Time and Energy-Resolved Investigation of the HiPIMS Discharge
in Ar and Ar/N2 Atmospheres

a 2023

Time and Energy-Resolved Investigation of the HiPIMS Discharge in Ar and Ar/N2 Atmospheres

HNILICA, Jaroslav; Katarína BERNÁTOVÁ; Peter KLEIN; Zdeněk HUBIČKA; Martin ČADA et al.

Základní údaje

Originální název

Time and Energy-Resolved Investigation of the HiPIMS Discharge in Ar and Ar/N2 Atmospheres

Autoři

HNILICA, Jaroslav; Katarína BERNÁTOVÁ; Peter KLEIN; Zdeněk HUBIČKA; Martin ČADA a Petr VAŠINA

Vydání

International Conference on Reactive Sputter Deposition 2023, 2023

Další údaje

Jazyk

angličtina

Typ výsledku

Konferenční abstrakt

Stát vydavatele

Německo

Utajení

není předmětem státního či obchodního tajemství

Označené pro přenos do RIV

Organizační jednotka

Přírodovědecká fakulta

Klíčová slova anglicky

magnetron; sputtering; OES; mass spectrometer

Příznaky

Mezinárodní význam

Změněno: 8. 1. 2024 12:01, doc. Mgr. Jaroslav Hnilica, Ph.D.

Anotace

V originále

High Power Impulse Magnetron Sputtering (HiPIMS), an increasingly promising physical vapor deposition technique, employs short voltage pulses with a low duty cycle to generate a substantial flow of ionized sputtered particles. Introducing a reactive gas into the HiPIMS process opens new possibilities for producing innovative materials with diverse properties and compositions. Nevertheless, employing HiPIMS in a reactive process becomes tricky due to the complex time-dependent interplay between discharge properties and reactive gas supply. Consequently, there is a pressing need for a better understanding of discharge behavior in reactive HiPIMS to gain reproducible control over the deposition process. We investigated the reactive sputtering process using mass spectroscopy. In this experiment, a titanium cathode served as the sputtering source, and we maintained a constant total pressure and supplied power. We studied two cases: one with a low current (60 A) and another with a high current (150 A). We employed a Speedflo Mini fast feedback control system to measure throughout the hysteresis curve. We chose four distinctive points in the metal, transition, and poisoned regime, where we measured the ion flux of the present species by mass spectrometry. We captured time-resolved and time-averaged ion energy distribution functions (IEDF) for Ar+, Ar2+, Ti+, Ti2+, N+ and N2+ under all investigated conditions. This study follows up on the optical measurements that were made previously.

Návaznosti

LM2023039, projekt VaV

Název: Centrum výzkumu a vývoje plazmatu a nanotechnologických povrchových úprav

Investor: Ministerstvo školství, mládeže a tělovýchovy ČR, R&D centre for plasma and nanotechnology surface modifications

Citovat

HNILICA, Jaroslav; Katarína BERNÁTOVÁ; Peter KLEIN; Zdeněk HUBIČKA; Martin ČADA a Petr VAŠINA. Time and Energy-Resolved Investigation of the HiPIMS Discharge in Ar and Ar/N2 Atmospheres. In International Conference on Reactive Sputter Deposition 2023. 2023.

@proceedings{2358100,
   author = {Hnilica, Jaroslav and Bernátová, Katarína and Klein, Peter and Hubička, Zdeněk and Čada, Martin and Vašina, Petr},
   booktitle = {International Conference on Reactive Sputter Deposition 2023},
   keywords = {magnetron; sputtering; OES; mass spectrometer},
   language = {eng},
   title = {Time and Energy-Resolved Investigation of the HiPIMS Discharge in Ar and Ar/N2 Atmospheres},
   year = {2023}
}

TY  - CONF
ID  - 2358100
AU  - Hnilica, Jaroslav - Bernátová, Katarína - Klein, Peter - Hubička, Zdeněk - Čada, Martin - Vašina, Petr
PY  - 2023
TI  - Time and Energy-Resolved Investigation of the HiPIMS Discharge in Ar and Ar/N2 Atmospheres
KW  - magnetron
KW  - sputtering
KW  - OES
KW  - mass spectrometer
N2  - High Power Impulse Magnetron Sputtering (HiPIMS), an increasingly promising physical vapor deposition technique, employs short voltage pulses with a low duty cycle to generate a substantial flow of ionized sputtered particles. Introducing a reactive gas into the HiPIMS process opens new possibilities for producing innovative materials with diverse properties and compositions. Nevertheless, employing HiPIMS in a reactive process becomes tricky due to the complex time-dependent interplay between discharge properties and reactive gas supply. Consequently, there is a pressing need for a better understanding of discharge behavior in reactive HiPIMS to gain reproducible control over the deposition process. We investigated the reactive sputtering process using mass spectroscopy. In this experiment, a titanium cathode served as the sputtering source, and we maintained a constant total pressure and supplied power. We studied two cases: one with a low current (60 A) and another with a high current (150 A). We employed a Speedflo Mini fast feedback control system to measure throughout the hysteresis curve. We chose four distinctive points in the metal, transition, and poisoned regime, where we measured the ion flux of the present species by mass spectrometry. We captured time-resolved and time-averaged ion energy distribution functions (IEDF) for Ar+, Ar2+, Ti+, Ti2+, N+ and N2+ under all investigated conditions. This study follows up on the optical measurements that were made previously.
ER  -

HNILICA, Jaroslav; Katarína BERNÁTOVÁ; Peter KLEIN; Zdeněk HUBIČKA; Martin ČADA a Petr VAŠINA. Time and Energy-Resolved Investigation of the HiPIMS Discharge in Ar and Ar/N2 Atmospheres. In \textit{International Conference on Reactive Sputter Deposition 2023}. 2023.

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