2022
Low-Temperature Atmospheric Pressure Plasma for Applications in Flexible and Printed Electronics
VIDA, Július and Tomáš HOMOLABasic information
Original name
Low-Temperature Atmospheric Pressure Plasma for Applications in Flexible and Printed Electronics
Authors
VIDA, Július (703 Slovakia, guarantor, belonging to the institution) and Tomáš HOMOLA (703 Slovakia, belonging to the institution)
Edition
Lecture Notes in Mechanical. Singapore, Proceedings of the 2nd International Conference on Advanced Surface Enhancement (INCASE 2021), p. 66-69, 4 pp. 2022
Publisher
Springer
Other information
Language
English
Type of outcome
Proceedings paper
Field of Study
10305 Fluids and plasma physics
Country of publisher
Singapore
Confidentiality degree
is not subject to a state or trade secret
Publication form
printed version "print"
References:
RIV identification code
RIV/00216224:14310/22:00119220
Organization unit
Faculty of Science
ISBN
978-981-16-5762-7
ISSN
EID Scopus
2-s2.0-85115198438
Keywords in English
Low-temperature plasma ;Flexible and printed electronics; Perovskite solar cells; DCSBD; Roll-to-roll
Tags
Tags
International impact, Reviewed
Changed: 24/11/2021 10:12, Mgr. Marie Novosadová Šípková, DiS.
Abstract
In the original language
Low-temperature plasma processing of surfaces and interfaces is an interesting option for applications in flexible and printed electronics where surface cleaning, activation or functionalization are required. Plasma processing compared to more traditional chemical treatment can be significantly cheaper and faster while eliminating the need for toxic organic solvents. Printed functional coatings often contain organic moieties from solvents, binders and other additives that tune the properties of the precursor liquid. These need to be effectively removed for optimal properties of the resulting film. Plasma can provide reactive and energetic species to the surface of printed films for post-printing processing at significantly lower temperatures compared to conventional thermal annealing. In this paper, we summarize applications of low-temperature atmospheric plasma for cleaning of indium tin oxide (ITO) and fluorine-doped tin oxide (FTO) substrates for improved interface quality between the electrode and the blocking layer in perovskite solar cells. Plasma treatment in order of seconds proved as effective as a chemical treatment for an hour. We also present a way for post-deposition mineralization of mesoporous TiO2 electron transport layer for perovskite solar cells at temperatures below 70 °C compatible with temperature-sensitive substrates.
Links
| GJ19-14770Y, research and development project |
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