Spectroscopic ellipsometry of inhomogeneous thin films
exhibiting thickness non-uniformity and transition layers

J 2020

Spectroscopic ellipsometry of inhomogeneous thin films exhibiting thickness non-uniformity and transition layers

OHLÍDAL, Ivan, Jiří VOHÁNKA, Vilma BURŠÍKOVÁ, Daniel FRANTA, Martin ČERMÁK et. al.

Základní údaje

Originální název

Spectroscopic ellipsometry of inhomogeneous thin films exhibiting thickness non-uniformity and transition layers

Autoři

OHLÍDAL, Ivan (203 Česká republika, garant, domácí), Jiří VOHÁNKA (203 Česká republika, domácí), Vilma BURŠÍKOVÁ (203 Česká republika, domácí), Daniel FRANTA (203 Česká republika, domácí) a Martin ČERMÁK (203 Česká republika, domácí)

Vydání

Optics Express, Washington, D.C. OPTICAL SOC AMER, 2020, 1094-4087

Další údaje

Jazyk

angličtina

Typ výsledku

Článek v odborném periodiku

Obor

10306 Optics

Stát vydavatele

Spojené státy

Utajení

není předmětem státního či obchodního tajemství

Odkazy

odkaz na stránku nakladatele

Impakt faktor

Impact factor: 3.894

Kód RIV

RIV/00216224:14310/20:00114013

Organizační jednotka

Přírodovědecká fakulta

DOI

http://dx.doi.org/10.1364/OE.28.000160

UT WoS

000509352500012

Klíčová slova anglicky

Amorphous silicon; Extinction coefficients; Light scattering; Optical constants; Refractive index; Thin films

Štítky

rivok

Příznaky

Mezinárodní význam, Recenzováno

Změněno: 30. 3. 2021 16:00, Mgr. Marie Šípková, DiS.

Anotace

V originále

In this paper the complete optical characterization of an inhomogeneous polymer-like thin film of SiOxCyHz exhibiting a thickness non-uniformity and transition layer at the boundary between the silicon substrate and this film is performed using variable angle spectroscopic ellipsometry. The Campi-Coriasso dispersion model was utilized for describing the spectral dependencies of the optical constants of the SiOxCyHz thin film and transition layer. The multiple-beam interference model was used for expressing inhomogeneity of the SiOxCyHz thin film. The thickness non-uniformity of this film was taken into account by means of the averaging of the elements of the Mueller matrix performed using the thickness distribution for the wedge-shaped non-uniformity. The spectral dependencies of the optical constants of the SiOxCyHz thin film at the upper and lower boundaries together with the spectral dependencies of the optical constants of the transition layer were determined. Furthermore, the thickness values of the SiOxCyHz film and transition layer, profiles of the optical constants of the SiOxCyHz thin film and the rms value of local thicknesses corresponding to its thickness non-uniformity were determined. Thus, all the parameters characterizing this complicated film were determined without any auxiliary methods.

Návaznosti

GA19-15240S, projekt VaV

Název: Multifunkční nanokompozitní polymerní tenké vrstvy s řízenými povrchovými a mechanickými vlastnostmi připravené v RF prachovém plazmatu

Investor: Grantová agentura ČR, Multifunkční nanokompozitní polymerní tenké vrstvy s řízenými povrchovými a mechanickými vlastnostmi připravené v RF prachovém plazmatu

LO1411, projekt VaV

Název: Rozvoj centra pro nízkonákladové plazmové a nanotechnologické povrchové úpravy (Akronym: CEPLANT plus)

Investor: Ministerstvo školství, mládeže a tělovýchovy ČR, Rozvoj centra pro nízkonákladové plazmové a nanotechnologické povrchové úpravy

Citovat

OHLÍDAL, Ivan, Jiří VOHÁNKA, Vilma BURŠÍKOVÁ, Daniel FRANTA a Martin ČERMÁK. Spectroscopic ellipsometry of inhomogeneous thin films exhibiting thickness non-uniformity and transition layers. Optics Express. Washington, D.C.: OPTICAL SOC AMER, 2020, roč. 28, č. 1, s. 160-174. ISSN 1094-4087. Dostupné z: https://dx.doi.org/10.1364/OE.28.000160.

@article{1598881,
   author = {Ohlídal, Ivan and Vohánka, Jiří and Buršíková, Vilma and Franta, Daniel and Čermák, Martin},
   article_location = {Washington, D.C.},
   article_number = {1},
   doi = {http://dx.doi.org/10.1364/OE.28.000160},
   keywords = {Amorphous silicon; Extinction coefficients; Light scattering; Optical constants; Refractive index; Thin films},
   language = {eng},
   issn = {1094-4087},
   journal = {Optics Express},
   title = {Spectroscopic ellipsometry of inhomogeneous thin films exhibiting thickness non-uniformity and transition layers},
   url = {https://doi.org/10.1364/OE.28.000160},
   volume = {28},
   year = {2020}
}

TY  - JOUR
ID  - 1598881
AU  - Ohlídal, Ivan - Vohánka, Jiří - Buršíková, Vilma - Franta, Daniel - Čermák, Martin
PY  - 2020
TI  - Spectroscopic ellipsometry of inhomogeneous thin films exhibiting thickness non-uniformity and transition layers
JF  - Optics Express
VL  - 28
IS  - 1
SP  - 160-174
EP  - 160-174
PB  - OPTICAL SOC AMER
SN  - 10944087
KW  - Amorphous silicon
KW  - Extinction coefficients
KW  - Light scattering
KW  - Optical constants
KW  - Refractive index
KW  - Thin films
UR  - https://doi.org/10.1364/OE.28.000160
L2  - https://doi.org/10.1364/OE.28.000160
N2  - In this paper the complete optical characterization of an inhomogeneous polymer-like thin film of SiOxCyHz exhibiting a thickness non-uniformity and transition layer at the boundary between the silicon substrate and this film is performed using variable angle spectroscopic ellipsometry. The Campi-Coriasso dispersion model was utilized for describing the spectral dependencies of the optical constants of the SiOxCyHz thin film and transition layer. The multiple-beam interference model was used for expressing inhomogeneity of the SiOxCyHz thin film. The thickness non-uniformity of this film was taken into account by means of the averaging of the elements of the Mueller matrix performed using the thickness distribution for the wedge-shaped non-uniformity. The spectral dependencies of the optical constants of the SiOxCyHz thin film at the upper and lower boundaries together with the spectral dependencies of the optical constants of the transition layer were determined. Furthermore, the thickness values of the SiOxCyHz film and transition layer, profiles of the optical constants of the SiOxCyHz thin film and the rms value of local thicknesses corresponding to its thickness non-uniformity were determined. Thus, all the parameters characterizing this complicated film were determined without any auxiliary methods.
ER  -

OHLÍDAL, Ivan, Jiří VOHÁNKA, Vilma BURŠÍKOVÁ, Daniel FRANTA a Martin ČERMÁK. Spectroscopic ellipsometry of inhomogeneous thin films exhibiting thickness non-uniformity and transition layers. \textit{Optics Express}. Washington, D.C.: OPTICAL SOC AMER, 2020, roč.~28, č.~1, s.~160-174. ISSN~1094-4087. Dostupné z: https://dx.doi.org/10.1364/OE.28.000160.

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