Electric signals measured during plasma thin-film etching and
their connection to the electron concentration and the
properties of the treated surface

J 2022

Electric signals measured during plasma thin-film etching and their connection to the electron concentration and the properties of the treated surface

DVOŘÁK, Pavel; Radek ŽEMLIČKA; Roman PŘIBYL a Vilma BURŠÍKOVÁ

Základní údaje

Originální název

Electric signals measured during plasma thin-film etching and their connection to the electron concentration and the properties of the treated surface

Autoři

DVOŘÁK, Pavel; Radek ŽEMLIČKA; Roman PŘIBYL a Vilma BURŠÍKOVÁ

Vydání

Plasma Sources Science and Technology, IOP Publishing Ltd. 2022, 0963-0252

Další údaje

Jazyk

angličtina

Typ výsledku

Článek v odborném periodiku

Obor

10305 Fluids and plasma physics

Stát vydavatele

Velká Británie a Severní Irsko

Utajení

není předmětem státního či obchodního tajemství

Odkazy

URL

Impakt faktor

Impact factor: 3.800

Označené pro přenos do RIV

Ano

Kód RIV

RIV/00216224:14310/22:00119623

Organizační jednotka

Přírodovědecká fakulta

Klíčová slova anglicky

High-frequency and RF discharges; Radio-frequency and microwave measurements

Štítky

14312030, rivok

Příznaky

Mezinárodní význam, Recenzováno

Změněno: 27. 2. 2024 13:32, Mgr. Marie Novosadová Šípková, DiS.

Anotace

V originále

Electric characteristics of a discharge are usually changed when a thin film is deposited on or etched from a discharge electrode or a substrate. The electric characteristics include plasma potential, discharge voltage and discharge current, including higher harmonic frequencies of these quantities. This fact can be used for monitoring of various plasma processes, but the mechanism in which the thin film influences the electric characteristics of discharge has not been fully clarified. This work verifies on the example of etching of diamond-like carbon films that variations of electric discharge parameters are caused by variations of electron concentration, which is caused by a difference of the electron emission yield between the DLC film and its substrate.

Návaznosti

GA19-15240S, projekt VaV

Název: Multifunkční nanokompozitní polymerní tenké vrstvy s řízenými povrchovými a mechanickými vlastnostmi připravené v RF prachovém plazmatu

Investor: Grantová agentura ČR, Multifunkční nanokompozitní polymerní tenké vrstvy s řízenými povrchovými a mechanickými vlastnostmi připravené v RF prachovém plazmatu

90097, velká výzkumná infrastruktura

Název: CEPLANT

Citovat

DVOŘÁK, Pavel; Radek ŽEMLIČKA; Roman PŘIBYL a Vilma BURŠÍKOVÁ. Electric signals measured during plasma thin-film etching and their connection to the electron concentration and the properties of the treated surface. Plasma Sources Science and Technology. IOP Publishing Ltd., 2022, roč. 31, č. 3, s. 1-6. ISSN 0963-0252. Dostupné z: https://doi.org/10.1088/1361-6595/ac4e23.

@article{1827782,
   author = {Dvořák, Pavel and Žemlička, Radek and Přibyl, Roman and Buršíková, Vilma},
   article_number = {3},
   doi = {https://doi.org/10.1088/1361-6595/ac4e23},
   keywords = {High-frequency and RF discharges; Radio-frequency and microwave measurements},
   language = {eng},
   issn = {0963-0252},
   journal = {Plasma Sources Science and Technology},
   title = {Electric signals measured during plasma thin-film etching and their connection to the electron concentration and the properties of the treated surface},
   url = {https://doi.org/10.1088/1361-6595/ac4e23},
   volume = {31},
   year = {2022}
}

TY  - JOUR
ID  - 1827782
AU  - Dvořák, Pavel - Žemlička, Radek - Přibyl, Roman - Buršíková, Vilma
PY  - 2022
TI  - Electric signals measured during plasma thin-film etching and their connection to the electron concentration and the properties of the treated surface
JF  - Plasma Sources Science and Technology
VL  - 31
IS  - 3
SP  - 1-6
EP  - 1-6
PB  - IOP Publishing Ltd.
SN  - 09630252
KW  - High-frequency and RF discharges
KW  - Radio-frequency and microwave measurements
UR  - https://doi.org/10.1088/1361-6595/ac4e23
N2  - Electric characteristics of a discharge are usually changed when a thin film is deposited on or etched from a discharge electrode or a substrate. The electric characteristics include plasma potential, discharge voltage and discharge current, including higher harmonic frequencies of these quantities. This fact can be used for monitoring of various plasma processes, but the mechanism in which the thin film influences the electric characteristics of discharge has not been fully clarified. This work verifies on the example of etching of diamond-like carbon films that variations of electric discharge parameters are caused by variations of electron concentration, which is caused by a difference of the electron emission yield between the DLC film and its substrate.
ER  -

DVOŘÁK, Pavel; Radek ŽEMLIČKA; Roman PŘIBYL a Vilma BURŠÍKOVÁ. Electric signals measured during plasma thin-film etching and their connection to the electron concentration and the properties of the treated surface. \textit{Plasma Sources Science and Technology}. IOP Publishing Ltd., 2022, roč.~31, č.~3, s.~1-6. ISSN~0963-0252. Dostupné z: https://doi.org/10.1088/1361-6595/ac4e23.

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