a 2022

Atmospheric plasma as a source of chemically active species for low-temperature processing of materials

GHOURCHI BEIGI, Pedram; Jianyu FENG; Richard KRUMPOLEC a Dušan KOVÁČIK

Základní údaje

Originální název

Atmospheric plasma as a source of chemically active species for low-temperature processing of materials

Autoři

Vydání

NANOCON 2022: 14th International Conference on Nanomaterials – Research & Application, 2022

Další údaje

Jazyk

angličtina

Typ výsledku

Konferenční abstrakt

Obor

10305 Fluids and plasma physics

Stát vydavatele

Česká republika

Utajení

není předmětem státního či obchodního tajemství

Označené pro přenos do RIV

Ne

Organizační jednotka

Přírodovědecká fakulta

ISBN

978-80-88365-07-5

Klíčová slova anglicky

MSDBD; atmospheric pressure plasma; low-temperature plasma; chemical active species
Změněno: 6. 12. 2022 09:46, Mgr. Marie Novosadová Šípková, DiS.

Anotace

V originále

Multi-hollow surface dielectric barrier discharge (MSDBD) is a plasma source that generates atmospheric-pressure plasma in an array of holes in a ceramic plate. Due to its novel geometry, the working gas flows out from the holes through the discharges, and as a consequence, a remote plasma treatment is accessible up to 5 mm from the substrate. MSDBD has been tested and verified to be efficient in surface modification of a wide range of substrates, low-temperature processing of materials, the decontamination of materials at enlarged distances, and food processing, e.g., grains, seeds, and biofilms. In this study, different physical and electrical parameters of the discharge, using various working gases, are studied to optimize the plasma properties. On the other hand, multiple parameters are investigated to understand the result of the plasma-activated working gas, which leads to calculating the concentration of hydrogen peroxide (H2O2) proportionate to the distance from the electrode. A better understanding of the behavior of the discharge in different working gases can provide more information related to the reactions carried out on the substrates' surfaces.

Návaznosti

LM2018097, projekt VaV
Název: Centrum výzkumu a vývoje plazmatu a nanotechnologických povrchových úprav (Akronym: CEPLANT)
Investor: Ministerstvo školství, mládeže a tělovýchovy ČR, R&D centre for plasma and nanotechnology surface modifications