2025
Exploring different approaches of multipulse HiPIMS
HNILICA, Jaroslav; Pavel SOUČEK; Martin ONDRYÁŠ; Peter KLEIN; Matej FEKETE et al.Základní údaje
Originální název
Exploring different approaches of multipulse HiPIMS
Autoři
Vydání
Surface and Coatings Technology, Elsevier B.V. 2025, 0257-8972
Další údaje
Jazyk
angličtina
Typ výsledku
Článek v odborném periodiku
Obor
10305 Fluids and plasma physics
Stát vydavatele
Švýcarsko
Utajení
není předmětem státního či obchodního tajemství
Odkazy
Impakt faktor
Impact factor: 6.100 v roce 2024
Označené pro přenos do RIV
Ano
Kód RIV
RIV/00216224:14310/25:00140476
Organizační jednotka
Přírodovědecká fakulta
UT WoS
EID Scopus
Klíčová slova anglicky
Titanium; Microstructure control; Magnetron sputtering; HiPIMS; Multipulse
Příznaky
Mezinárodní význam, Recenzováno
Změněno: 9. 7. 2025 13:52, Mgr. Marie Novosadová Šípková, DiS.
Anotace
V originále
Three different approaches for using high power impulse magnetron sputtering (HiPIMS) with a titanium target were examined in terms of plasma diagnostics and coating properties. In all three approaches, a 1 kW average power was kept constant. The first approach involves splitting a strong single HiPIMS pulse into multiple evenly distributed weaker pulses by proportionally dividing the period. The second approach is based on the first one, but the pulses are grouped together in a short burst, or pulse package, where the overall period is conserved. Comparing the second approach to the first enables the identification of the effect of pulse grouping. In the third approach, the pulses are also grouped into the pulse package, however, the period is extended proportionally to the number of pulses in the pulse package. This allows for the creation of short bursts of energetic pulses separated by very long off-times while maintaining the duty cycle. In this way, it is possible to determine whether the grouping of the strong pulses into a pulse package is more beneficial for the deposition than the negative effects induced by prolonging the off-time. Plasma diagnostics revealed that grouping the pulses into packages in the second approach resulted in a higher ionised metal flux fraction on the substrate compared to the first approach, which led to stronger ion bombardment of the growing coating, resulting in denser coatings and changes in the crystalline microstructure. The third approach did not increase ionised metal flux fraction significantly but influenced the texture and grain size of the growing films.
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