Ionisation fractions of sputtered titanium species at target
and substrate region in HiPIMS

J 2020

Ionisation fractions of sputtered titanium species at target and substrate region in HiPIMS

BERNÁTOVÁ, Katarína; Matej FEKETE; Peter KLEIN; Jaroslav HNILICA; Petr VAŠINA et al.

Základní údaje

Originální název

Ionisation fractions of sputtered titanium species at target and substrate region in HiPIMS

Autoři

BERNÁTOVÁ, Katarína; Matej FEKETE; Peter KLEIN; Jaroslav HNILICA a Petr VAŠINA

Vydání

Plasma Sources Science and Technology, Bristol, IOP Publishing Ltd. 2020, 0963-0252

Další údaje

Jazyk

angličtina

Typ výsledku

Článek v odborném periodiku

Obor

10305 Fluids and plasma physics

Stát vydavatele

Velká Británie a Severní Irsko

Utajení

není předmětem státního či obchodního tajemství

Odkazy

Full Text

Impakt faktor

Impact factor: 3.584

Označené pro přenos do RIV

Ano

Kód RIV

RIV/00216224:14310/20:00114195

Organizační jednotka

Přírodovědecká fakulta

Klíčová slova anglicky

plasma diagnostic; HiPIMS; titanium; ionisation fraction; magnetron sputtering

Štítky

H24, rivok

Příznaky

Mezinárodní význam, Recenzováno

Změněno: 5. 11. 2020 18:13, Mgr. Marie Novosadová Šípková, DiS.

Anotace

V originále

In this paper, the ground state number densities of titanium atom and ion, ionised density fraction and ionised flux fraction were determined in a high power impulse magnetron sputtering process. Three regions of interest within the deposition chamber were studied; the magnetised plasma region, middle region, and substrate region. Pulse length and applied power were kept constant and working pressure and duty cycle were varied. The effective branching fractions method was utilised to evaluate the number densities of sputtered species from a measured optical emission signal. A biasable quartz crystal microbalance system was used to evaluate the ionised flux fraction and deposition rate. The highest ionised density fraction of 90% was reached in the target region for 1.2% duty cycle and it was mostly independent on working pressure. Moving from the target, the ionised density fraction was observed to decrease. In the substrate region for a duty cycle below 2% and the whole studied working pressure range, the ionised density fraction always reached at least 50%.

Návaznosti

GA19-00579S, projekt VaV

Název: Pokročilá diagnostika reaktivního HiPIMS plazmatu pro depozici oxidových, nitridových a sulfidových vrstev

Investor: Grantová agentura ČR, Pokročilá diagnostika reaktivního HiPIMS plazmatu pro depozici oxidových, nitridových a sulfidových vrstev

LM2018097, projekt VaV

Název: Centrum výzkumu a vývoje plazmatu a nanotechnologických povrchových úprav (Akronym: CEPLANT)

Investor: Ministerstvo školství, mládeže a tělovýchovy ČR, R&D centre for plasma and nanotechnology surface modifications

Citovat

BERNÁTOVÁ, Katarína; Matej FEKETE; Peter KLEIN; Jaroslav HNILICA a Petr VAŠINA. Ionisation fractions of sputtered titanium species at target and substrate region in HiPIMS. Plasma Sources Science and Technology. Bristol: IOP Publishing Ltd., 2020, roč. 29, č. 5, s. 1-10. ISSN 0963-0252. Dostupné z: https://doi.org/10.1088/1361-6595/ab82b1.

@article{1664020,
   author = {Bernátová, Katarína and Fekete, Matej and Klein, Peter and Hnilica, Jaroslav and Vašina, Petr},
   article_location = {Bristol},
   article_number = {5},
   doi = {https://doi.org/10.1088/1361-6595/ab82b1},
   keywords = {plasma diagnostic; HiPIMS; titanium; ionisation fraction; magnetron sputtering},
   language = {eng},
   issn = {0963-0252},
   journal = {Plasma Sources Science and Technology},
   title = {Ionisation fractions of sputtered titanium species at target and substrate region in HiPIMS},
   url = {https://iopscience.iop.org/article/10.1088/1361-6595/ab82b1},
   volume = {29},
   year = {2020}
}

TY  - JOUR
ID  - 1664020
AU  - Bernátová, Katarína - Fekete, Matej - Klein, Peter - Hnilica, Jaroslav - Vašina, Petr
PY  - 2020
TI  - Ionisation fractions of sputtered titanium species at target and substrate region in HiPIMS
JF  - Plasma Sources Science and Technology
VL  - 29
IS  - 5
SP  - 1-10
EP  - 1-10
PB  - IOP Publishing Ltd.
SN  - 09630252
KW  - plasma diagnostic
KW  - HiPIMS
KW  - titanium
KW  - ionisation fraction
KW  - magnetron sputtering
UR  - https://iopscience.iop.org/article/10.1088/1361-6595/ab82b1
L2  - https://iopscience.iop.org/article/10.1088/1361-6595/ab82b1
N2  - In this paper, the ground state number densities of titanium atom and ion, ionised density fraction and ionised flux fraction were determined in a high power impulse magnetron sputtering process. Three regions of interest within the deposition chamber were studied; the magnetised plasma region, middle region, and substrate region. Pulse length and applied power were kept constant and working pressure and duty cycle were varied. The effective branching fractions method was utilised to evaluate the number densities of sputtered species from a measured optical emission signal. A biasable quartz crystal microbalance system was used to evaluate the ionised flux fraction and deposition rate. The highest ionised density fraction of 90% was reached in the target region for 1.2% duty cycle and it was mostly independent on working pressure. Moving from the target, the ionised density fraction was observed to decrease. In the substrate region for a duty cycle below 2% and the whole studied working pressure range, the ionised density fraction always reached at least 50%.
ER  -

BERNÁTOVÁ, Katarína; Matej FEKETE; Peter KLEIN; Jaroslav HNILICA a Petr VAŠINA. Ionisation fractions of sputtered titanium species at target and substrate region in HiPIMS. \textit{Plasma Sources Science and Technology}. Bristol: IOP Publishing Ltd., 2020, roč.~29, č.~5, s.~1-10. ISSN~0963-0252. Dostupné z: https://doi.org/10.1088/1361-6595/ab82b1.

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