MUSILOVÁ, Jana and Ivan OHLÍDAL. Influence of defects of thin films on determining their thickness by the method based on white light interference (Influence of defects of thin films on determining their thi ckness by the method based on white light interference). J. Phys. D: Appl. Phys. 1993, 25(1992), No 1, p. 1131-1138. ISSN 0022-3727.
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Basic information
Original name Influence of defects of thin films on determining their thickness by the method based on white light interference
Name in Czech Vliv defektů v tenkých vrstvách na určení jejich tloušťky metodou interference bílého světla
Authors MUSILOVÁ, Jana (203 Czech Republic, guarantor) and Ivan OHLÍDAL (203 Czech Republic).
Edition J. Phys. D: Appl. Phys. 1993, 0022-3727.
Other information
Original language English
Type of outcome Article in a journal
Field of Study 10302 Condensed matter physics
Country of publisher United Kingdom of Great Britain and Northern Ireland
Confidentiality degree is not subject to a state or trade secret
Organization unit Faculty of Science
UT WoS A1992JD92100016
Keywords (in Czech) tenké vrstvy
Keywords in English thin films
Tags thin films
Tags International impact, Reviewed
Changed by Changed by: prof. RNDr. Jana Musilová, CSc., učo 851. Changed: 23/6/2009 22:26.
Abstract
Method of determining the thickness of a thin film by white light interference. Influence of defects.
Abstract (in Czech)
Metoda určení tloušťky tenké vrstvy pomocí interference bílého svqtla. Vliv defektů.
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