Understanding hysteresis-free reactive DC magnetron and high
target utilization sputtering of TiZrHfVNbTa-N coatings

J 2026

Understanding hysteresis-free reactive DC magnetron and high target utilization sputtering of TiZrHfVNbTa-N coatings

LOFAJ, František; Matej FEKETE; Lenka KVETKOVÁ; Petra HVIŠČOVÁ; Ondrej PETRUŠ et al.

Základní údaje

Originální název

Understanding hysteresis-free reactive DC magnetron and high target utilization sputtering of TiZrHfVNbTa-N coatings

Autoři

LOFAJ, František; Matej FEKETE; Lenka KVETKOVÁ; Petra HVIŠČOVÁ a Ondrej PETRUŠ

Vydání

International Journal of Applied Ceramic Technology, American Ceramic Society, 2026, 1546-542X

Další údaje

Jazyk

angličtina

Typ výsledku

Článek v odborném periodiku

Obor

20506 Coating and films

Stát vydavatele

Spojené státy

Utajení

není předmětem státního či obchodního tajemství

Odkazy

URL

Impakt faktor

Impact factor: 2.300 v roce 2024

Označené pro přenos do RIV

Ano

Organizační jednotka

Přírodovědecká fakulta

Klíčová slova anglicky

Berg’s model; compositionally complex nitrides; hysteresis suppression; reactive DC mag-netron sputtering; reactive HiTUS

Štítky

14312030, rivok

Příznaky

Mezinárodní význam, Recenzováno

Změněno: 4. 12. 2025 10:25, Mgr. Marie Novosadová Šípková, DiS.

Anotace

V originále

Reactive direct current (DC) magnetron sputtering (rDCMS) and reactive high target utilization sputtering (rHiTUS) of compositionally complex TiZrHfVNbTa–N coatings were systematically investigated with varying nitrogen flow. The study combined experimental measurements of total and partial nitrogen pressures with simulations based on Berg's model. Both deposition systems exhibited hysteresis-free behavior, characterized by two distinct nitrogen consumption regimes: (1) a nearly linear increase up to a critical nitrogen flow (≈4 sccm in rDCMS and ≈6 sccm in rHiTUS), and (2) a saturation regime. Simulations reproduced these trends and confirmed that hysteresis suppression originates from high pumping speeds (pumping speed/volume ratio > > 4 s−1). The applicability of Berg's model to rHiTUS was validated by the strong agreement between experiments and modeling, supporting the assumption that the fundamental processes of reactive sputtering—target sputtering, poisoning, and nitride formation—are identical in DCMS and HiTUS. The main technological benefit of operating in a hysteresis-free regime is that coating composition and properties can be controlled solely through nitrogen flow adjustment.

Návaznosti

LM2023039, projekt VaV

Název: Centrum výzkumu a vývoje plazmatu a nanotechnologických povrchových úprav

Investor: Ministerstvo školství, mládeže a tělovýchovy ČR, R&D centre for plasma and nanotechnology surface modifications

Citovat

LOFAJ, František; Matej FEKETE; Lenka KVETKOVÁ; Petra HVIŠČOVÁ a Ondrej PETRUŠ. Understanding hysteresis-free reactive DC magnetron and high target utilization sputtering of TiZrHfVNbTa-N coatings. International Journal of Applied Ceramic Technology. American Ceramic Society, 2026, roč. 23, č. 1, s. "e70087", 12 s. ISSN 1546-542X. Dostupné z: https://doi.org/10.1111/ijac.70087.

@article{2522797,
   author = {Lofaj, František and Fekete, Matej and Kvetková, Lenka and Hviščová, Petra and Petruš, Ondrej},
   article_number = {1},
   doi = {https://doi.org/10.1111/ijac.70087},
   keywords = {Berg’s model; compositionally complex nitrides; hysteresis suppression; reactive DC mag-netron sputtering; reactive HiTUS},
   language = {eng},
   issn = {1546-542X},
   journal = {International Journal of Applied Ceramic Technology},
   title = {Understanding hysteresis-free reactive DC magnetron and high target utilization sputtering of TiZrHfVNbTa-N coatings},
   url = {https://ceramics.onlinelibrary.wiley.com/doi/10.1111/ijac.70087},
   volume = {23},
   year = {2026}
}

TY  - JOUR
ID  - 2522797
AU  - Lofaj, František - Fekete, Matej - Kvetková, Lenka - Hviščová, Petra - Petruš, Ondrej
PY  - 2026
TI  - Understanding hysteresis-free reactive DC magnetron and high target utilization sputtering of TiZrHfVNbTa-N coatings
JF  - International Journal of Applied Ceramic Technology
VL  - 23
IS  - 1
SP  - "e70087"
EP  - "e70087"
PB  - American Ceramic Society
SN  - 1546542X
KW  - Berg’s model
KW  - compositionally complex nitrides
KW  - hysteresis suppression
KW  - reactive DC mag-netron sputtering
KW  - reactive HiTUS
UR  - https://ceramics.onlinelibrary.wiley.com/doi/10.1111/ijac.70087
N2  - Reactive direct current (DC) magnetron sputtering (rDCMS) and reactive high target utilization sputtering (rHiTUS) of compositionally complex TiZrHfVNbTa–N coatings were systematically investigated with varying nitrogen flow. The study combined experimental measurements of total and partial nitrogen pressures with simulations based on Berg's model. Both deposition systems exhibited hysteresis-free behavior, characterized by two distinct nitrogen consumption regimes: (1) a nearly linear increase up to a critical nitrogen flow (≈4 sccm in rDCMS and ≈6 sccm in rHiTUS), and (2) a saturation regime. Simulations reproduced these trends and confirmed that hysteresis suppression originates from high pumping speeds (pumping speed/volume ratio > > 4 s−1). The applicability of Berg's model to rHiTUS was validated by the strong agreement between experiments and modeling, supporting the assumption that the fundamental processes of reactive sputtering—target sputtering, poisoning, and nitride formation—are identical in DCMS and HiTUS. The main technological benefit of operating in a hysteresis-free regime is that coating composition and properties can be controlled solely through nitrogen flow adjustment.
ER  -

LOFAJ, František; Matej FEKETE; Lenka KVETKOVÁ; Petra HVIŠČOVÁ a Ondrej PETRUŠ. Understanding hysteresis-free reactive DC magnetron and high target utilization sputtering of TiZrHfVNbTa-N coatings. \textit{International Journal of Applied Ceramic Technology}. American Ceramic Society, 2026, roč.~23, č.~1, s.~''e70087'', 12 s. ISSN~1546-542X. Dostupné z: https://doi.org/10.1111/ijac.70087.

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