Exploring ionised metal flux fraction in magnetron sputtering:
Insights from laboratory and industrial applications

J 2025

Exploring ionised metal flux fraction in magnetron sputtering: Insights from laboratory and industrial applications

KLEIN, Peter; Jaroslav HNILICA; Vjaceslav SOCHORA a Petr VAŠINA

Základní údaje

Originální název

Exploring ionised metal flux fraction in magnetron sputtering: Insights from laboratory and industrial applications

Autoři

KLEIN, Peter; Jaroslav HNILICA; Vjaceslav SOCHORA a Petr VAŠINA

Vydání

Surface and Coatings Technology, Elsevier B.V. 2025, 0257-8972

Další údaje

Jazyk

angličtina

Typ výsledku

Článek v odborném periodiku

Obor

20506 Coating and films

Stát vydavatele

Švýcarsko

Utajení

není předmětem státního či obchodního tajemství

Odkazy

URL

Impakt faktor

Impact factor: 6.100 v roce 2024

Označené pro přenos do RIV

Ano

Kód RIV

RIV/00216224:14310/25:00140921

Organizační jednotka

Přírodovědecká fakulta

Klíčová slova anglicky

Magnetron sputtering; Industry; Lab-scale; Coatings; IPVD; QCM

Štítky

14312030, rivok

Příznaky

Mezinárodní význam, Recenzováno

Změněno: 9. 7. 2025 14:07, Mgr. Marie Novosadová Šípková, DiS.

Anotace

V originále

Magnetron sputtering is one of the cornerstones of thin film-forming methods. The literature provides excessive knowledge about inner plasma processes, deposition control and thin film growth, but the overwhelming majority reports on results conducted on a small lab scale. To transfer this knowledge and use it in industrial applications, one has to overcome many challenges, the most profound being scaling the process from the lab scale towards a large industrial scale. This paper explores the critical differences in deposition fluxes and ionisation of metals when scaling from lab to industrial systems. While in the laboratory, the direct current magnetron sputtering does not create sufficient metal ions, this is dramatically different in the industrial system, where up to 30% of the film-forming species detected were ions. Additionally, the deposition rate in the industrial system was about one order of magnitude higher compared to the laboratory system.

Návaznosti

TN02000069, projekt VaV

Název: Národní centrum kompetence pro materiály, pokročilé technologie, povlakování a jejich aplikace

Investor: Technologická agentura ČR, Národní centrum kompetence pro materiály, pokročilé technologie, povlakování a jejich aplikace

90239, velká výzkumná infrastruktura

Název: CEPLANT II

Citovat

KLEIN, Peter; Jaroslav HNILICA; Vjaceslav SOCHORA a Petr VAŠINA. Exploring ionised metal flux fraction in magnetron sputtering: Insights from laboratory and industrial applications. Surface and Coatings Technology. Elsevier B.V., 2025, roč. 500, March, s. 1-8. ISSN 0257-8972. Dostupné z: https://doi.org/10.1016/j.surfcoat.2025.131866.

@article{2488517,
   author = {Klein, Peter and Hnilica, Jaroslav and Sochora, Vjaceslav and Vašina, Petr},
   article_number = {March},
   doi = {https://doi.org/10.1016/j.surfcoat.2025.131866},
   keywords = {Magnetron sputtering; Industry; Lab-scale; Coatings; IPVD; QCM},
   language = {eng},
   issn = {0257-8972},
   journal = {Surface and Coatings Technology},
   title = {Exploring ionised metal flux fraction in magnetron sputtering: Insights from laboratory and industrial applications},
   url = {https://doi.org/10.1016/j.surfcoat.2025.131866},
   volume = {500},
   year = {2025}
}

TY  - JOUR
ID  - 2488517
AU  - Klein, Peter - Hnilica, Jaroslav - Sochora, Vjaceslav - Vašina, Petr
PY  - 2025
TI  - Exploring ionised metal flux fraction in magnetron sputtering: Insights from laboratory and industrial applications
JF  - Surface and Coatings Technology
VL  - 500
IS  - March
SP  - 1-8
EP  - 1-8
PB  - Elsevier B.V.
SN  - 02578972
KW  - Magnetron sputtering
KW  - Industry
KW  - Lab-scale
KW  - Coatings
KW  - IPVD
KW  - QCM
UR  - https://doi.org/10.1016/j.surfcoat.2025.131866
N2  - Magnetron sputtering is one of the cornerstones of thin film-forming methods. The literature provides excessive knowledge about inner plasma processes, deposition control and thin film growth, but the overwhelming majority reports on results conducted on a small lab scale. To transfer this knowledge and use it in industrial applications, one has to overcome many challenges, the most profound being scaling the process from the lab scale towards a large industrial scale. This paper explores the critical differences in deposition fluxes and ionisation of metals when scaling from lab to industrial systems. While in the laboratory, the direct current magnetron sputtering does not create sufficient metal ions, this is dramatically different in the industrial system, where up to 30% of the film-forming species detected were ions. Additionally, the deposition rate in the industrial system was about one order of magnitude higher compared to the laboratory system.
ER  -

KLEIN, Peter; Jaroslav HNILICA; Vjaceslav SOCHORA a Petr VAŠINA. Exploring ionised metal flux fraction in magnetron sputtering: Insights from laboratory and industrial applications. \textit{Surface and Coatings Technology}. Elsevier B.V., 2025, roč.~500, March, s.~1-8. ISSN~0257-8972. Dostupné z: https://doi.org/10.1016/j.surfcoat.2025.131866.

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