The transport and surface reactivity of O atoms during the
atmospheric plasma etching of hydrogenated amorphous carbon
films

J 2019

The transport and surface reactivity of O atoms during the atmospheric plasma etching of hydrogenated amorphous carbon films

HEFNY, Mohamed Mokhtar; David NEČAS; Lenka ZAJÍČKOVÁ a Jan BENEDIKT

Základní údaje

Originální název

The transport and surface reactivity of O atoms during the atmospheric plasma etching of hydrogenated amorphous carbon films

Autoři

HEFNY, Mohamed Mokhtar; David NEČAS; Lenka ZAJÍČKOVÁ a Jan BENEDIKT

Vydání

PLASMA SOURCES SCIENCE & TECHNOLOGY, BRISTOL, IOP PUBLISHING LTD, 2019, 0963-0252

Další údaje

Jazyk

angličtina

Typ výsledku

Článek v odborném periodiku

Obor

10302 Condensed matter physics

Stát vydavatele

Velká Británie a Severní Irsko

Utajení

není předmětem státního či obchodního tajemství

Odkazy

URL

Impakt faktor

Impact factor: 3.193

Kód RIV

RIV/00216224:14310/19:00115475

Organizační jednotka

Přírodovědecká fakulta

DOI

https://doi.org/10.1088/1361-6595/ab0354

UT WoS

000461069700003

EID Scopus

2-s2.0-85066275647

Klíčová slova anglicky

atmospheric pressure plasma; transport of reactive species; O atoms; atmospheric plasma etching

Štítky

14312020, rivok

Příznaky

Mezinárodní význam, Recenzováno

Změněno: 6. 3. 2024 14:48, Mgr. Marie Novosadová Šípková, DiS.

Anotace

V originále

A remote microscale atmospheric pressure plasma jet with a He/O-2 gas mixture is used to etch a hydrogenated amorphous carbon layer. The etched profiles are measured by means of imaging spectroscopic reflectometry, a powerful technique providing a 2D map of the film thickness (etched profile) and also film properties. Additionally, the 2D axially symmetric fluid model of the gas flow and species transport combined with the basic kinetic model of the reaction of O atoms with O-2 molecules has been solved to study the transport and surface reactivity of O atoms. The model provides a spatially resolved and surface-integrated O atom loss rate at the surface. The situation with convection-dominated species transport and fast recombination reactions of O atoms in the volume leads to a strong dependence of the etched profile on the O-2 admixture and O atom surface loss probability beta. By comparing etched profiles with the simulation results, the O atom surface reaction probability of beta = 0.2%-0.6% could be estimated. The modeled O atom loss rate at the surface was always higher and with the same trend as the etching rate, corroborating that O atoms are the main etching species. The presented data and simulation results show that the fastest surface-integrated etching rate is achieved not under conditions with the highest O density on the jet axis, but at lower O-2 admixtures due to reduced recombination losses in the gas phase.

Návaznosti

LQ1601, projekt VaV

Název: CEITEC 2020 (Akronym: CEITEC2020)

Investor: Ministerstvo školství, mládeže a tělovýchovy ČR, CEITEC 2020

Citovat

HEFNY, Mohamed Mokhtar; David NEČAS; Lenka ZAJÍČKOVÁ a Jan BENEDIKT. The transport and surface reactivity of O atoms during the atmospheric plasma etching of hydrogenated amorphous carbon films. PLASMA SOURCES SCIENCE & TECHNOLOGY. BRISTOL: IOP PUBLISHING LTD, 2019, roč. 28, č. 3, s. 1-8. ISSN 0963-0252. Dostupné z: https://doi.org/10.1088/1361-6595/ab0354.

@article{1642104,
   author = {Hefny, Mohamed Mokhtar and Nečas, David and Zajíčková, Lenka and Benedikt, Jan},
   article_location = {BRISTOL},
   article_number = {3},
   doi = {https://doi.org/10.1088/1361-6595/ab0354},
   keywords = {atmospheric pressure plasma; transport of reactive species; O atoms; atmospheric plasma etching},
   language = {eng},
   issn = {0963-0252},
   journal = {PLASMA SOURCES SCIENCE & TECHNOLOGY},
   note = {doc. Zajíčková - dle rozhodnutí ředitelů 5.3.2024},
   title = {The transport and surface reactivity of O atoms during the atmospheric plasma etching of hydrogenated amorphous carbon films},
   url = {https://iopscience.iop.org/article/10.1088/1361-6595/ab0354},
   volume = {28},
   year = {2019}
}

TY  - JOUR
ID  - 1642104
AU  - Hefny, Mohamed Mokhtar - Nečas, David - Zajíčková, Lenka - Benedikt, Jan
PY  - 2019
TI  - The transport and surface reactivity of O atoms during the atmospheric plasma etching of hydrogenated amorphous carbon films
JF  - PLASMA SOURCES SCIENCE & TECHNOLOGY
VL  - 28
IS  - 3
SP  - 1-8
EP  - 1-8
PB  - IOP PUBLISHING LTD
SN  - 09630252
N1  - doc. Zajíčková - dle rozhodnutí ředitelů 5.3.2024
KW  - atmospheric pressure plasma
KW  - transport of reactive species
KW  - O atoms
KW  - atmospheric plasma etching
UR  - https://iopscience.iop.org/article/10.1088/1361-6595/ab0354
L2  - https://iopscience.iop.org/article/10.1088/1361-6595/ab0354
N2  - A remote microscale atmospheric pressure plasma jet with a He/O-2 gas mixture is used to etch a hydrogenated amorphous carbon layer. The etched profiles are measured by means of imaging spectroscopic reflectometry, a powerful technique providing a 2D map of the film thickness (etched profile) and also film properties. Additionally, the 2D axially symmetric fluid model of the gas flow and species transport combined with the basic kinetic model of the reaction of O atoms with O-2 molecules has been solved to study the transport and surface reactivity of O atoms. The model provides a spatially resolved and surface-integrated O atom loss rate at the surface. The situation with convection-dominated species transport and fast recombination reactions of O atoms in the volume leads to a strong dependence of the etched profile on the O-2 admixture and O atom surface loss probability beta. By comparing etched profiles with the simulation results, the O atom surface reaction probability of beta = 0.2%-0.6% could be estimated. The modeled O atom loss rate at the surface was always higher and with the same trend as the etching rate, corroborating that O atoms are the main etching species. The presented data and simulation results show that the fastest surface-integrated etching rate is achieved not under conditions with the highest O density on the jet axis, but at lower O-2 admixtures due to reduced recombination losses in the gas phase.
ER  -

HEFNY, Mohamed Mokhtar; David NEČAS; Lenka ZAJÍČKOVÁ a Jan BENEDIKT. The transport and surface reactivity of O atoms during the atmospheric plasma etching of hydrogenated amorphous carbon films. \textit{PLASMA SOURCES SCIENCE \&{}amp; TECHNOLOGY}. BRISTOL: IOP PUBLISHING LTD, 2019, roč.~28, č.~3, s.~1-8. ISSN~0963-0252. Dostupné z: https://doi.org/10.1088/1361-6595/ab0354.

Přehled o publikaci