D 2022

Low-Temperature Atmospheric Pressure Plasma for Applications in Flexible and Printed Electronics

VIDA, Július and Tomáš HOMOLA

Basic information

Original name

Low-Temperature Atmospheric Pressure Plasma for Applications in Flexible and Printed Electronics

Authors

VIDA, Július (703 Slovakia, guarantor, belonging to the institution) and Tomáš HOMOLA (703 Slovakia, belonging to the institution)

Edition

Lecture Notes in Mechanical. Singapore, Proceedings of the 2nd International Conference on Advanced Surface Enhancement (INCASE 2021), p. 66-69, 4 pp. 2022

Publisher

Springer

Other information

Language

English

Type of outcome

Proceedings paper

Field of Study

10305 Fluids and plasma physics

Country of publisher

Singapore

Confidentiality degree

is not subject to a state or trade secret

Publication form

printed version "print"

References:

RIV identification code

RIV/00216224:14310/22:00119220

Organization unit

Faculty of Science

ISBN

978-981-16-5762-7

ISSN

EID Scopus

2-s2.0-85115198438

Keywords in English

Low-temperature plasma ;Flexible and printed electronics; Perovskite solar cells; DCSBD; Roll-to-roll

Tags

Tags

International impact, Reviewed
Changed: 24/11/2021 10:12, Mgr. Marie Novosadová Šípková, DiS.

Abstract

In the original language

Low-temperature plasma processing of surfaces and interfaces is an interesting option for applications in flexible and printed electronics where surface cleaning, activation or functionalization are required. Plasma processing compared to more traditional chemical treatment can be significantly cheaper and faster while eliminating the need for toxic organic solvents. Printed functional coatings often contain organic moieties from solvents, binders and other additives that tune the properties of the precursor liquid. These need to be effectively removed for optimal properties of the resulting film. Plasma can provide reactive and energetic species to the surface of printed films for post-printing processing at significantly lower temperatures compared to conventional thermal annealing. In this paper, we summarize applications of low-temperature atmospheric plasma for cleaning of indium tin oxide (ITO) and fluorine-doped tin oxide (FTO) substrates for improved interface quality between the electrode and the blocking layer in perovskite solar cells. Plasma treatment in order of seconds proved as effective as a chemical treatment for an hour. We also present a way for post-deposition mineralization of mesoporous TiO2 electron transport layer for perovskite solar cells at temperatures below 70 °C compatible with temperature-sensitive substrates.

Links

GJ19-14770Y, research and development project
Name: Plazmatem produkované nanostrukturované vrstvy pro flexibilní materiály nové generace
Investor: Czech Science Foundation