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@proceedings{1645920,
author = {Krumpolec, Richard and Bača, Dominik and Jurmanová, Jana and Kunovský, Pavel and Humlíček, Josef and Cameron, David Campbell},
keywords = {atomic layer deposition, copper chloride, copper bromide, copper iodide, nucleation, film growth, nanocrystals},
isbn = {978-80-210-9487-1},
title = {Deposition of Copper Halide Films for Optoelectronic Applications},
year = {2019}
}
TY - CONF
ID - 1645920
AU - Krumpolec, Richard - Bača, Dominik - Jurmanová, Jana - Kunovský, Pavel - Humlíček, Josef - Cameron, David Campbell
PY - 2019
TI - Deposition of Copper Halide Films for Optoelectronic Applications
SN - 9788021094871
KW - atomic layer deposition, copper chloride, copper bromide, copper iodide, nucleation, film growth, nanocrystals
ER -
KRUMPOLEC, Richard, Dominik BAČA, Jana JURMANOVÁ, Pavel KUNOVSKÝ, Josef HUMLÍČEK a David Campbell CAMERON. \textit{Deposition of Copper Halide Films for Optoelectronic Applications}. 2019. ISBN~978-80-210-9487-1.
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