Modelling of dcMS and HiPIMS process with hydrocarbon gas
admixture

J 2022

Modelling of dcMS and HiPIMS process with hydrocarbon gas admixture

FEKETE, Matej; Michael KROKER; Pavel SOUČEK; Peter KLEIN; Petr VAŠINA et al.

Základní údaje

Originální název

Modelling of dcMS and HiPIMS process with hydrocarbon gas admixture

Autoři

FEKETE, Matej; Michael KROKER; Pavel SOUČEK; Peter KLEIN a Petr VAŠINA

Vydání

Plasma Sources Science and Technology, IOP Publishing Ltd, 2022, 0963-0252

Další údaje

Jazyk

angličtina

Typ výsledku

Článek v odborném periodiku

Obor

10305 Fluids and plasma physics

Stát vydavatele

Velká Británie a Severní Irsko

Utajení

není předmětem státního či obchodního tajemství

Odkazy

URL

Impakt faktor

Impact factor: 3.800

Označené pro přenos do RIV

Ano

Kód RIV

RIV/00216224:14310/22:00126228

Organizační jednotka

Přírodovědecká fakulta

Klíčová slova anglicky

hybrid PVD-PECVD process; magnetron sputtering; dcMS; HiPIMS; hydrocarbon gas; model

Štítky

14312030, rivok

Příznaky

Mezinárodní význam, Recenzováno

Změněno: 22. 2. 2024 10:11, Mgr. Marie Novosadová Šípková, DiS.

Anotace

V originále

Magnetron sputtering in an argon and hydrocarbon gas mixture is a complex deposition process exhibiting features of both physical vapour deposition and plasma enhanced chemical vapour deposition. The hydrocarbon gas decomposes within the plasma and then it is able to form a carbide phase with the target metal atoms or to be deposited as amorphous carbon. In this paper, a simple model for both the direct current (dcMS) and the high power impulse magnetron sputtering (HiPIMS) processes with hydrocarbon gas admixture is presented. The sputtered target racetrack is divided into metallic, compound, and carbon fractions to take into account both the carbide formation and the carbon deposition. To simulate the HiPIMS process, the back-attraction of ionised sputtered metal particles is incorporated into the model. The model is cross-validated with the previously published experiments which were conducted using the same deposition apparatus allowing for the direct comparison of the dcMS and HiPIMS processes. The simulated results correlate with the measured dependencies of the deposition rate, the carbon content in deposited films, and the racetrack fractions on the acetylene supply rate. The presented model is further successfully validated with the evolution of the racetrack composition calculated by SDTrimSP.

Návaznosti

GA19-00579S, projekt VaV

Název: Pokročilá diagnostika reaktivního HiPIMS plazmatu pro depozici oxidových, nitridových a sulfidových vrstev

Investor: Grantová agentura ČR, Pokročilá diagnostika reaktivního HiPIMS plazmatu pro depozici oxidových, nitridových a sulfidových vrstev

90097, velká výzkumná infrastruktura

Název: CEPLANT

Citovat

FEKETE, Matej; Michael KROKER; Pavel SOUČEK; Peter KLEIN a Petr VAŠINA. Modelling of dcMS and HiPIMS process with hydrocarbon gas admixture. Plasma Sources Science and Technology. IOP Publishing Ltd, 2022, roč. 31, č. 6, s. 1-8. ISSN 0963-0252. Dostupné z: https://doi.org/10.1088/1361-6595/ac7746.

@article{1874328,
   author = {Fekete, Matej and Kroker, Michael and Souček, Pavel and Klein, Peter and Vašina, Petr},
   article_number = {6},
   doi = {https://doi.org/10.1088/1361-6595/ac7746},
   keywords = {hybrid PVD-PECVD process; magnetron sputtering; dcMS; HiPIMS; hydrocarbon gas; model},
   language = {eng},
   issn = {0963-0252},
   journal = {Plasma Sources Science and Technology},
   title = {Modelling of dcMS and HiPIMS process with hydrocarbon gas admixture},
   url = {https://iopscience.iop.org/article/10.1088/1361-6595/ac7746},
   volume = {31},
   year = {2022}
}

TY  - JOUR
ID  - 1874328
AU  - Fekete, Matej - Kroker, Michael - Souček, Pavel - Klein, Peter - Vašina, Petr
PY  - 2022
TI  - Modelling of dcMS and HiPIMS process with hydrocarbon gas admixture
JF  - Plasma Sources Science and Technology
VL  - 31
IS  - 6
SP  - 1-8
EP  - 1-8
PB  - IOP Publishing Ltd
SN  - 09630252
KW  - hybrid PVD-PECVD process
KW  - magnetron sputtering
KW  - dcMS
KW  - HiPIMS
KW  - hydrocarbon gas
KW  - model
UR  - https://iopscience.iop.org/article/10.1088/1361-6595/ac7746
N2  - Magnetron sputtering in an argon and hydrocarbon gas mixture is a complex deposition process exhibiting features of both physical vapour deposition and plasma enhanced chemical vapour deposition. The hydrocarbon gas decomposes within the plasma and then it is able to form a carbide phase with the target metal atoms or to be deposited as amorphous carbon. In this paper, a simple model for both the direct current (dcMS) and the high power impulse magnetron sputtering (HiPIMS) processes with hydrocarbon gas admixture is presented. The sputtered target racetrack is divided into metallic, compound, and carbon fractions to take into account both the carbide formation and the carbon deposition. To simulate the HiPIMS process, the back-attraction of ionised sputtered metal particles is incorporated into the model. The model is cross-validated with the previously published experiments which were conducted using the same deposition apparatus allowing for the direct comparison of the dcMS and HiPIMS processes. The simulated results correlate with the measured dependencies of the deposition rate, the carbon content in deposited films, and the racetrack fractions on the acetylene supply rate. The presented model is further successfully validated with the evolution of the racetrack composition calculated by SDTrimSP.
ER  -

FEKETE, Matej; Michael KROKER; Pavel SOUČEK; Peter KLEIN a Petr VAŠINA. Modelling of dcMS and HiPIMS process with hydrocarbon gas admixture. \textit{Plasma Sources Science and Technology}. IOP Publishing Ltd, 2022, roč.~31, č.~6, s.~1-8. ISSN~0963-0252. Dostupné z: https://doi.org/10.1088/1361-6595/ac7746.

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