Time-resolved imaging of sputtered particles in multi-pulse
HiPIMS discharge

a 2019

Time-resolved imaging of sputtered particles in multi-pulse HiPIMS discharge

HNILICA, Jaroslav, Peter KLEIN, Pavel SOUČEK, Petr VAŠINA, Rony SNYDERS et. al.

Základní údaje

Originální název

Time-resolved imaging of sputtered particles in multi-pulse HiPIMS discharge

Autoři

HNILICA, Jaroslav (203 Česká republika, domácí), Peter KLEIN (703 Slovensko, domácí), Pavel SOUČEK (203 Česká republika, domácí), Petr VAŠINA (203 Česká republika), Rony SNYDERS a Nikolay BRITUN

Vydání

PLATHINIUM Plasma Thin Film International Union Meeting, 2019

Další údaje

Jazyk

angličtina

Typ výsledku

Konferenční abstrakt

Obor

10305 Fluids and plasma physics

Stát vydavatele

Francie

Utajení

není předmětem státního či obchodního tajemství

Kód RIV

RIV/00216224:14310/19:00112734

Organizační jednotka

Přírodovědecká fakulta

Klíčová slova anglicky

magnetron sputtering; HiPIMS; multi-pulse; AAS; LIF

Příznaky

Mezinárodní význam

Změněno: 24. 1. 2020 09:58, doc. Mgr. Jaroslav Hnilica, Ph.D.

Anotace

V originále

Ten years ago, an alternative high-power impulse magnetron sputtering (HiPIMS) deposition technique known as modulated pulsed power (MPP) magnetron sputtering has been introduced by Chistyakov et al. In MPP a long pulse is divided into many sub-pulses, which vary from few to tens of microseconds. Operating the HiPIMS in similar mode is called multi-pulse HiPIMS (m-HiPIMS). In the pulse sequence a large quantity of thermalized sputtered atoms, which were not ionized during the preceding pulse, are available to be ionized during the subsequent pulse. It leads to significant enhancement of total ion flux to the substrate and deposition rate. Direct imaging of sputtered particles above the magnetron target is a straightforward way to obtain information about the number density of neutrals and ions, degree of ionization or time of ion arrival to the virtual substrate. This work is focused on the dynamics of the ground state Ti atoms and singly ionized ions. It is achieved by their visualization using laser-induced fluorescence (LIF) imaging technique [4] combined with atomic absorption spectroscopy. In our study, the effects of the pulse duration, delay between the pulses and their number are examined. The effect of pulse number for better ionization control in the m-HiPIMS case is demonstrated. This phenomenon is related to the synchronization with both the wave of ions propagating from the cathode and following m-HiPIMS pulse (so-called ‘ion pumping’). Moreover, the influence of multi-pulse on the structure of the metallic titanium coating is studied. The results of this study can already be utilized to control the ionization degree in real processes involving HiPIMS discharges.

Návaznosti

LO1411, projekt VaV

Název: Rozvoj centra pro nízkonákladové plazmové a nanotechnologické povrchové úpravy (Akronym: CEPLANT plus)

Investor: Ministerstvo školství, mládeže a tělovýchovy ČR, Rozvoj centra pro nízkonákladové plazmové a nanotechnologické povrchové úpravy

Citovat

HNILICA, Jaroslav, Peter KLEIN, Pavel SOUČEK, Petr VAŠINA, Rony SNYDERS a Nikolay BRITUN. Time-resolved imaging of sputtered particles in multi-pulse HiPIMS discharge. In PLATHINIUM Plasma Thin Film International Union Meeting. 2019.

@proceedings{1609501,
   author = {Hnilica, Jaroslav and Klein, Peter and Souček, Pavel and Vašina, Petr and Snyders, Rony and Britun, Nikolay},
   booktitle = {PLATHINIUM Plasma Thin Film International Union Meeting},
   keywords = {magnetron sputtering; HiPIMS; multi-pulse; AAS; LIF},
   language = {eng},
   title = {Time-resolved imaging of sputtered particles in multi-pulse HiPIMS discharge},
   year = {2019}
}

TY  - CONF
ID  - 1609501
AU  - Hnilica, Jaroslav - Klein, Peter - Souček, Pavel - Vašina, Petr - Snyders, Rony - Britun, Nikolay
PY  - 2019
TI  - Time-resolved imaging of sputtered particles in multi-pulse HiPIMS discharge
KW  - magnetron sputtering
KW  - HiPIMS
KW  - multi-pulse
KW  - AAS
KW  - LIF
N2  - Ten years ago, an alternative high-power impulse magnetron sputtering (HiPIMS) deposition technique known as modulated pulsed power (MPP) magnetron sputtering has been introduced by Chistyakov et al. In MPP a long pulse is divided into many sub-pulses, which vary from few to tens of microseconds. Operating the HiPIMS in similar mode is called multi-pulse HiPIMS (m-HiPIMS). In the pulse sequence a large quantity of thermalized sputtered atoms, which were not ionized during the preceding pulse, are available to be ionized during the subsequent pulse. It leads to significant enhancement of total ion flux to the substrate and deposition rate. Direct imaging of sputtered particles above the magnetron target is a straightforward way to obtain information about the number density of neutrals and ions, degree of ionization or time of ion arrival to the virtual substrate. This work is focused on the dynamics of the ground state Ti atoms and singly ionized ions. It is achieved by their visualization using laser-induced fluorescence (LIF) imaging technique [4] combined with atomic absorption spectroscopy. In our study, the effects of the pulse duration, delay between the pulses and their number are examined. The effect of pulse number for better ionization control in the m-HiPIMS case is demonstrated. This phenomenon is related to the synchronization with both the wave of ions propagating from the cathode and following m-HiPIMS pulse (so-called ‘ion pumping’). Moreover, the influence of multi-pulse on the structure of the metallic titanium coating is studied. The results of this study can already be utilized to control the ionization degree in real processes involving HiPIMS discharges.
ER  -

HNILICA, Jaroslav, Peter KLEIN, Pavel SOUČEK, Petr VAŠINA, Rony SNYDERS a Nikolay BRITUN. Time-resolved imaging of sputtered particles in multi-pulse HiPIMS discharge. In \textit{PLATHINIUM Plasma Thin Film International Union Meeting}. 2019.

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