Ionised density fraction of sputtered species in HiPIMS
discharge excited in argon/acetylene gas mixture

a 2020

Ionised density fraction of sputtered species in HiPIMS discharge excited in argon/acetylene gas mixture

FEKETE, Matej; Katarína BERNÁTOVÁ; Jaroslav HNILICA; Pavel SOUČEK; Peter KLEIN et al.

Základní údaje

Originální název

Ionised density fraction of sputtered species in HiPIMS discharge excited in argon/acetylene gas mixture

Autoři

FEKETE, Matej; Katarína BERNÁTOVÁ; Jaroslav HNILICA; Pavel SOUČEK; Peter KLEIN a Petr VAŠINA

Vydání

Workshop on Plasma-Based Synthesis of Nanomaterials, 2020

Další údaje

Jazyk

angličtina

Typ výsledku

Konferenční abstrakt

Obor

10305 Fluids and plasma physics

Stát vydavatele

Česká republika

Utajení

není předmětem státního či obchodního tajemství

Označené pro přenos do RIV

Organizační jednotka

Přírodovědecká fakulta

Klíčová slova anglicky

HiPIMS; acetylene; ionised density fraction

Příznaky

Mezinárodní význam

Změněno: 29. 4. 2021 18:57, Mgr. Marie Novosadová Šípková, DiS.

Anotace

V originále

High power impulse magnetron sputtering (HiPIMS) technology attracts the interest of the industry as the coatings deposited by HiPIMS demonstrate improved properties compared to conventional dc magnetron sputtered (dcMS) coatings. This is because HiPIMS generates very dense plasma, which results in a large fraction of ionized sputtered particles. We report on the HiPIMS with titanium target in the argon atmosphere with an addition of acetylene gas. Such a process can be referred to either as hybrid PVD-PECVD [1] or non-saturated reactive process [2]. The non-invasive method called effective branching fraction method is utilized in order to evaluate the absolute ground state number densities of the sputtered titanium species for various flows of acetylene gas. Further, the HiPIMS process is modelled by a modified Berg model. The presented model incorporates the production of thick carbon layer at the target and the back-attraction of the sputtered titanium ions to the target. The simulated trends agree well with the measured ones.

Návaznosti

GA19-00579S, projekt VaV

Název: Pokročilá diagnostika reaktivního HiPIMS plazmatu pro depozici oxidových, nitridových a sulfidových vrstev

Investor: Grantová agentura ČR, Pokročilá diagnostika reaktivního HiPIMS plazmatu pro depozici oxidových, nitridových a sulfidových vrstev

LM2018097, projekt VaV

Název: Centrum výzkumu a vývoje plazmatu a nanotechnologických povrchových úprav (Akronym: CEPLANT)

Investor: Ministerstvo školství, mládeže a tělovýchovy ČR, R&D centre for plasma and nanotechnology surface modifications

Citovat

FEKETE, Matej; Katarína BERNÁTOVÁ; Jaroslav HNILICA; Pavel SOUČEK; Peter KLEIN a Petr VAŠINA. Ionised density fraction of sputtered species in HiPIMS discharge excited in argon/acetylene gas mixture. In Workshop on Plasma-Based Synthesis of Nanomaterials. 2020.

@proceedings{1620796,
   author = {Fekete, Matej and Bernátová, Katarína and Hnilica, Jaroslav and Souček, Pavel and Klein, Peter and Vašina, Petr},
   booktitle = {Workshop on Plasma-Based Synthesis of Nanomaterials},
   keywords = {HiPIMS; acetylene; ionised density fraction},
   language = {eng},
   title = {Ionised density fraction of sputtered species in HiPIMS discharge excited in argon/acetylene gas mixture},
   year = {2020}
}

TY  - CONF
ID  - 1620796
AU  - Fekete, Matej - Bernátová, Katarína - Hnilica, Jaroslav - Souček, Pavel - Klein, Peter - Vašina, Petr
PY  - 2020
TI  - Ionised density fraction of sputtered species in HiPIMS discharge excited in argon/acetylene gas mixture
KW  - HiPIMS
KW  - acetylene
KW  - ionised density fraction
N2  - High power impulse magnetron sputtering (HiPIMS) technology attracts the interest of the industry as the coatings deposited by HiPIMS demonstrate improved properties compared to conventional dc magnetron sputtered (dcMS) coatings. This is because HiPIMS generates very dense plasma, which results in a large fraction of ionized sputtered particles. We report on the HiPIMS with titanium target in the argon atmosphere with an addition of acetylene gas. Such a process can be referred to either as hybrid PVD-PECVD [1] or non-saturated reactive process [2]. The non-invasive method called effective branching fraction method is utilized in order to evaluate the absolute ground state number densities of the sputtered titanium species for various flows of acetylene gas. Further, the HiPIMS process is modelled by a modified Berg model. The presented model incorporates the production of thick carbon layer at the target and the back-attraction of the sputtered titanium ions to the target. The simulated trends agree well with the measured ones.
ER  -

FEKETE, Matej; Katarína BERNÁTOVÁ; Jaroslav HNILICA; Pavel SOUČEK; Peter KLEIN a Petr VAŠINA. Ionised density fraction of sputtered species in HiPIMS discharge excited in argon/acetylene gas mixture. In \textit{Workshop on Plasma-Based Synthesis of Nanomaterials}. 2020.

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