Nanometer-scale interface instability in silicon oxide/polymer
sandwich structures detected after two years

J 2025

Nanometer-scale interface instability in silicon oxide/polymer sandwich structures detected after two years

BRANECKY, Martin; Oleksandr ROMANENKO; Naghmeh ABOUALIGALEDARI; Tomas PLICHTA; Jiří NOVÁK et. al.

Základní údaje

Originální název

Nanometer-scale interface instability in silicon oxide/polymer sandwich structures detected after two years

Autoři

BRANECKY, Martin; Oleksandr ROMANENKO; Naghmeh ABOUALIGALEDARI; Tomas PLICHTA; Jiří NOVÁK; Anna MACKOVA a Vladimir CECH

Vydání

Materials Chemistry and Physics, Elsevier, 2025, 0254-0584

Další údaje

Jazyk

angličtina

Typ výsledku

Článek v odborném periodiku

Obor

10302 Condensed matter physics

Stát vydavatele

Švýcarsko

Utajení

není předmětem státního či obchodního tajemství

Odkazy

URL

Impakt faktor

Impact factor: 4.700 v roce 2024

Organizační jednotka

Přírodovědecká fakulta

DOI

https://doi.org/10.1016/j.matchemphys.2025.130935

UT WoS

001482301000001

EID Scopus

2-s2.0-105003384451

Klíčová slova anglicky

Plasma-enhanced chemical vapor deposition; (PECVD); Interface; Porosity; Diffusion; Silica; Polymer; Carbon dioxide

Štítky

14312020, rivok

Příznaky

Mezinárodní význam, Recenzováno

Změněno: 1. 9. 2025 15:42, Mgr. Marie Novosadová Šípková, DiS.

Anotace

V originále

Nonthermal plasma-deposited glassy silica is often used as a gas barrier film to protect polymer material in many applications. This study revealed that glassy silica is a slightly porous material (3 vol%) with small pores (2.5 nm) formed during thin film deposition. The infrared spectrum shows that the as-deposited plasma silica contains gaseous carbon dioxide, which is likely encapsulated in the pores. It can be assumed that these CO2 molecules diffuse from the silica layer through the silicon oxide/polymer interface into the protected polymer material. The low crosslinked polymer material is then locally oxidized by CO2, which changes its chemical and physical properties. This means that the silicon oxide/polymer interface gradually moves into the polymer material over time. CO2 diffusion is therefore considered responsible for a shift of the silicon oxide/polymer interface by 30–35 nm after 27 months.

Citovat

BRANECKY, Martin; Oleksandr ROMANENKO; Naghmeh ABOUALIGALEDARI; Tomas PLICHTA; Jiří NOVÁK; Anna MACKOVA a Vladimir CECH. Nanometer-scale interface instability in silicon oxide/polymer sandwich structures detected after two years. Materials Chemistry and Physics. Elsevier, 2025, roč. 341, September, s. 130935-130943. ISSN 0254-0584. Dostupné z: https://doi.org/10.1016/j.matchemphys.2025.130935.

@article{2515043,
   author = {Branecky, Martin and Romanenko, Oleksandr and Aboualigaledari, Naghmeh and Plichta, Tomas and Novák, Jiří and Mackova, Anna and Cech, Vladimir},
   article_number = {September},
   doi = {https://doi.org/10.1016/j.matchemphys.2025.130935},
   keywords = {Plasma-enhanced chemical vapor deposition; (PECVD); Interface; Porosity; Diffusion; Silica; Polymer; Carbon dioxide},
   language = {eng},
   issn = {0254-0584},
   journal = {Materials Chemistry and Physics},
   title = {Nanometer-scale interface instability in silicon oxide/polymer sandwich structures detected after two years},
   url = {https://doi.org/10.1016/j.matchemphys.2025.130935},
   volume = {341},
   year = {2025}
}

TY  - JOUR
ID  - 2515043
AU  - Branecky, Martin - Romanenko, Oleksandr - Aboualigaledari, Naghmeh - Plichta, Tomas - Novák, Jiří - Mackova, Anna - Cech, Vladimir
PY  - 2025
TI  - Nanometer-scale interface instability in silicon oxide/polymer sandwich structures detected after two years
JF  - Materials Chemistry and Physics
VL  - 341
IS  - September
SP  - 130935
EP  - 130935
PB  - Elsevier
SN  - 02540584
KW  - Plasma-enhanced chemical vapor deposition
KW  - (PECVD)
KW  - Interface
KW  - Porosity
KW  - Diffusion
KW  - Silica
KW  - Polymer
KW  - Carbon dioxide
UR  - https://doi.org/10.1016/j.matchemphys.2025.130935
N2  - Nonthermal plasma-deposited glassy silica is often used as a gas barrier film to protect polymer material in many applications. This study revealed that glassy silica is a slightly porous material (3 vol%) with small pores (2.5 nm) formed during thin film deposition. The infrared spectrum shows that the as-deposited plasma silica contains gaseous carbon dioxide, which is likely encapsulated in the pores. It can be assumed that these CO2 molecules diffuse from the silica layer through the silicon oxide/polymer interface into the protected polymer material. The low crosslinked polymer material is then locally oxidized by CO2, which changes its chemical and physical properties. This means that the silicon oxide/polymer interface gradually moves into the polymer material over time. CO2 diffusion is therefore considered responsible for a shift of the silicon oxide/polymer interface by 30–35 nm after 27 months.
ER  -

BRANECKY, Martin; Oleksandr ROMANENKO; Naghmeh ABOUALIGALEDARI; Tomas PLICHTA; Jiří NOVÁK; Anna MACKOVA a Vladimir CECH. Nanometer-scale interface instability in silicon oxide/polymer sandwich structures detected after two years. \textit{Materials Chemistry and Physics}. Elsevier, 2025, roč.~341, September, s.~130935-130943. ISSN~0254-0584. Dostupné z: https://doi.org/10.1016/j.matchemphys.2025.130935.

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