NOVEL INDUSTRIAL SPUTTERING TECHNOLOGY WITH VERY HIGH IONIZED
FLUX FRACTION OF DEPOSITED MATERIAL

a 2023

NOVEL INDUSTRIAL SPUTTERING TECHNOLOGY WITH VERY HIGH IONIZED FLUX FRACTION OF DEPOSITED MATERIAL

KLUSOŇ, Jan; Martin UČÍK; Mojmír JÍLEK; Jaroslav HNILICA; Peter KLEIN et al.

Základní údaje

Originální název

NOVEL INDUSTRIAL SPUTTERING TECHNOLOGY WITH VERY HIGH IONIZED FLUX FRACTION OF DEPOSITED MATERIAL

Autoři

KLUSOŇ, Jan; Martin UČÍK; Mojmír JÍLEK; Jaroslav HNILICA; Peter KLEIN; Petr VAŠINA a Andreas LÜMKEMANN

Vydání

Vrstvy a povlaky, 2023

Další údaje

Jazyk

čeština

Typ výsledku

Konferenční abstrakt

Stát vydavatele

Česká republika

Utajení

není předmětem státního či obchodního tajemství

Označené pro přenos do RIV

Organizační jednotka

Přírodovědecká fakulta

Klíčová slova anglicky

magnetron; sputtering; ionmeter; industrial

Změněno: 8. 1. 2024 12:52, doc. Mgr. Jaroslav Hnilica, Ph.D.

Anotace

V originále

PLATIT Pi411 PLUS is an extremely flexible coating unit. It can be operated in several different configurations what enables deposition of broad range of various PVD and PECVD coatings. Besides cathodic arc evaporation, this unit also offers magnetron sputtering by even two distinct sputtering technologies – well-established PLATIT SCIL technology and novel PLATIT F-Type technology. Common base for SCIL and F-Type is the central rotating cylindrical cathode with very efficient target cooling. Whereas in the case of SCIL the magnetic field design corresponds to more or less conventional cylindrical arrangement, F-Type is equipped with a specific moveable magnetic core. As the core is periodically moving along the cathode axis, the total applied power is instantaneously concentrated into the limited area of the target in the vicinity of this core. It results in the possibility to reach very high power densities, especially for industrial DC magnetron sputtering. For the delivered power of 25 kW the maximal value of power density goes up to 800 W/cm2, what is comparable with typical HIPIMS conditions. SCIL and F-Type technologies will be described in more detail and compared in terms of their specific properties.

Citovat

KLUSOŇ, Jan; Martin UČÍK; Mojmír JÍLEK; Jaroslav HNILICA; Peter KLEIN; Petr VAŠINA a Andreas LÜMKEMANN. NOVEL INDUSTRIAL SPUTTERING TECHNOLOGY WITH VERY HIGH IONIZED FLUX FRACTION OF DEPOSITED MATERIAL. In Vrstvy a povlaky. 2023.

@proceedings{2358127,
   author = {Klusoň, Jan and Učík, Martin and Jílek, Mojmír and Hnilica, Jaroslav and Klein, Peter and Vašina, Petr and Lümkemann, Andreas},
   booktitle = {Vrstvy a povlaky},
   keywords = {magnetron; sputtering; ionmeter; industrial},
   language = {cze},
   title = {NOVEL INDUSTRIAL SPUTTERING TECHNOLOGY WITH VERY HIGH IONIZED FLUX FRACTION OF DEPOSITED MATERIAL},
   year = {2023}
}

TY  - CONF
ID  - 2358127
AU  - Klusoň, Jan - Učík, Martin - Jílek, Mojmír - Hnilica, Jaroslav - Klein, Peter - Vašina, Petr - Lümkemann, Andreas
PY  - 2023
TI  - NOVEL INDUSTRIAL SPUTTERING TECHNOLOGY WITH VERY HIGH IONIZED FLUX FRACTION OF DEPOSITED MATERIAL
KW  - magnetron
KW  - sputtering
KW  - ionmeter
KW  - industrial
N2  - PLATIT Pi411 PLUS is an extremely flexible coating unit. It can be operated in several different configurations what enables deposition of broad range of various PVD and PECVD coatings. Besides cathodic arc evaporation, this unit also offers magnetron sputtering by even two distinct sputtering technologies – well-established PLATIT SCIL technology and novel PLATIT F-Type technology. Common base for SCIL and F-Type is the central rotating cylindrical cathode with very efficient target cooling. Whereas in the case of SCIL the magnetic field design corresponds to more or less conventional cylindrical arrangement, F-Type is equipped with a specific moveable magnetic core. As the core is periodically moving along the cathode axis, the total applied power is instantaneously concentrated into the limited area of the target in the vicinity of this core. It results in the possibility to reach very high power densities, especially for industrial DC magnetron sputtering. For the delivered power of 25 kW the maximal value of power density goes up to 800 W/cm2, what is comparable with typical HIPIMS conditions. SCIL and F-Type technologies will be described in more detail and compared in terms of their specific properties.
ER  -

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