| OHLÍDAL, Ivan, Jiří VOHÁNKA, Vilma BURŠÍKOVÁ, Daniel FRANTA a Martin ČERMÁK. Spectroscopic ellipsometry of inhomogeneous thin films exhibiting thickness non-uniformity and transition layers. Optics Express. Washington, D.C.: OPTICAL SOC AMER, 2020, roč. 28, č. 1, s. 160-174. ISSN 1094-4087. Dostupné z: https://dx.doi.org/10.1364/OE.28.000160. |
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@article{1598881,
author = {Ohlídal, Ivan and Vohánka, Jiří and Buršíková, Vilma and Franta, Daniel and Čermák, Martin},
article_location = {Washington, D.C.},
article_number = {1},
doi = {http://dx.doi.org/10.1364/OE.28.000160},
keywords = {Amorphous silicon; Extinction coefficients; Light scattering; Optical constants; Refractive index; Thin films},
language = {eng},
issn = {1094-4087},
journal = {Optics Express},
title = {Spectroscopic ellipsometry of inhomogeneous thin films exhibiting thickness non-uniformity and transition layers},
url = {https://doi.org/10.1364/OE.28.000160},
volume = {28},
year = {2020}
}
TY - JOUR
ID - 1598881
AU - Ohlídal, Ivan - Vohánka, Jiří - Buršíková, Vilma - Franta, Daniel - Čermák, Martin
PY - 2020
TI - Spectroscopic ellipsometry of inhomogeneous thin films exhibiting thickness non-uniformity and transition layers
JF - Optics Express
VL - 28
IS - 1
SP - 160-174
EP - 160-174
PB - OPTICAL SOC AMER
SN - 10944087
KW - Amorphous silicon
KW - Extinction coefficients
KW - Light scattering
KW - Optical constants
KW - Refractive index
KW - Thin films
UR - https://doi.org/10.1364/OE.28.000160
L2 - https://doi.org/10.1364/OE.28.000160
N2 - In this paper the complete optical characterization of an inhomogeneous polymer-like thin film of SiOxCyHz exhibiting a thickness non-uniformity and transition layer at the boundary between the silicon substrate and this film is performed using variable angle spectroscopic ellipsometry. The Campi-Coriasso dispersion model was utilized for describing the spectral dependencies of the optical constants of the SiOxCyHz thin film and transition layer. The multiple-beam interference model was used for expressing inhomogeneity of the SiOxCyHz thin film. The thickness non-uniformity of this film was taken into account by means of the averaging of the elements of the Mueller matrix performed using the thickness distribution for the wedge-shaped non-uniformity. The spectral dependencies of the optical constants of the SiOxCyHz thin film at the upper and lower boundaries together with the spectral dependencies of the optical constants of the transition layer were determined. Furthermore, the thickness values of the SiOxCyHz film and transition layer, profiles of the optical constants of the SiOxCyHz thin film and the rms value of local thicknesses corresponding to its thickness non-uniformity were determined. Thus, all the parameters characterizing this complicated film were determined without any auxiliary methods.
ER -
OHLÍDAL, Ivan, Jiří VOHÁNKA, Vilma BURŠÍKOVÁ, Daniel FRANTA a Martin ČERMÁK. Spectroscopic ellipsometry of inhomogeneous thin films exhibiting thickness non-uniformity and transition layers. \textit{Optics Express}. Washington, D.C.: OPTICAL SOC AMER, 2020, roč.~28, č.~1, s.~160-174. ISSN~1094-4087. Dostupné z: https://dx.doi.org/10.1364/OE.28.000160.
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