J 2020

Ion channelling effect and damage accumulation in yttria-stabilized zirconia implanted with Ag ions

MIKŠOVÁ, Romana, Petr MALINSKÝ, Petr HARCUBA, Jozef VESELÝ, Václav HOLÝ et. al.

Základní údaje

Originální název

Ion channelling effect and damage accumulation in yttria-stabilized zirconia implanted with Ag ions

Autoři

MIKŠOVÁ, Romana, Petr MALINSKÝ, Petr HARCUBA, Jozef VESELÝ, Václav HOLÝ (203 Česká republika, garant, domácí), Ulrich KENTSCH a Anna MACKOVÁ

Vydání

Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms, Amsterdam, Elsevier, 2020, 0168-583X

Další údaje

Jazyk

angličtina

Typ výsledku

Článek v odborném periodiku

Obor

10304 Nuclear physics

Stát vydavatele

Nizozemské království

Utajení

není předmětem státního či obchodního tajemství

Odkazy

Impakt faktor

Impact factor: 1.377

Kód RIV

RIV/00216224:14740/20:00117382

Organizační jednotka

Středoevropský technologický institut

UT WoS

000531672400006

Klíčová slova anglicky

Ion-irradiation of crystals; Yttria-stabilized zirconia; RBS-channelling; Ag particles

Štítky

Příznaky

Mezinárodní význam, Recenzováno
Změněno: 13. 4. 2022 08:42, Mgr. Marie Šípková, DiS.

Anotace

V originále

Yttria stabilized zirconia (YSZ) is well known as a radiation-resistant material. In this study, we present results from 400 keV Ag+ implantations of the (1 0 0) YSZ single crystals to fluences ranging from 5 x 10(15) to 5 x 10(16) cm(-2). The damage depth profiling and accumulation were probed using Rutherford backscattering spectrometry in the channelling mode (RBS-C), Transmission electron microscopy (TEM) and X-ray diffraction (XRD). The axial channelling effect of 2 MeV He+ ions in the implanted YSZ was studied. RBS-C provides us with detailed information about the displaced atoms density depth profiles progressing into greater depths, especially in the case of higher fluence. TEM was utilized to characterize the microstructure evolution and damage accumulation in the buried layer after the implantation. At the highest fluence (5 x 10(16) cm(-2)), Ag depth profile in the depth of 30-130 nm was identified in TEM bright and dark field images as well as in the electron diffraction patterns. Ag depth profiles are in agreement with depth profiles determined by RBS which show maximum Ag concentration in the depth of 94 nm. The reason for the decrease of the deformation identified by XRD in the vertical direction is the defect formation.