Analysis of single layers placed on slightly rough surfaces by
spectroscopic ellipsometry, spectroscopic reflectometry and
atomic force microscopy

D 1997

Analysis of single layers placed on slightly rough surfaces by spectroscopic ellipsometry, spectroscopic reflectometry and atomic force microscopy

OHLÍDAL, Ivan; Daniel FRANTA; Bohuslav REZEK a Miloslav OHLÍDAL

Základní údaje

Originální název

Analysis of single layers placed on slightly rough surfaces by spectroscopic ellipsometry, spectroscopic reflectometry and atomic force microscopy

Autoři

OHLÍDAL, Ivan; Daniel FRANTA; Bohuslav REZEK a Miloslav OHLÍDAL

Vydání

Chichester, England, UK, ECASIA 97 - 7th European Conference on Applications of Surface and Interface Analysis, s. 1051-1054, 1997

Nakladatel

John Willey & Sons

Další údaje

Jazyk

angličtina

Typ výsledku

Stať ve sborníku

Obor

10302 Condensed matter physics

Stát vydavatele

Velká Británie a Severní Irsko

Utajení

není předmětem státního či obchodního tajemství

Odkazy

URL

Označené pro přenos do RIV

Organizační jednotka

Přírodovědecká fakulta

ISBN

0-471-97827-2

UT WoS

000074082100243

Změněno: 19. 12. 2003 19:22, Mgr. Daniel Franta, Ph.D.

Anotace

V originále

Surfaces of solids exhibiting slight random roughness are often encountered in practice. This roughness influences some physical and chemical properties of these surface (e.g. both the optical and electrical properties of the solid surfaces can be influenced by this roughness in an enormous way). The situation is mostly complicated by the fact that the rough surfaces are covered with thin films. This fact must be respected at studies of these rough surfaces as well. In this paper a method based on a combination of spectroscopic ellipsometry, spectroscopic reflectometry and atomic force microscopy (AFM) allowing to characterize the slightly rough surfaces covered with very thin films will be described. This method will be illustrated by results achieved at the analysis of the slightly rough surfaces of silicon single crystal covered with native oxide layers.

Citovat

OHLÍDAL, Ivan; Daniel FRANTA; Bohuslav REZEK a Miloslav OHLÍDAL. Analysis of single layers placed on slightly rough surfaces by spectroscopic ellipsometry, spectroscopic reflectometry and atomic force microscopy. In ECASIA 97 - 7th European Conference on Applications of Surface and Interface Analysis. Chichester, England, UK: John Willey & Sons, 1997, s. 1051-1054. ISBN 0-471-97827-2.

@inproceedings{197818,
   author = {Ohlídal, Ivan and Franta, Daniel and Rezek, Bohuslav and Ohlídal, Miloslav},
   address = {Chichester, England, UK},
   booktitle = {ECASIA 97 - 7th European Conference on Applications of Surface and Interface Analysis},
   language = {eng},
   location = {Chichester, England, UK},
   isbn = {0-471-97827-2},
   pages = {1051-1054},
   publisher = {John Willey & Sons},
   title = {Analysis of single layers placed on slightly rough surfaces by spectroscopic ellipsometry, spectroscopic reflectometry and atomic force microscopy},
   url = {http://hydra.physics.muni.cz/~franta/bib/ECASIA97_1051.html},
   year = {1997}
}

TY  - CONF
ID  - 197818
AU  - Ohlídal, Ivan - Franta, Daniel - Rezek, Bohuslav - Ohlídal, Miloslav
PY  - 1997
TI  - Analysis of single layers placed on slightly rough surfaces by spectroscopic ellipsometry, spectroscopic reflectometry and atomic force microscopy
PB  - John Willey & Sons
CY  - Chichester, England, UK
SN  - 0471978272
UR  - http://hydra.physics.muni.cz/~franta/bib/ECASIA97_1051.html
N2  - Surfaces of solids exhibiting slight random roughness are often encountered in practice. This roughness influences some physical and chemical properties of these surface (e.g. both the optical and electrical properties of the solid surfaces can be influenced by this roughness in an enormous way). The situation is mostly complicated by the fact that the rough surfaces are covered with thin films. This fact must be respected at studies of these rough surfaces as well. In this paper a method based on a combination of spectroscopic ellipsometry, spectroscopic reflectometry and atomic force microscopy (AFM) allowing to characterize the slightly rough surfaces covered with very thin films will be described. This method will be illustrated by results achieved at the analysis of the slightly rough surfaces of silicon single crystal covered with native oxide layers.
ER  -

OHLÍDAL, Ivan; Daniel FRANTA; Bohuslav REZEK a Miloslav OHLÍDAL. Analysis of single layers placed on slightly rough surfaces by spectroscopic ellipsometry, spectroscopic reflectometry and atomic force microscopy. In \textit{ECASIA 97 - 7th European Conference on Applications of Surface and Interface Analysis}. Chichester, England, UK: John Willey \&{} Sons, 1997, s.~1051-1054. ISBN~0-471-97827-2.

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