2021
Stability of trimethylsilyl acetate-based plasma polymers towards atmospheric and water environments
KELAROVÁ, Štěpánka; Monika STUPAVSKÁ; Vojtěch HOMOLA; Roman PŘIBYL; Lukáš ZÁBRANSKÝ et al.Základní údaje
Originální název
Stability of trimethylsilyl acetate-based plasma polymers towards atmospheric and water environments
Autoři
KELAROVÁ, Štěpánka; Monika STUPAVSKÁ; Vojtěch HOMOLA; Roman PŘIBYL; Lukáš ZÁBRANSKÝ; Anna CAMPBELL CHARVÁTOVÁ; Marek HAVLÍČEK; Richard VÁCLAVIK a Vilma BURŠÍKOVÁ
Vydání
Polymer Degradation and Stability, Elsevier Ltd. 2021, 0141-3910
Další údaje
Jazyk
angličtina
Typ výsledku
Článek v odborném periodiku
Obor
20506 Coating and films
Stát vydavatele
Velká Británie a Severní Irsko
Utajení
není předmětem státního či obchodního tajemství
Odkazy
Impakt faktor
Impact factor: 5.204
Označené pro přenos do RIV
Ano
Kód RIV
RIV/00216224:14310/21:00119065
Organizační jednotka
Přírodovědecká fakulta
UT WoS
EID Scopus
Klíčová slova anglicky
Trimethylsilyl acetate; PECVD; XPS; AFM; FTIR; Hydrophobicity; Degradation
Příznaky
Mezinárodní význam, Recenzováno
Změněno: 1. 9. 2021 11:40, Mgr. Marie Novosadová Šípková, DiS.
Anotace
V originále
In the present work, SiOxCyHz coatings were prepared in capacitively coupled RF glow discharge from gaseous mixture of trimethylsilyl acetate (TMSAc) monomer and oxygen. Properties of thin solid films prepared using continuous wave (CW) plasma and pulsed wave (PW) plasma were examined, including long–term stability in contact with air and water environments. The presented study proves that it is possible to prepare organosilicon coatings showing properties in a wide range from soft organic polymeric structures to materials similar to SiO2 with Martens hardness of 4 GPa. The content of carbon species in organosilicon structure and water contact angle (WCA) decreased with increasing oxygen ratio from 7.7 % to 75.0 %. The water contact angle of TMSAc-based coatings prepared in CW mode decreased from 95° to 76°. The application of pulsed mode using an oxygen ratio of 50 % and pulse repetition frequencies in the range of 0.33 Hz to 300 Hz led to materials with hydrophobic character (WCA in range of 86°–94°) with increased content of CHx and Si-CH3 structures in comparison to CW mode. This study proves that the aging mechanism significantly depends on deposition parameters. The increase of oxygen ratio, as well as the increase of pulse repetition frequency, led to the higher resistance towards the atmospheric environment. On the other side, organosilicon coatings prepared in CW mode using high oxygen ratios (50–75 %) showed significant delamination after immersion in water. However, the use of PW plasma for the preparation of SiOxCyHz thin films significantly improved the stability of resulting materials under water environment.
Návaznosti
| GA19-15240S, projekt VaV |
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| LM2018097, projekt VaV |
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| 90110, velká výzkumná infrastruktura |
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