.org/article/10.1088/1361-6595/ab5f2b/pdf},
   volume = {29},
   year = {2020}
}

TY  - JOUR
ID  - 1591484
AU  - Fekete, Matej - Bernátová, Katarína - Klein, Peter - Hnilica, Jaroslav - Vašina, Petr
PY  - 2020
TI  - Influence of sputtered species ionisation on the hysteresis behaviour of reactive HiPIMS with oxygen admixture
JF  - Plasma Sources Science and Technology
VL  - 29
IS  - 2
SP  - 1-9
EP  - 1-9
PB  - IOP Publishing Ltd.
SN  - 09630252
KW  - magnetron sputtering
KW  - reactive HiPIMS
KW  - ionisation fraction
KW  - titanium
KW  - oxygen
UR  - https://iopscience.iop.org/article/10.1088/1361-6595/ab5f2b/pdf
L2  - https://iopscience.iop.org/article/10.1088/1361-6595/ab5f2b/pdf
N2  - In this paper, the hysteresis behaviour of reactive magnetron sputtering process with oxygen admixture is studied by both experiment and model. The ground state number densities of titanium atoms and ions, and the deposition rates in high power impulse magnetron sputtering discharge were determined for a constant average applied power and pulse duration, while the repetition frequency and reactive gas supply were varied. The hysteresis curve reduced in width and shifted towards the lower oxygen supply with a decrease in the repetition frequency. These experimentally observed trends were well reproduced by a modified Berg model. The presented model utilised measured ionisation fraction of sputtered species and considered the back-attraction of the ionised sputtered species to the target. Significance of back–attraction process was observed as large fraction of ionised sputtered particles was found to be lost back to the target. This drastically decreased the number of particles deposited onto the substrate, which reduced not only the deposition rate, but also the gettering of the reactive gas. Consequently, the simulated hysteresis curve was shifted and reduced in width as it was observed experimentally.
ER  -

FEKETE, Matej; Katarína BERNÁTOVÁ; Peter KLEIN; Jaroslav HNILICA a Petr VAŠINA. Influence of sputtered species ionisation on the hysteresis behaviour of reactive HiPIMS with oxygen admixture. \textit{Plasma Sources Science and Technology}. Bristol: IOP Publishing Ltd., 2020, roč.~29, č.~2, s.~1-9. ISSN~0963-0252. Dostupné z: https://doi.org/10.1088/1361-6595/ab5f2b.

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