Effect of pulse laser frequency on PLD growth of LuFeO3
explained by kinetic simulations of in-situ diffracted
intensities

J 2022

Effect of pulse laser frequency on PLD growth of LuFeO3 explained by kinetic simulations of in-situ diffracted intensities

GABRIEL, Vít; Pavel KOCÁN; Sondes BAUER; Berkin NERGIS; Adriana RODRIGUES et. al.

Základní údaje

Originální název

Effect of pulse laser frequency on PLD growth of LuFeO3 explained by kinetic simulations of in-situ diffracted intensities

Autoři

GABRIEL, Vít (garant); Pavel KOCÁN; Sondes BAUER; Berkin NERGIS; Adriana RODRIGUES; Lukáš HORÁK; Xiaowei JIN; Reinhard SCHNEIDER; Tilo BAUMBACH a Václav HOLÝ (203 Česká republika, domácí)

Vydání

Scientific Reports, Nature Research, 2022, 2045-2322

Další údaje

Jazyk

angličtina

Typ výsledku

Článek v odborném periodiku

Obor

10302 Condensed matter physics

Stát vydavatele

Německo

Utajení

není předmětem státního či obchodního tajemství

Odkazy

URL

Impakt faktor

Impact factor: 4.600

Kód RIV

RIV/00216224:14310/22:00125736

Organizační jednotka

Přírodovědecká fakulta

DOI

http://dx.doi.org/10.1038/s41598-022-09414-3

UT WoS

000781522600065

EID Scopus

2-s2.0-85127558082

Klíčová slova anglicky

pulsed-laser deposition (PLD); pulse laser frequency; LuFeO3; thin films; insitu

Štítky

rivok

Příznaky

Mezinárodní význam, Recenzováno

Změněno: 29. 4. 2022 12:20, Mgr. Marie Novosadová Šípková, DiS.

Anotace

V originále

Atomistic processes during pulsed-laser deposition (PLD) growth influence the physical properties of the resulting films. We investigated the PLD of epitaxial layers of hexagonal LuFeO3 by measuring the X-ray diffraction intensity in the quasiforbidden reflection 0003 in situ during deposition. From measured X-ray diffraction intensities we determined coverages of each layer and studied their time evolution which is described by scaling exponent β directly connected to the surface roughness. Subsequently we modelled the growth using kinetic Monte Carlo simulations. While the experimentally obtained scaling exponent β decreases with the laser frequency, the simulations provided the opposite behaviour. We demonstrate that the increase of the surface temperature caused by impinging ablated particles satisfactorily explains the recorded decrease in the scaling exponent with the laser frequency. This phenomena is often overlooked during the PLD growth.

Citovat

GABRIEL, Vít; Pavel KOCÁN; Sondes BAUER; Berkin NERGIS; Adriana RODRIGUES; Lukáš HORÁK; Xiaowei JIN; Reinhard SCHNEIDER; Tilo BAUMBACH a Václav HOLÝ. Effect of pulse laser frequency on PLD growth of LuFeO3 explained by kinetic simulations of in-situ diffracted intensities. Scientific Reports. Nature Research, 2022, roč. 12, č. 1, s. 1-8. ISSN 2045-2322. Dostupné z: https://dx.doi.org/10.1038/s41598-022-09414-3.

@article{1849960,
   author = {Gabriel, Vít and Kocán, Pavel and Bauer, Sondes and Nergis, Berkin and Rodrigues, Adriana and Horák, Lukáš and Jin, Xiaowei and Schneider, Reinhard and Baumbach, Tilo and Holý, Václav},
   article_number = {1},
   doi = {http://dx.doi.org/10.1038/s41598-022-09414-3},
   keywords = {pulsed-laser deposition (PLD); pulse laser frequency; LuFeO3; thin films; insitu},
   language = {eng},
   issn = {2045-2322},
   journal = {Scientific Reports},
   title = {Effect of pulse laser frequency on PLD growth of LuFeO3 explained by kinetic simulations of in-situ diffracted intensities},
   url = {https://www.nature.com/articles/s41598-022-09414-3},
   volume = {12},
   year = {2022}
}

TY  - JOUR
ID  - 1849960
AU  - Gabriel, Vít - Kocán, Pavel - Bauer, Sondes - Nergis, Berkin - Rodrigues, Adriana - Horák, Lukáš - Jin, Xiaowei - Schneider, Reinhard - Baumbach, Tilo - Holý, Václav
PY  - 2022
TI  - Effect of pulse laser frequency on PLD growth of LuFeO3 explained by kinetic simulations of in-situ diffracted intensities
JF  - Scientific Reports
VL  - 12
IS  - 1
SP  - 1-8
EP  - 1-8
PB  - Nature Research
SN  - 20452322
KW  - pulsed-laser deposition (PLD)
KW  - pulse laser frequency
KW  - LuFeO3
KW  - thin films
KW  - insitu
UR  - https://www.nature.com/articles/s41598-022-09414-3
N2  - Atomistic processes during pulsed-laser deposition (PLD) growth influence the physical properties of the resulting films. We investigated the PLD of epitaxial layers of hexagonal LuFeO3 by measuring the X-ray diffraction intensity in the quasiforbidden reflection 0003 in situ during deposition. From measured X-ray diffraction intensities we determined coverages of each layer and studied their time evolution which is described by scaling exponent β directly connected to the surface roughness. Subsequently we modelled the growth using kinetic Monte Carlo simulations. While the experimentally obtained scaling exponent β decreases with the laser frequency, the simulations provided the opposite behaviour. We demonstrate that the increase of the surface temperature caused by impinging ablated particles satisfactorily explains the recorded decrease in the scaling exponent with the laser frequency. This phenomena is often overlooked during the PLD growth.
ER  -

GABRIEL, Vít; Pavel KOCÁN; Sondes BAUER; Berkin NERGIS; Adriana RODRIGUES; Lukáš HORÁK; Xiaowei JIN; Reinhard SCHNEIDER; Tilo BAUMBACH a Václav HOLÝ. Effect of pulse laser frequency on PLD growth of LuFeO3 explained by kinetic simulations of in-situ diffracted intensities. \textit{Scientific Reports}. Nature Research, 2022, roč.~12, č.~1, s.~1-8. ISSN~2045-2322. Dostupné z: https://dx.doi.org/10.1038/s41598-022-09414-3.

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