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@article{1657596,
author = {Matějka, Milan and Krátký, Stanislav and Řiháček, Tomáš and Knápek, Alexandr and Kolařík, Vladimír},
article_number = {2},
doi = {http://dx.doi.org/10.2478/jee-2020-0019},
keywords = {membrane, nano optical device, electron optics, electron beam lithography, silicon nitride, reactive ion etching, silicon etching, microfabrication},
language = {eng},
issn = {1335-3632},
journal = {Journal of Electrical Engineering},
title = {Functional nano-structuring of thin silicon nitride membranes},
url = {https://sciendo.com/article/10.2478/jee-2020-0019},
volume = {71},
year = {2020}
}
TY - JOUR
ID - 1657596
AU - Matějka, Milan - Krátký, Stanislav - Řiháček, Tomáš - Knápek, Alexandr - Kolařík, Vladimír
PY - 2020
TI - Functional nano-structuring of thin silicon nitride membranes
JF - Journal of Electrical Engineering
VL - 71
IS - 2
SP - 127-130
EP - 127-130
PB - Slovenská technická univezita v Bratislavě
SN - 13353632
KW - membrane, nano optical device, electron optics, electron beam lithography, silicon nitride, reactive ion etching, silicon etching, microfabrication
UR - https://sciendo.com/article/10.2478/jee-2020-0019
ER -
MATĚJKA, Milan, Stanislav KRÁTKÝ, Tomáš ŘIHÁČEK, Alexandr KNÁPEK a Vladimír KOLAŘÍK. Functional nano-structuring of thin silicon nitride membranes. \textit{Journal of Electrical Engineering}. Slovenská technická univezita v Bratislavě, 2020, roč.~71, č.~2, s.~127-130. ISSN~1335-3632. Dostupné z: https://dx.doi.org/10.2478/jee-2020-0019.
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