PREPARATION OF PPHMDSO THIN FILMS IN CAPACITIVELY COUPLED RF
GLOW DISCHARGES UNDER DUSTY PLASMA CONDITIONS

D 2018

PREPARATION OF PPHMDSO THIN FILMS IN CAPACITIVELY COUPLED RF GLOW DISCHARGES UNDER DUSTY PLASMA CONDITIONS

HOMOLA, Vojtěch; Vilma BURŠÍKOVÁ; Lukáš KELAR; Štěpánka KELAROVÁ; Monika STUPAVSKÁ et al.

Základní údaje

Originální název

PREPARATION OF PPHMDSO THIN FILMS IN CAPACITIVELY COUPLED RF GLOW DISCHARGES UNDER DUSTY PLASMA CONDITIONS

Autoři

HOMOLA, Vojtěch; Vilma BURŠÍKOVÁ; Lukáš KELAR; Štěpánka KELAROVÁ; Monika STUPAVSKÁ a Vratislav PEŘINA

Vydání

SLEZSKA, 9TH INTERNATIONAL CONFERENCE ON NANOMATERIALS - RESEARCH & APPLICATION (NANOCON 2017), od s. 831-835, 5 s. 2018

Nakladatel

TANGER LTD

Další údaje

Jazyk

angličtina

Typ výsledku

Stať ve sborníku

Obor

21000 2.10 Nano-technology

Stát vydavatele

Česká republika

Utajení

není předmětem státního či obchodního tajemství

Forma vydání

elektronická verze "online"

Odkazy

URL

Označené pro přenos do RIV

Ano

Kód RIV

RIV/00216224:14310/18:00108254

Organizační jednotka

Přírodovědecká fakulta

ISBN

978-80-87294-81-9

UT WoS

000452823300138

EID Scopus

2-s2.0-85052280629

Klíčová slova anglicky

PECVD; hexamethyldisiloxane; oxygen; mechanical properties

Štítky

rivok

Příznaky

Mezinárodní význam, Recenzováno

Změněno: 13. 4. 2020 19:07, Mgr. Marie Novosadová Šípková, DiS.

Anotace

V originále

The deposition of organosilicone thin films from mixture of hexamethyldisiloxane (HMDSO) and oxygen by using capacitively coupled R.F. glow discharges under dusty plasma conditions was investigated. High resolution topography and mechanical property maps of the prepared films were acquired by using atomic force microscopy techniques. The chemical bond and composition of the deposited films were analyzed by Fourier transform infrared spectroscopy (FTIR) and X-ray photoelectron spectroscopy (XPS). The mechanical properties of the films were studied using quasistatic as well as dynamic nanoindentation tests and their surface free energies were evaluated by means of contact angle measuring technique using several testing liquids exhibiting various surface tensions. The thermal stability of the films was studied using thermal desorption spectroscopy. Neural network modelling was used to study the effect of plasma parameters on the hardness of ppHMDSO films.

Návaznosti

ED2.1.00/03.0086, projekt VaV

Název: Regionální VaV centrum pro nízkonákladové plazmové a nanotechnologické povrchové úpravy

GA15-17875S, projekt VaV

Název: Lokální mikrostrukturní změny vyvolané statickou a dynamickou indentací nanostrukturovaných a nanolaminovaných povlaků

Investor: Grantová agentura ČR, Lokální mikrostrukturní změny vyvolané statickou a dynamickou indentací nanostrukturovaných a nanolaminovaných povlaků

LO1411, projekt VaV

Název: Rozvoj centra pro nízkonákladové plazmové a nanotechnologické povrchové úpravy (Akronym: CEPLANT plus)

Investor: Ministerstvo školství, mládeže a tělovýchovy ČR, Rozvoj centra pro nízkonákladové plazmové a nanotechnologické povrchové úpravy

Citovat

HOMOLA, Vojtěch; Vilma BURŠÍKOVÁ; Lukáš KELAR; Štěpánka KELAROVÁ; Monika STUPAVSKÁ a Vratislav PEŘINA. PREPARATION OF PPHMDSO THIN FILMS IN CAPACITIVELY COUPLED RF GLOW DISCHARGES UNDER DUSTY PLASMA CONDITIONS. Online. In 9TH INTERNATIONAL CONFERENCE ON NANOMATERIALS - RESEARCH & APPLICATION (NANOCON 2017). SLEZSKA: TANGER LTD, 2018, s. 831-835. ISBN 978-80-87294-81-9.

@inproceedings{1644756,
   author = {Homola, Vojtěch and Buršíková, Vilma and Kelar, Lukáš and Kelarová, Štěpánka and Stupavská, Monika and Peřina, Vratislav},
   address = {SLEZSKA},
   booktitle = {9TH INTERNATIONAL CONFERENCE ON NANOMATERIALS - RESEARCH & APPLICATION (NANOCON 2017)},
   keywords = {PECVD; hexamethyldisiloxane; oxygen; mechanical properties},
   howpublished = {elektronická verze "online"},
   language = {eng},
   location = {SLEZSKA},
   isbn = {978-80-87294-81-9},
   pages = {831-835},
   publisher = {TANGER LTD},
   title = {PREPARATION OF PPHMDSO THIN FILMS IN CAPACITIVELY COUPLED RF GLOW DISCHARGES UNDER DUSTY PLASMA CONDITIONS},
   url = {https://invenio.nusl.cz/record/387685},
   year = {2018}
}

TY  - CONF
ID  - 1644756
AU  - Homola, Vojtěch - Buršíková, Vilma - Kelar, Lukáš - Kelarová, Štěpánka - Stupavská, Monika - Peřina, Vratislav
PY  - 2018
TI  - PREPARATION OF PPHMDSO THIN FILMS IN CAPACITIVELY COUPLED RF GLOW DISCHARGES UNDER DUSTY PLASMA CONDITIONS
PB  - TANGER LTD
CY  - SLEZSKA
SN  - 9788087294819
KW  - PECVD
KW  - hexamethyldisiloxane
KW  - oxygen
KW  - mechanical properties
UR  - https://invenio.nusl.cz/record/387685
L2  - https://invenio.nusl.cz/record/387685
N2  - The deposition of organosilicone thin films from mixture of hexamethyldisiloxane (HMDSO) and oxygen by using capacitively coupled R.F. glow discharges under dusty plasma conditions was investigated. High resolution topography and mechanical property maps of the prepared films were acquired by using atomic force microscopy techniques. The chemical bond and composition of the deposited films were analyzed by Fourier transform infrared spectroscopy (FTIR) and X-ray photoelectron spectroscopy (XPS). The mechanical properties of the films were studied using quasistatic as well as dynamic nanoindentation tests and their surface free energies were evaluated by means of contact angle measuring technique using several testing liquids exhibiting various surface tensions. The thermal stability of the films was studied using thermal desorption spectroscopy. Neural network modelling was used to study the effect of plasma parameters on the hardness of ppHMDSO films.
ER  -

HOMOLA, Vojtěch; Vilma BURŠÍKOVÁ; Lukáš KELAR; Štěpánka KELAROVÁ; Monika STUPAVSKÁ a Vratislav PEŘINA. PREPARATION OF PPHMDSO THIN FILMS IN CAPACITIVELY COUPLED RF GLOW DISCHARGES UNDER DUSTY PLASMA CONDITIONS. Online. In \textit{9TH INTERNATIONAL CONFERENCE ON NANOMATERIALS - RESEARCH \&{}amp; APPLICATION (NANOCON 2017)}. SLEZSKA: TANGER LTD, 2018, s.~831-835. ISBN~978-80-87294-81-9.

Přehled o publikaci