On the sputtered particle density and flux evolutions in
multi-pulse HiPIMS processes

J 2026

On the sputtered particle density and flux evolutions in multi-pulse HiPIMS processes

HNILICA, Jaroslav; Peter KLEIN; Petr VAŠINA; Rony SNYDERS; Nikolay BRITUN et al.

Základní údaje

Originální název

On the sputtered particle density and flux evolutions in multi-pulse HiPIMS processes

Autoři

HNILICA, Jaroslav; Peter KLEIN; Petr VAŠINA; Rony SNYDERS a Nikolay BRITUN

Vydání

PLASMA SOURCES SCIENCE & TECHNOLOGY, Bristol, IOP Publishing Ltd, 2026, 0963-0252

Další údaje

Jazyk

angličtina

Typ výsledku

Článek v odborném periodiku

Obor

10305 Fluids and plasma physics

Stát vydavatele

Velká Británie a Severní Irsko

Utajení

není předmětem státního či obchodního tajemství

Odkazy

URL

Impakt faktor

Impact factor: 3.300 v roce 2024

Označené pro přenos do RIV

Ano

Organizační jednotka

Přírodovědecká fakulta

DOI

https://doi.org/10.1088/1361-6595/ae3f55

UT WoS

001685999200001

Klíčová slova anglicky

multi-pulse; HiPIMS; plasma diagnostics; AAS; QCM

Štítky

14312030, rivok

Příznaky

Mezinárodní význam, Recenzováno

Změněno: 24. 2. 2026 11:10, Mgr. Marie Novosadová Šípková, DiS.

Anotace

V originále

The neutral and ionized particles' density as well as their fluxes are investigated in a multi-pulse high-power impulse magnetron sputtering discharge using atomic absorption spectroscopy combined with a biasable quartz crystal microbalance. As the number of micropulses in the burst increases, a noticeable decrease in the mean discharge current is observed, leading to a reduction in both the ion density and the metal flux fractions. Extending the delay between micropulses results in an increased ionized density fraction, while the ionized metal flux fraction (IMFF) remains largely unchanged. Notably, the deposition rate surpasses that of a conventional direct current magnetron sputtering discharge at the same average power input, even when the IMFF is maintained at approximately 20%. The deposition rate enhancement becomes significant as the micropulse duration surpasses approximate to 130 mu s or a burst containing more than eight micropulses is used.

Návaznosti

LM2023039, projekt VaV

Název: Centrum výzkumu a vývoje plazmatu a nanotechnologických povrchových úprav

Investor: Ministerstvo školství, mládeže a tělovýchovy ČR, R&D centre for plasma and nanotechnology surface modifications

Citovat

HNILICA, Jaroslav; Peter KLEIN; Petr VAŠINA; Rony SNYDERS a Nikolay BRITUN. On the sputtered particle density and flux evolutions in multi-pulse HiPIMS processes. PLASMA SOURCES SCIENCE & TECHNOLOGY. Bristol: IOP Publishing Ltd, 2026, roč. 35, č. 2, s. 1-11. ISSN 0963-0252. Dostupné z: https://doi.org/10.1088/1361-6595/ae3f55.

@article{2556418,
   author = {Hnilica, Jaroslav and Klein, Peter and Vašina, Petr and Snyders, Rony and Britun, Nikolay},
   article_location = {Bristol},
   article_number = {2},
   doi = {https://doi.org/10.1088/1361-6595/ae3f55},
   keywords = {multi-pulse; HiPIMS; plasma diagnostics; AAS; QCM},
   language = {eng},
   issn = {0963-0252},
   journal = {PLASMA SOURCES SCIENCE & TECHNOLOGY},
   title = {On the sputtered particle density and flux evolutions in multi-pulse HiPIMS processes},
   url = {https://iopscience.iop.org/article/10.1088/1361-6595/ae3f55},
   volume = {35},
   year = {2026}
}

TY  - JOUR
ID  - 2556418
AU  - Hnilica, Jaroslav - Klein, Peter - Vašina, Petr - Snyders, Rony - Britun, Nikolay
PY  - 2026
TI  - On the sputtered particle density and flux evolutions in multi-pulse HiPIMS processes
JF  - PLASMA SOURCES SCIENCE & TECHNOLOGY
VL  - 35
IS  - 2
SP  - 1-11
EP  - 1-11
PB  - IOP Publishing Ltd
SN  - 09630252
KW  - multi-pulse
KW  - HiPIMS
KW  - plasma diagnostics
KW  - AAS
KW  - QCM
UR  - https://iopscience.iop.org/article/10.1088/1361-6595/ae3f55
N2  - The neutral and ionized particles' density as well as their fluxes are investigated in a multi-pulse high-power impulse magnetron sputtering discharge using atomic absorption spectroscopy combined with a biasable quartz crystal microbalance. As the number of micropulses in the burst increases, a noticeable decrease in the mean discharge current is observed, leading to a reduction in both the ion density and the metal flux fractions. Extending the delay between micropulses results in an increased ionized density fraction, while the ionized metal flux fraction (IMFF) remains largely unchanged. Notably, the deposition rate surpasses that of a conventional direct current magnetron sputtering discharge at the same average power input, even when the IMFF is maintained at approximately 20%. The deposition rate enhancement becomes significant as the micropulse duration surpasses approximate to 130 mu s or a burst containing more than eight micropulses is used.
ER  -

HNILICA, Jaroslav; Peter KLEIN; Petr VAŠINA; Rony SNYDERS a Nikolay BRITUN. On the sputtered particle density and flux evolutions in multi-pulse HiPIMS processes. \textit{PLASMA SOURCES SCIENCE \&{} TECHNOLOGY}. Bristol: IOP Publishing Ltd, 2026, roč.~35, č.~2, s.~1-11. ISSN~0963-0252. Dostupné z: https://doi.org/10.1088/1361-6595/ae3f55.

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