A New Approach to the Crystallization of Perovskite Films by
Cold Hydrogen Atmospheric Pressure Plasma

J 2020

A New Approach to the Crystallization of Perovskite Films by Cold Hydrogen Atmospheric Pressure Plasma

SHEKARGOFTAR, Masoud a Tomáš HOMOLA

Základní údaje

Originální název

A New Approach to the Crystallization of Perovskite Films by Cold Hydrogen Atmospheric Pressure Plasma

Autoři

SHEKARGOFTAR, Masoud a Tomáš HOMOLA

Vydání

Plasma Chemistry and Plasma Processing, New York, Springer, 2020, 0272-4324

Další údaje

Jazyk

angličtina

Typ výsledku

Článek v odborném periodiku

Obor

20501 Materials engineering

Stát vydavatele

Spojené státy

Utajení

není předmětem státního či obchodního tajemství

Odkazy

URL

Impakt faktor

Impact factor: 3.148

Označené pro přenos do RIV

Ano

Kód RIV

RIV/00216224:14310/20:00115206

Organizační jednotka

Přírodovědecká fakulta

Klíčová slova anglicky

Hydrogen plasma; Perovskite; Chemical composition; Plasma-chemical modification; Crystallization

Štítky

14312030, rivok

Příznaky

Mezinárodní význam, Recenzováno

Změněno: 30. 3. 2021 16:36, Mgr. Marie Novosadová Šípková, DiS.

Anotace

V originále

This contribution presents a new approach to rapid and low-temperature plasma-chemical crystallization of perovskite films. Chlorine-incorporated perovskite (MAPbI(3-x)Cl(x)) films were exposed to diffuse atmospheric hydrogen (H-2) plasma immediately after their deposition. Several types of surface characterization techniques were used to investigate the effect of the H-2 plasma on the surface of the perovskite films. Since the H-2 plasma was generated at a low temperature (<= 70 degrees C), there was no considerable damage to the plasma-treated perovskite films-although the morphology and chemistry changed significantly. H-2 plasma had a range of effects on the surface of the perovskite films: (1) changes in the chemical composition of the perovskite surface without removal of lead; (2) modification of the optoelectrical band structure; (3) crystallization of the perovskite film; and (4) the grain of the surface became highly ordered. The results presented demonstrate that H-2 plasma is a rapid and low-cost method for the manufacture of crystallized perovskite films. The method may be considered a significant step towards low-temperature, annealing-free crystallization of perovskite films.

Návaznosti

LM2015041, projekt VaV

Název: CEITEC Nano

Investor: Ministerstvo školství, mládeže a tělovýchovy ČR, CEITEC Nano

LO1411, projekt VaV

Název: Rozvoj centra pro nízkonákladové plazmové a nanotechnologické povrchové úpravy (Akronym: CEPLANT plus)

Investor: Ministerstvo školství, mládeže a tělovýchovy ČR, Rozvoj centra pro nízkonákladové plazmové a nanotechnologické povrchové úpravy

Citovat

SHEKARGOFTAR, Masoud a Tomáš HOMOLA. A New Approach to the Crystallization of Perovskite Films by Cold Hydrogen Atmospheric Pressure Plasma. Plasma Chemistry and Plasma Processing. New York: Springer, 2020, roč. 40, č. 2, s. 539-548. ISSN 0272-4324. Dostupné z: https://doi.org/10.1007/s11090-020-10059-1.

@article{1605717,
   author = {Shekargoftar, Masoud and Homola, Tomáš},
   article_location = {New York},
   article_number = {2},
   doi = {https://doi.org/10.1007/s11090-020-10059-1},
   keywords = {Hydrogen plasma; Perovskite; Chemical composition; Plasma-chemical modification; Crystallization},
   language = {eng},
   issn = {0272-4324},
   journal = {Plasma Chemistry and Plasma Processing},
   title = {A New Approach to the Crystallization of Perovskite Films by Cold Hydrogen Atmospheric Pressure Plasma},
   url = {https://doi.org/10.1007/s11090-020-10059-1},
   volume = {40},
   year = {2020}
}

TY  - JOUR
ID  - 1605717
AU  - Shekargoftar, Masoud - Homola, Tomáš
PY  - 2020
TI  - A New Approach to the Crystallization of Perovskite Films by Cold Hydrogen Atmospheric Pressure Plasma
JF  - Plasma Chemistry and Plasma Processing
VL  - 40
IS  - 2
SP  - 539-548
EP  - 539-548
PB  - Springer
SN  - 02724324
KW  - Hydrogen plasma
KW  - Perovskite
KW  - Chemical composition
KW  - Plasma-chemical modification
KW  - Crystallization
UR  - https://doi.org/10.1007/s11090-020-10059-1
L2  - https://doi.org/10.1007/s11090-020-10059-1
N2  - This contribution presents a new approach to rapid and low-temperature plasma-chemical crystallization of perovskite films. Chlorine-incorporated perovskite (MAPbI(3-x)Cl(x)) films were exposed to diffuse atmospheric hydrogen (H-2) plasma immediately after their deposition. Several types of surface characterization techniques were used to investigate the effect of the H-2 plasma on the surface of the perovskite films. Since the H-2 plasma was generated at a low temperature (<= 70 degrees C), there was no considerable damage to the plasma-treated perovskite films-although the morphology and chemistry changed significantly. H-2 plasma had a range of effects on the surface of the perovskite films: (1) changes in the chemical composition of the perovskite surface without removal of lead; (2) modification of the optoelectrical band structure; (3) crystallization of the perovskite film; and (4) the grain of the surface became highly ordered. The results presented demonstrate that H-2 plasma is a rapid and low-cost method for the manufacture of crystallized perovskite films. The method may be considered a significant step towards low-temperature, annealing-free crystallization of perovskite films.
ER  -

SHEKARGOFTAR, Masoud a Tomáš HOMOLA. A New Approach to the Crystallization of Perovskite Films by Cold Hydrogen Atmospheric Pressure Plasma. \textit{Plasma Chemistry and Plasma Processing}. New York: Springer, 2020, roč.~40, č.~2, s.~539-548. ISSN~0272-4324. Dostupné z: https://doi.org/10.1007/s11090-020-10059-1.

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