Evolution of ionization fraction of sputtered species in
standard, multi-pulse and reactive HiPIMS

a 2020

Evolution of ionization fraction of sputtered species in standard, multi-pulse and reactive HiPIMS

VAŠINA, Petr; Matej FEKETE; Katarína BERNÁTOVÁ; Peter KLEIN; Jaroslav HNILICA et al.

Základní údaje

Originální název

Evolution of ionization fraction of sputtered species in standard, multi-pulse and reactive HiPIMS

Autoři

VAŠINA, Petr; Matej FEKETE; Katarína BERNÁTOVÁ; Peter KLEIN a Jaroslav HNILICA

Vydání

Workshop on Plasma-Based Synthesis of Nanomaterials, 2020

Další údaje

Jazyk

angličtina

Typ výsledku

Konferenční abstrakt

Obor

10305 Fluids and plasma physics

Stát vydavatele

Česká republika

Utajení

není předmětem státního či obchodního tajemství

Označené pro přenos do RIV

Organizační jednotka

Přírodovědecká fakulta

Klíčová slova anglicky

HiPIMS; plasma diagnostics; EBF method; ionised density fraction

Příznaky

Mezinárodní význam

Změněno: 29. 4. 2021 18:58, Mgr. Marie Novosadová Šípková, DiS.

Anotace

V originále

High power impulse magnetron sputtering (HiPIMS) attracts the interest of the industry as the coatings deposited by HiPIMS exhibit enhanced properties compared to dc magnetron sputtered (dcMS) coatings. This is caused by very dense plasma generated in HiPIMS, which results in a large fraction of ionized sputtered particles. However, a significant drawback of HiPIMS is a lower deposition rate compared to dcMS, which can be mitigated by the operation of HiPIMS in multi-pulse mode (m-HiPIMS). M-HiPIMS further changes the coating structure and resulting properties due to the enhanced ion flux to the substrate. An effective branching fraction method is utilized to study the evolution of the sputtered species ionization fraction derived from the absolute ground state number densities of the sputtered titanium species. Influence of the preceding pulse on the subsequent pulse is examined as a function of delay between them. In reactive HiPIMS, the hysteresis curve is generally reduced in width and shifted towards lower reactive gas supplies compared to reactive dcMS. We report on the evolutions of the sputtered species ionization fraction in reactive HiPIMS with oxygen, nitrogen and acetylene gases. The sputtered species ionization fraction increases with the partial pressure of the reactive gas, which is attributed to a combination of different effects taking place in HiPIMS plasma. Further, the hysteresis curve shape changes with the change of the repetition frequency. Larger ionization fraction of the sputtered species leads to a larger difference in the hysteresis curve shape. The hysteresis behavior is modelled utilizing a modified Berg model, where the back-attraction of the sputtered species to the target is incorporated. The results from simulations prove that the back-attraction of sputtered metal ions is the main effect causing the hysteresis curve reduction and shift in reactive HiPIMS.

Návaznosti

GA19-00579S, projekt VaV

Název: Pokročilá diagnostika reaktivního HiPIMS plazmatu pro depozici oxidových, nitridových a sulfidových vrstev

Investor: Grantová agentura ČR, Pokročilá diagnostika reaktivního HiPIMS plazmatu pro depozici oxidových, nitridových a sulfidových vrstev

LM2018097, projekt VaV

Název: Centrum výzkumu a vývoje plazmatu a nanotechnologických povrchových úprav (Akronym: CEPLANT)

Investor: Ministerstvo školství, mládeže a tělovýchovy ČR, R&D centre for plasma and nanotechnology surface modifications

Citovat

VAŠINA, Petr; Matej FEKETE; Katarína BERNÁTOVÁ; Peter KLEIN a Jaroslav HNILICA. Evolution of ionization fraction of sputtered species in standard, multi-pulse and reactive HiPIMS. In Workshop on Plasma-Based Synthesis of Nanomaterials. 2020.

@proceedings{1620816,
   author = {Vašina, Petr and Fekete, Matej and Bernátová, Katarína and Klein, Peter and Hnilica, Jaroslav},
   booktitle = {Workshop on Plasma-Based Synthesis of Nanomaterials},
   keywords = {HiPIMS; plasma diagnostics; EBF method; ionised density fraction},
   language = {eng},
   title = {Evolution of ionization fraction of sputtered species in standard, multi-pulse and reactive HiPIMS},
   year = {2020}
}

TY  - CONF
ID  - 1620816
AU  - Vašina, Petr - Fekete, Matej - Bernátová, Katarína - Klein, Peter - Hnilica, Jaroslav
PY  - 2020
TI  - Evolution of ionization fraction of sputtered species in standard, multi-pulse and reactive HiPIMS
KW  - HiPIMS
KW  - plasma diagnostics
KW  - EBF method
KW  - ionised density fraction
N2  - High power impulse magnetron sputtering (HiPIMS) attracts the interest of the industry as the coatings deposited by HiPIMS exhibit enhanced properties compared to dc magnetron sputtered (dcMS) coatings. This is caused by very dense plasma generated in HiPIMS, which results in a large fraction of ionized sputtered particles. However, a significant drawback of HiPIMS is a lower deposition rate compared to dcMS, which can be mitigated by the operation of HiPIMS in multi-pulse mode (m-HiPIMS). M-HiPIMS further changes the coating structure and resulting properties due to the enhanced ion flux to the substrate. An effective branching fraction method is utilized to study the evolution of the sputtered species ionization fraction derived from the absolute ground state number densities of the sputtered titanium species. Influence of the preceding pulse on the subsequent pulse is examined as a function of delay between them. In reactive HiPIMS, the hysteresis curve is generally reduced in width and shifted towards lower reactive gas supplies compared to reactive dcMS. We report on the evolutions of the sputtered species ionization fraction in reactive HiPIMS with oxygen, nitrogen and acetylene gases. The sputtered species ionization fraction increases with the partial pressure of the reactive gas, which is attributed to a combination of different effects taking place in HiPIMS plasma. Further, the hysteresis curve shape changes with the change of the repetition frequency. Larger ionization fraction of the sputtered species leads to a larger difference in the hysteresis curve shape. The hysteresis behavior is modelled utilizing a modified Berg model, where the back-attraction of the sputtered species to the target is incorporated. The results from simulations prove that the back-attraction of sputtered metal ions is the main effect causing the hysteresis curve reduction and shift in reactive HiPIMS.
ER  -

VAŠINA, Petr; Matej FEKETE; Katarína BERNÁTOVÁ; Peter KLEIN a Jaroslav HNILICA. Evolution of ionization fraction of sputtered species in standard, multi-pulse and reactive HiPIMS. In \textit{Workshop on Plasma-Based Synthesis of Nanomaterials}. 2020.

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