Characterisation of Silicon Oxide Thin Films Deposited by Plasma Enhanced CVD from Octamethylcyclotetrasiloxane/Oxygen Feeds

ZAJÍČKOVÁ, Lenka, Jan JANČA and Vratislav PERINA. Characterisation of Silicon Oxide Thin Films Deposited by Plasma Enhanced CVD from Octamethylcyclotetrasiloxane/Oxygen Feeds. Thin Solid Films. New York: Elsevier, 1999, vol. 338, No 1, p. 49-59. ISSN 0042-6090/99.

Basic information

Original name

Characterisation of Silicon Oxide Thin Films Deposited by Plasma Enhanced CVD from Octamethylcyclotetrasiloxane/Oxygen Feeds

Name in Czech

Charakterizace tenkých vrstev oxidu křemíku připravených metodou PECVD z oktametylcyklotetrasiloxanu ve směsi s kyslíkem

Authors

ZAJÍČKOVÁ, Lenka (203 Czech Republic, guarantor), Jan JANČA (203 Czech Republic) and Vratislav PERINA

Edition

Thin Solid Films, New York, Elsevier, 1999, 0042-6090/99

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Other information

Language

English

Type of outcome

Článek v odborném periodiku

Field of Study

10305 Fluids and plasma physics

Country of publisher

United States of America

Confidentiality degree

není předmětem státního či obchodního tajemství

RIV identification code

RIV/00216224:14310/99:00002175

Organization unit

Faculty of Science

UT WoS

000078758500009

Keywords in English

PECVD; OMTS

Tags

OMTS, PECVD

Tags

International impact, Reviewed

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Abstract

V originále

Characterisation of Silicon Oxide Thin Films Deposited by Plasma Enhanced CVD from Octamethylcyclotetrasiloxane/Oxygen Feeds

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Links

MSM 143100003, plan (intention)

Name: Studium plazmochemických reakcí v neizotermickém nízkoteplotním plazmatu a jeho interakcí s povrchem pevných látek Investor: Ministry of Education, Youth and Sports of the CR, Study of plasmachemical reactions in non-isothermic low pressure plasma and its interaction with the surface of solid substrates